Details
| Originalsprache | Englisch |
|---|---|
| Seiten | 67 |
| Seitenumfang | 1 |
| Publikationsstatus | Veröffentlicht - 1998 |
| Extern publiziert | Ja |
| Veranstaltung | 1998 International Quantum Electronics Conference - San Francisco, USA / Vereinigte Staaten Dauer: 3 Mai 1998 → 8 Mai 1998 |
Konferenz
| Konferenz | 1998 International Quantum Electronics Conference |
|---|---|
| Land/Gebiet | USA / Vereinigte Staaten |
| Ort | San Francisco |
| Zeitraum | 3 Mai 1998 → 8 Mai 1998 |
Abstract
Atoms with a magnetic substructure in the electronic ground state are strongly sensitive to light polarization and static magnetic fields. The applications of the effects in light force lithography are studied namely: the potentials for magnetic substates differ in height even in a light field with uniform polarization leading to an aberration in the focusing process; and introducing polarization gradients into the light mask gives rise to feature separations below half the wavelength. A detailed investigation of possible two-dimensional light field configurations include polarization gradients and static magnetic field.
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Allgemeine Physik und Astronomie
Zitieren
- Standard
- Harvard
- Apa
- Vancouver
- BibTex
- RIS
1998. 67 Beitrag in 1998 International Quantum Electronics Conference, San Francisco, California, USA / Vereinigte Staaten.
Publikation: Konferenzbeitrag › Paper › Forschung › Peer-Review
}
TY - CONF
T1 - Two-dimensional light force lithography with polarization gradient fields
AU - Brezger, B.
AU - Schmidt, P. O.
AU - Schulze, Th
AU - Bell, A.
AU - Pfau, T.
AU - Mlynek, J.
PY - 1998
Y1 - 1998
N2 - Atoms with a magnetic substructure in the electronic ground state are strongly sensitive to light polarization and static magnetic fields. The applications of the effects in light force lithography are studied namely: the potentials for magnetic substates differ in height even in a light field with uniform polarization leading to an aberration in the focusing process; and introducing polarization gradients into the light mask gives rise to feature separations below half the wavelength. A detailed investigation of possible two-dimensional light field configurations include polarization gradients and static magnetic field.
AB - Atoms with a magnetic substructure in the electronic ground state are strongly sensitive to light polarization and static magnetic fields. The applications of the effects in light force lithography are studied namely: the potentials for magnetic substates differ in height even in a light field with uniform polarization leading to an aberration in the focusing process; and introducing polarization gradients into the light mask gives rise to feature separations below half the wavelength. A detailed investigation of possible two-dimensional light field configurations include polarization gradients and static magnetic field.
UR - http://www.scopus.com/inward/record.url?scp=0031681824&partnerID=8YFLogxK
M3 - Paper
AN - SCOPUS:0031681824
SP - 67
T2 - 1998 International Quantum Electronics Conference
Y2 - 3 May 1998 through 8 May 1998
ER -