Third harmonic (TH) generation: A tool to study dielectric material properties near the laser induced damage threshold (LIDT)

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autorschaft

  • Amir Khabbazi Oskouei
  • Luke Emmert
  • Morten Steinecke
  • Marco Jupé
  • Detlev Ristau
  • Lars Jensen
  • Wolfgang Rudolph

Externe Organisationen

  • University of New Mexico
  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des Sammelwerks51st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2019
Herausgeber (Verlag)SPIE
ISBN (elektronisch)9781510630550
PublikationsstatusVeröffentlicht - 20 Nov. 2019
Extern publiziertJa
Veranstaltung51st Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials 2019 - Broomfield, USA / Vereinigte Staaten
Dauer: 22 Sept. 201925 Sept. 2019
Konferenznummer: 51

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Band11173
ISSN (Print)0277-786X
ISSN (elektronisch)1996-756X

Abstract

Third harmonic generation (THG) in dielectric films with femtosecond laser pulses is used to study properties of dielectric thin films and stacks thereof below and above the 1-on-1 laser damage threshold. Deviations from the ideal cubic relationship between third-harmonic signal and incident fundamental fluence are a result of several fundamental processes. Their relative contributions are assessed by comparing results from LIDT and conversion efficiency measurements as well as beam profile and pump-probe studies.

ASJC Scopus Sachgebiete

Zitieren

Third harmonic (TH) generation: A tool to study dielectric material properties near the laser induced damage threshold (LIDT). / Khabbazi Oskouei, Amir; Emmert, Luke; Steinecke, Morten et al.
51st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2019. SPIE, 2019. 111731L (Proceedings of SPIE - The International Society for Optical Engineering; Band 11173).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Khabbazi Oskouei, A, Emmert, L, Steinecke, M, Jupé, M, Ristau, D, Jensen, L & Rudolph, W 2019, Third harmonic (TH) generation: A tool to study dielectric material properties near the laser induced damage threshold (LIDT). in 51st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2019., 111731L, Proceedings of SPIE - The International Society for Optical Engineering, Bd. 11173, SPIE, 51st Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials 2019, Broomfield, USA / Vereinigte Staaten, 22 Sept. 2019. https://doi.org/10.1117/12.2536440
Khabbazi Oskouei, A., Emmert, L., Steinecke, M., Jupé, M., Ristau, D., Jensen, L., & Rudolph, W. (2019). Third harmonic (TH) generation: A tool to study dielectric material properties near the laser induced damage threshold (LIDT). In 51st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2019 Artikel 111731L (Proceedings of SPIE - The International Society for Optical Engineering; Band 11173). SPIE. https://doi.org/10.1117/12.2536440
Khabbazi Oskouei A, Emmert L, Steinecke M, Jupé M, Ristau D, Jensen L et al. Third harmonic (TH) generation: A tool to study dielectric material properties near the laser induced damage threshold (LIDT). in 51st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2019. SPIE. 2019. 111731L. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2536440
Khabbazi Oskouei, Amir ; Emmert, Luke ; Steinecke, Morten et al. / Third harmonic (TH) generation : A tool to study dielectric material properties near the laser induced damage threshold (LIDT). 51st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2019. SPIE, 2019. (Proceedings of SPIE - The International Society for Optical Engineering).
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abstract = "Third harmonic generation (THG) in dielectric films with femtosecond laser pulses is used to study properties of dielectric thin films and stacks thereof below and above the 1-on-1 laser damage threshold. Deviations from the ideal cubic relationship between third-harmonic signal and incident fundamental fluence are a result of several fundamental processes. Their relative contributions are assessed by comparing results from LIDT and conversion efficiency measurements as well as beam profile and pump-probe studies.",
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