Viscoelastic deformation of borosilicate glass substrates induced by a laser-patterned silicon suboxide film

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • Laura Fütterer
  • Clemens M. Beckmann
  • Jürgen Ihlemann

Externe Organisationen

  • Institut für Nanophotonik Göttingen e.V. (IFNANO)
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Details

OriginalspracheEnglisch
Aufsatznummer107
FachzeitschriftApplied Physics A: Materials Science and Processing
Jahrgang129
Ausgabenummer2
PublikationsstatusVeröffentlicht - Feb. 2023
Extern publiziertJa

Abstract

In general, a thin film deposited on a substrate surface exhibits a certain amount of stress that causes a deformation of the substrate. Usually, the deformation is elastic, however, under some circumstances, a non-recoverable deformation of the substrate can be observed. Recently, we demonstrated that a large non-recoverable deformation of fused silica substrates can be obtained if on one side a film of substoichiometric silicon oxide is deposited and the film-substrate system is annealed at a temperature in the glass transition range. By laser patterning of the film, specific surface shapes can be obtained. Here, we report on a similar approach for the viscoelastic deformation of plates of borosilicate glass (Schott N-BK7). The substrates are coated by a film of substoichiometric silicon oxide, which is patterned by application of a XeCl-excimer laser. We measured the surface shape of the non-coated side after different annealing durations. Deformation of the samples corresponds to a tensile film stress. But by application of a line pattern, toroid surface shapes with curvatures of different sign can be easily obtained. With further investigation and development, the process might be applied for production of freeform surfaces.

ASJC Scopus Sachgebiete

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Viscoelastic deformation of borosilicate glass substrates induced by a laser-patterned silicon suboxide film. / Fütterer, Laura; Beckmann, Clemens M.; Ihlemann, Jürgen.
in: Applied Physics A: Materials Science and Processing, Jahrgang 129, Nr. 2, 107, 02.2023.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Download
@article{3a67336779784765a7aff3b6b6213d9b,
title = "Viscoelastic deformation of borosilicate glass substrates induced by a laser-patterned silicon suboxide film",
abstract = "In general, a thin film deposited on a substrate surface exhibits a certain amount of stress that causes a deformation of the substrate. Usually, the deformation is elastic, however, under some circumstances, a non-recoverable deformation of the substrate can be observed. Recently, we demonstrated that a large non-recoverable deformation of fused silica substrates can be obtained if on one side a film of substoichiometric silicon oxide is deposited and the film-substrate system is annealed at a temperature in the glass transition range. By laser patterning of the film, specific surface shapes can be obtained. Here, we report on a similar approach for the viscoelastic deformation of plates of borosilicate glass (Schott N-BK7). The substrates are coated by a film of substoichiometric silicon oxide, which is patterned by application of a XeCl-excimer laser. We measured the surface shape of the non-coated side after different annealing durations. Deformation of the samples corresponds to a tensile film stress. But by application of a line pattern, toroid surface shapes with curvatures of different sign can be easily obtained. With further investigation and development, the process might be applied for production of freeform surfaces.",
keywords = "Freeform surface, Glass, Laser ablation, Stress figuring, Thin film, Viscoelastic deformation",
author = "Laura F{\"u}tterer and Beckmann, {Clemens M.} and J{\"u}rgen Ihlemann",
note = "Funding Information: Financial support was received from Bundesministerium f{\"u}r Wirtschaft und Energie and Nieders{\"a}chsisches Ministerium f{\"u}r Wissenschaft und Kultur under grant number 03THW05K09. Funding Information: The authors would like to thank Lukas Janos Richter (IFNANO) for deposition of the silicon suboxide films, Andreas R{\"o}ben (IFNANO) for performing the wavefront measurement, and Matthias Kulp (Max-Planck-Institut f{\"u}r Multidisziplin{\"a}re Naturwissenschaften) for preparation of the N-BK7 substrates. ",
year = "2023",
month = feb,
doi = "10.1007/s00339-022-06357-4",
language = "English",
volume = "129",
journal = "Applied Physics A: Materials Science and Processing",
issn = "0947-8396",
publisher = "Springer Verlag",
number = "2",

}

Download

TY - JOUR

T1 - Viscoelastic deformation of borosilicate glass substrates induced by a laser-patterned silicon suboxide film

AU - Fütterer, Laura

AU - Beckmann, Clemens M.

AU - Ihlemann, Jürgen

N1 - Funding Information: Financial support was received from Bundesministerium für Wirtschaft und Energie and Niedersächsisches Ministerium für Wissenschaft und Kultur under grant number 03THW05K09. Funding Information: The authors would like to thank Lukas Janos Richter (IFNANO) for deposition of the silicon suboxide films, Andreas Röben (IFNANO) for performing the wavefront measurement, and Matthias Kulp (Max-Planck-Institut für Multidisziplinäre Naturwissenschaften) for preparation of the N-BK7 substrates.

PY - 2023/2

Y1 - 2023/2

N2 - In general, a thin film deposited on a substrate surface exhibits a certain amount of stress that causes a deformation of the substrate. Usually, the deformation is elastic, however, under some circumstances, a non-recoverable deformation of the substrate can be observed. Recently, we demonstrated that a large non-recoverable deformation of fused silica substrates can be obtained if on one side a film of substoichiometric silicon oxide is deposited and the film-substrate system is annealed at a temperature in the glass transition range. By laser patterning of the film, specific surface shapes can be obtained. Here, we report on a similar approach for the viscoelastic deformation of plates of borosilicate glass (Schott N-BK7). The substrates are coated by a film of substoichiometric silicon oxide, which is patterned by application of a XeCl-excimer laser. We measured the surface shape of the non-coated side after different annealing durations. Deformation of the samples corresponds to a tensile film stress. But by application of a line pattern, toroid surface shapes with curvatures of different sign can be easily obtained. With further investigation and development, the process might be applied for production of freeform surfaces.

AB - In general, a thin film deposited on a substrate surface exhibits a certain amount of stress that causes a deformation of the substrate. Usually, the deformation is elastic, however, under some circumstances, a non-recoverable deformation of the substrate can be observed. Recently, we demonstrated that a large non-recoverable deformation of fused silica substrates can be obtained if on one side a film of substoichiometric silicon oxide is deposited and the film-substrate system is annealed at a temperature in the glass transition range. By laser patterning of the film, specific surface shapes can be obtained. Here, we report on a similar approach for the viscoelastic deformation of plates of borosilicate glass (Schott N-BK7). The substrates are coated by a film of substoichiometric silicon oxide, which is patterned by application of a XeCl-excimer laser. We measured the surface shape of the non-coated side after different annealing durations. Deformation of the samples corresponds to a tensile film stress. But by application of a line pattern, toroid surface shapes with curvatures of different sign can be easily obtained. With further investigation and development, the process might be applied for production of freeform surfaces.

KW - Freeform surface

KW - Glass

KW - Laser ablation

KW - Stress figuring

KW - Thin film

KW - Viscoelastic deformation

UR - http://www.scopus.com/inward/record.url?scp=85146298140&partnerID=8YFLogxK

U2 - 10.1007/s00339-022-06357-4

DO - 10.1007/s00339-022-06357-4

M3 - Article

AN - SCOPUS:85146298140

VL - 129

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

SN - 0947-8396

IS - 2

M1 - 107

ER -