Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Nanoengineering |
| Untertitel | Fabrication, Properties, Optics, Thin Films, and Devices XX |
| Herausgeber/-innen | Balaji Panchapakesan, Andre-Jean Attias, Andre-Jean Attias, Wounjhang Park |
| Herausgeber (Verlag) | SPIE |
| Seitenumfang | 6 |
| ISBN (elektronisch) | 9781510665200 |
| Publikationsstatus | Veröffentlicht - 3 Okt. 2023 |
| Veranstaltung | SPIE NanoScience + Engeneering 2023 - San Diego, USA / Vereinigte Staaten Dauer: 20 Aug. 2023 → 21 Aug. 2023 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 12653 |
| ISSN (Print) | 0277-786X |
| ISSN (elektronisch) | 1996-756X |
Abstract
The demand on the miniaturization of products has fostered the advancement of high-resolution fabrication technologies. Here, we demonstrate a simple and low-cost UV-LED-based lithography technique for structuring at micro- and nanoscale. The corresponding experimental setup was established with off-the-shelf components and allows for single structuring within seconds based on a standard microscope projection photolithography (MPP) process. Single lines with feature sizes down to 150 nm were successfully produced. In addition, high-resolution gratings, ring resonators as well as arrayed waveguide gratings at the micro- and nanoscale were successfully fabricated as well. This operation-friendly, highly efficient and low-cost approach exhibits great potential in micro- and nanomanufacturing for applications in fields such as nanophotonics, biophotonics and micro- and nanoelectromechanical systems.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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- BibTex
- RIS
Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX. Hrsg. / Balaji Panchapakesan; Andre-Jean Attias; Andre-Jean Attias; Wounjhang Park. SPIE, 2023. 1265305 (Proceedings of SPIE - The International Society for Optical Engineering; Band 12653).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - UV-LED-based projection lithography for rapid high-resolution micro- and nanostructuring
AU - Zheng, Lei
AU - Reinhardt, Carsten
AU - Roth, Bernhard
N1 - Funding Information: The authors acknowledge the financial support from the German Research Foundation (DFG) under Germany’s Excellence Strategy within the Cluster of Excellence PhoenixD (EXC 2122, Project ID 390833453).
PY - 2023/10/3
Y1 - 2023/10/3
N2 - The demand on the miniaturization of products has fostered the advancement of high-resolution fabrication technologies. Here, we demonstrate a simple and low-cost UV-LED-based lithography technique for structuring at micro- and nanoscale. The corresponding experimental setup was established with off-the-shelf components and allows for single structuring within seconds based on a standard microscope projection photolithography (MPP) process. Single lines with feature sizes down to 150 nm were successfully produced. In addition, high-resolution gratings, ring resonators as well as arrayed waveguide gratings at the micro- and nanoscale were successfully fabricated as well. This operation-friendly, highly efficient and low-cost approach exhibits great potential in micro- and nanomanufacturing for applications in fields such as nanophotonics, biophotonics and micro- and nanoelectromechanical systems.
AB - The demand on the miniaturization of products has fostered the advancement of high-resolution fabrication technologies. Here, we demonstrate a simple and low-cost UV-LED-based lithography technique for structuring at micro- and nanoscale. The corresponding experimental setup was established with off-the-shelf components and allows for single structuring within seconds based on a standard microscope projection photolithography (MPP) process. Single lines with feature sizes down to 150 nm were successfully produced. In addition, high-resolution gratings, ring resonators as well as arrayed waveguide gratings at the micro- and nanoscale were successfully fabricated as well. This operation-friendly, highly efficient and low-cost approach exhibits great potential in micro- and nanomanufacturing for applications in fields such as nanophotonics, biophotonics and micro- and nanoelectromechanical systems.
KW - high-resolution structuring
KW - microscope projection photolithography
KW - nanofabrication
KW - sub-100 nm
UR - http://www.scopus.com/inward/record.url?scp=85176384499&partnerID=8YFLogxK
U2 - 10.1117/12.2677495
DO - 10.1117/12.2677495
M3 - Conference contribution
AN - SCOPUS:85176384499
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Nanoengineering
A2 - Panchapakesan, Balaji
A2 - Attias, Andre-Jean
A2 - Attias, Andre-Jean
A2 - Park, Wounjhang
PB - SPIE
T2 - Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX 2023
Y2 - 20 August 2023 through 21 August 2023
ER -