Trap density imaging of silicon wafers using a lock-in infrared camera technique

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

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  • Institut für Solarenergieforschung GmbH (ISFH)
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OriginalspracheEnglisch
Titel des SammelwerksConference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
Herausgeber (Verlag)IEEE Computer Society
Seiten932-935
Seitenumfang4
ISBN (Print)1424400163, 9781424400164, 1-4244-0017-1
PublikationsstatusVeröffentlicht - 2006
Extern publiziertJa
Veranstaltung2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4) - Waikoloa, HI, USA / Vereinigte Staaten
Dauer: 7 Mai 200612 Mai 2006
Konferenznummer: 4

Abstract

We apply a novel an imaging technique for nonrecombination active minority-carrier trapping centres in silicon wafers based on lock-in infrared thermography. Measurements on Czochralski silicon wafers show that the trap density is highly inhomogenous and correlates with oxygen-induced striation patterns. A direct comparison of the trap density image with the corresponding recombination lifetime mapping reveals an anticorrelation of the two quantities. The application of the ITM technique to block-cast multicrystalline silicon wafers shows that the distribution of the trapping centres correlates with the dislocation density. Moreover, we find that areas with increased dislocation density often degrade during phosphorus gettering treatment. Finally, we demonstrate that one single spatially resolved measurement of the infrared emission signal of as-delivered multicrystalline silicon without surface passivation layers reveals already poorly-getterable areas, which decrease the solar cell efficiency. Hence, trap density imaging is a useful new instrument for assessing the efficiency potential of asdelivered mc-Si wafers.

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Trap density imaging of silicon wafers using a lock-in infrared camera technique. / Pohl, Peter; Schmidt, Jan; Bothe, Karsten et al.
Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society, 2006. S. 932-935 4059782.

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Pohl, P, Schmidt, J, Bothe, K & Brendel, R 2006, Trap density imaging of silicon wafers using a lock-in infrared camera technique. in Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4., 4059782, IEEE Computer Society, S. 932-935, 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4), Waikoloa, HI, USA / Vereinigte Staaten, 7 Mai 2006. https://doi.org/10.1109/WCPEC.2006.279609
Pohl, P., Schmidt, J., Bothe, K., & Brendel, R. (2006). Trap density imaging of silicon wafers using a lock-in infrared camera technique. In Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 (S. 932-935). Artikel 4059782 IEEE Computer Society. https://doi.org/10.1109/WCPEC.2006.279609
Pohl P, Schmidt J, Bothe K, Brendel R. Trap density imaging of silicon wafers using a lock-in infrared camera technique. in Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society. 2006. S. 932-935. 4059782 doi: 10.1109/WCPEC.2006.279609
Pohl, Peter ; Schmidt, Jan ; Bothe, Karsten et al. / Trap density imaging of silicon wafers using a lock-in infrared camera technique. Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society, 2006. S. 932-935
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title = "Trap density imaging of silicon wafers using a lock-in infrared camera technique",
abstract = "We apply a novel an imaging technique for nonrecombination active minority-carrier trapping centres in silicon wafers based on lock-in infrared thermography. Measurements on Czochralski silicon wafers show that the trap density is highly inhomogenous and correlates with oxygen-induced striation patterns. A direct comparison of the trap density image with the corresponding recombination lifetime mapping reveals an anticorrelation of the two quantities. The application of the ITM technique to block-cast multicrystalline silicon wafers shows that the distribution of the trapping centres correlates with the dislocation density. Moreover, we find that areas with increased dislocation density often degrade during phosphorus gettering treatment. Finally, we demonstrate that one single spatially resolved measurement of the infrared emission signal of as-delivered multicrystalline silicon without surface passivation layers reveals already poorly-getterable areas, which decrease the solar cell efficiency. Hence, trap density imaging is a useful new instrument for assessing the efficiency potential of asdelivered mc-Si wafers.",
author = "Peter Pohl and Jan Schmidt and Karsten Bothe and Rolf Brendel",
note = "Funding Information: Funding was provided by the State of Lower Saxony. The authors are grateful to N. Enjalbert of Photowatt Inter- national S.A.S (France) for supplying mc-Si wafers. ISFH is a member of the German Forschungsverbund Sonne- nenergie.; 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4) ; Conference date: 07-05-2006 Through 12-05-2006",
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Download

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AU - Pohl, Peter

AU - Schmidt, Jan

AU - Bothe, Karsten

AU - Brendel, Rolf

N1 - Conference code: 4

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N2 - We apply a novel an imaging technique for nonrecombination active minority-carrier trapping centres in silicon wafers based on lock-in infrared thermography. Measurements on Czochralski silicon wafers show that the trap density is highly inhomogenous and correlates with oxygen-induced striation patterns. A direct comparison of the trap density image with the corresponding recombination lifetime mapping reveals an anticorrelation of the two quantities. The application of the ITM technique to block-cast multicrystalline silicon wafers shows that the distribution of the trapping centres correlates with the dislocation density. Moreover, we find that areas with increased dislocation density often degrade during phosphorus gettering treatment. Finally, we demonstrate that one single spatially resolved measurement of the infrared emission signal of as-delivered multicrystalline silicon without surface passivation layers reveals already poorly-getterable areas, which decrease the solar cell efficiency. Hence, trap density imaging is a useful new instrument for assessing the efficiency potential of asdelivered mc-Si wafers.

AB - We apply a novel an imaging technique for nonrecombination active minority-carrier trapping centres in silicon wafers based on lock-in infrared thermography. Measurements on Czochralski silicon wafers show that the trap density is highly inhomogenous and correlates with oxygen-induced striation patterns. A direct comparison of the trap density image with the corresponding recombination lifetime mapping reveals an anticorrelation of the two quantities. The application of the ITM technique to block-cast multicrystalline silicon wafers shows that the distribution of the trapping centres correlates with the dislocation density. Moreover, we find that areas with increased dislocation density often degrade during phosphorus gettering treatment. Finally, we demonstrate that one single spatially resolved measurement of the infrared emission signal of as-delivered multicrystalline silicon without surface passivation layers reveals already poorly-getterable areas, which decrease the solar cell efficiency. Hence, trap density imaging is a useful new instrument for assessing the efficiency potential of asdelivered mc-Si wafers.

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ER -

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