Trap-assisted conduction in Pt-gated Gd2O3/Si capacitors

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • E. Lipp
  • Z. Shahar
  • B. C. Bittel
  • P. M. Lenahan
  • D. Schwendt
  • H. J. Osten
  • M. Eizenberg

Externe Organisationen

  • Technion-Israel Institute of Technology
  • Pennsylvania State University
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Aufsatznummer073724
FachzeitschriftJournal of applied physics
Jahrgang109
Ausgabenummer7
PublikationsstatusVeröffentlicht - 1 Apr. 2011

Abstract

The barrier height at the Pt/Gd2O3 interface is determined by current-voltage measurements. Current conduction is found to be governed by carrier injection from the electrode, with a barrier height of 0.6 0.1 eV. This value, which was verified by the method suggested by Zafar [Appl. Phys. Lett. 80, 4858 (2002)], is much smaller than the difference between the metal work function (5.6 eV) and the oxide electron affinity (1.95-2.05 eV). As Fermi-level pinning is not dominant at Pt/Gd2O3 interfaces, it is proposed that electrons are injected into a defect-related energy band in the oxide. The existence of such a defect, as well as its position in the oxide forbidden energy bandgap, agrees with results obtained by magnetic resonance measurements.

ASJC Scopus Sachgebiete

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Trap-assisted conduction in Pt-gated Gd2O3/Si capacitors. / Lipp, E.; Shahar, Z.; Bittel, B. C. et al.
in: Journal of applied physics, Jahrgang 109, Nr. 7, 073724, 01.04.2011.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Lipp, E, Shahar, Z, Bittel, BC, Lenahan, PM, Schwendt, D, Osten, HJ & Eizenberg, M 2011, 'Trap-assisted conduction in Pt-gated Gd2O3/Si capacitors', Journal of applied physics, Jg. 109, Nr. 7, 073724. https://doi.org/10.1063/1.3573036
Lipp, E., Shahar, Z., Bittel, B. C., Lenahan, P. M., Schwendt, D., Osten, H. J., & Eizenberg, M. (2011). Trap-assisted conduction in Pt-gated Gd2O3/Si capacitors. Journal of applied physics, 109(7), Artikel 073724. https://doi.org/10.1063/1.3573036
Lipp E, Shahar Z, Bittel BC, Lenahan PM, Schwendt D, Osten HJ et al. Trap-assisted conduction in Pt-gated Gd2O3/Si capacitors. Journal of applied physics. 2011 Apr 1;109(7):073724. doi: 10.1063/1.3573036
Lipp, E. ; Shahar, Z. ; Bittel, B. C. et al. / Trap-assisted conduction in Pt-gated Gd2O3/Si capacitors. in: Journal of applied physics. 2011 ; Jahrgang 109, Nr. 7.
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abstract = "The barrier height at the Pt/Gd2O3 interface is determined by current-voltage measurements. Current conduction is found to be governed by carrier injection from the electrode, with a barrier height of 0.6 0.1 eV. This value, which was verified by the method suggested by Zafar [Appl. Phys. Lett. 80, 4858 (2002)], is much smaller than the difference between the metal work function (5.6 eV) and the oxide electron affinity (1.95-2.05 eV). As Fermi-level pinning is not dominant at Pt/Gd2O3 interfaces, it is proposed that electrons are injected into a defect-related energy band in the oxide. The existence of such a defect, as well as its position in the oxide forbidden energy bandgap, agrees with results obtained by magnetic resonance measurements.",
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AU - Bittel, B. C.

AU - Lenahan, P. M.

AU - Schwendt, D.

AU - Osten, H. J.

AU - Eizenberg, M.

N1 - Funding Information: This work was supported by a grant from the German-Israel Foundation for Scientific Research and Development and by the Russell Berrie Nanotechnology Institute at the Technion. One of the authors (E.L.) acknowledges the support of an Israel Ministry of Science Eshkol grant. Dr. Ramadurai Ranjith (Leibniz University) is acknowledged for helpful discussions and input.

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