Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 3-9 |
| Seitenumfang | 7 |
| Fachzeitschrift | ECS Transactions |
| Jahrgang | 61 |
| Ausgabenummer | 2 |
| Publikationsstatus | Veröffentlicht - 2014 |
| Veranstaltung | 6th International Symposium on Dielectrics for Nanosystems: Materials Science, Processing, Reliability and Manufacturing - 225th ECS Meeting - Orlando, USA / Vereinigte Staaten Dauer: 11 Mai 2014 → 15 Mai 2014 |
Abstract
The dielectric properties of thin crystalline oxides grown on silicon are sensitive to small variations in structure and symmetry. Here, we report about different investigations on strain-induced effects on dielectric properties. First, we report on the dependence of the dielectric constant on layer thickness for epitaxial Gd2O3 on Si(111). The K-value strongly decreases with increasing layer thickness and reaches the bulk value at around 8 nm. Controlling the oxide composition in ternary (Gd1-xNdx)2O3 thin films enables us to tune the lattice mismatch to silicon, and thus the straininduced variation in the dielectric constants. We show that solely tetragonal distortion of the cubic lattice is not sufficient to explain the huge enhancement in K-values; more severe strain induced structural phase deformations take place. Further, dielectric properties of epitaxial oxide thin films have been found to improve significantly by incorporation of suitable dopants. We observe substantial reduction of the leakage current density in nitrogendoped Gd2O3 layers indicating that nitrogen doping can be an effective route to eliminate the adverse effects of the oxygen vacancy induced defects in the oxide layers.
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in: ECS Transactions, Jahrgang 61, Nr. 2, 2014, S. 3-9.
Publikation: Beitrag in Fachzeitschrift › Konferenzaufsatz in Fachzeitschrift › Forschung › Peer-Review
}
TY - JOUR
T1 - Tuning dielectric properties of epitaxial lanthanide oxides on silicon
AU - Osten, H. J.
AU - Schwendt, D.
AU - Chaudhuri, A. R.
AU - Fissel, A.
AU - Shekhter, P.
AU - Eizenberg, M.
PY - 2014
Y1 - 2014
N2 - The dielectric properties of thin crystalline oxides grown on silicon are sensitive to small variations in structure and symmetry. Here, we report about different investigations on strain-induced effects on dielectric properties. First, we report on the dependence of the dielectric constant on layer thickness for epitaxial Gd2O3 on Si(111). The K-value strongly decreases with increasing layer thickness and reaches the bulk value at around 8 nm. Controlling the oxide composition in ternary (Gd1-xNdx)2O3 thin films enables us to tune the lattice mismatch to silicon, and thus the straininduced variation in the dielectric constants. We show that solely tetragonal distortion of the cubic lattice is not sufficient to explain the huge enhancement in K-values; more severe strain induced structural phase deformations take place. Further, dielectric properties of epitaxial oxide thin films have been found to improve significantly by incorporation of suitable dopants. We observe substantial reduction of the leakage current density in nitrogendoped Gd2O3 layers indicating that nitrogen doping can be an effective route to eliminate the adverse effects of the oxygen vacancy induced defects in the oxide layers.
AB - The dielectric properties of thin crystalline oxides grown on silicon are sensitive to small variations in structure and symmetry. Here, we report about different investigations on strain-induced effects on dielectric properties. First, we report on the dependence of the dielectric constant on layer thickness for epitaxial Gd2O3 on Si(111). The K-value strongly decreases with increasing layer thickness and reaches the bulk value at around 8 nm. Controlling the oxide composition in ternary (Gd1-xNdx)2O3 thin films enables us to tune the lattice mismatch to silicon, and thus the straininduced variation in the dielectric constants. We show that solely tetragonal distortion of the cubic lattice is not sufficient to explain the huge enhancement in K-values; more severe strain induced structural phase deformations take place. Further, dielectric properties of epitaxial oxide thin films have been found to improve significantly by incorporation of suitable dopants. We observe substantial reduction of the leakage current density in nitrogendoped Gd2O3 layers indicating that nitrogen doping can be an effective route to eliminate the adverse effects of the oxygen vacancy induced defects in the oxide layers.
UR - http://www.scopus.com/inward/record.url?scp=84925044012&partnerID=8YFLogxK
U2 - 10.1149/06102.0003ecst
DO - 10.1149/06102.0003ecst
M3 - Conference article
AN - SCOPUS:84925044012
VL - 61
SP - 3
EP - 9
JO - ECS Transactions
JF - ECS Transactions
SN - 1938-5862
IS - 2
T2 - 6th International Symposium on Dielectrics for Nanosystems: Materials Science, Processing, Reliability and Manufacturing - 225th ECS Meeting
Y2 - 11 May 2014 through 15 May 2014
ER -