Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 271-275 |
| Seitenumfang | 5 |
| Fachzeitschrift | Thin Solid Films |
| Jahrgang | 592 |
| Ausgabenummer | Part B |
| Publikationsstatus | Veröffentlicht - 17 Mai 2015 |
Abstract
Defects embedded in coatings due to particle contamination are considered as a primary factor limiting the quality of optical coatings in Ion Beam Sputtering. An approach combining the conventional Ion Beam Sputtering process with a magnetic separator in order to remove these particles from film growth is presented. The separator provides a bent axial magnetic field that guides the material flux towards the substrate positioned at the exit of the separator. Since there is no line of sight between target and substrate, the separator prevents that the particles generated in the target area can reach the substrate. In this context, optical components were manufactured that reveal a particle density three times lower than optical components which were deposited using a conventional Ion Beam Sputtering process.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Oberflächen und Grenzflächen
- Werkstoffwissenschaften (insg.)
- Oberflächen, Beschichtungen und Folien
- Werkstoffwissenschaften (insg.)
- Metalle und Legierungen
- Werkstoffwissenschaften (insg.)
- Werkstoffchemie
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in: Thin Solid Films, Jahrgang 592, Nr. Part B, 17.05.2015, S. 271-275.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Towards a magnetic field separation in Ion Beam Sputtering processes
AU - Malobabic, Sina
AU - Jupé, Marco
AU - Kadhkoda, Puja
AU - Ristau, Detlev
N1 - Funding information: This work was financially supported by the “ Deutsche Forschungsgesellschaft ” (DFG) within the cluster of excellence 201 Quest.
PY - 2015/5/17
Y1 - 2015/5/17
N2 - Defects embedded in coatings due to particle contamination are considered as a primary factor limiting the quality of optical coatings in Ion Beam Sputtering. An approach combining the conventional Ion Beam Sputtering process with a magnetic separator in order to remove these particles from film growth is presented. The separator provides a bent axial magnetic field that guides the material flux towards the substrate positioned at the exit of the separator. Since there is no line of sight between target and substrate, the separator prevents that the particles generated in the target area can reach the substrate. In this context, optical components were manufactured that reveal a particle density three times lower than optical components which were deposited using a conventional Ion Beam Sputtering process.
AB - Defects embedded in coatings due to particle contamination are considered as a primary factor limiting the quality of optical coatings in Ion Beam Sputtering. An approach combining the conventional Ion Beam Sputtering process with a magnetic separator in order to remove these particles from film growth is presented. The separator provides a bent axial magnetic field that guides the material flux towards the substrate positioned at the exit of the separator. Since there is no line of sight between target and substrate, the separator prevents that the particles generated in the target area can reach the substrate. In this context, optical components were manufactured that reveal a particle density three times lower than optical components which were deposited using a conventional Ion Beam Sputtering process.
KW - Electromagnetic field separation
KW - Ion beam sputtering
KW - Particle reduction
KW - Plasma guiding
UR - http://www.scopus.com/inward/record.url?scp=84944280368&partnerID=8YFLogxK
U2 - 10.1016/j.tsf.2015.05.016
DO - 10.1016/j.tsf.2015.05.016
M3 - Article
AN - SCOPUS:84944280368
VL - 592
SP - 271
EP - 275
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
IS - Part B
ER -