Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 19309-19318 |
| Seitenumfang | 10 |
| Fachzeitschrift | Optics express |
| Jahrgang | 31 |
| Ausgabenummer | 12 |
| Frühes Online-Datum | 25 Mai 2023 |
| Publikationsstatus | Veröffentlicht - 5 Juni 2023 |
Abstract
Third harmonic generation (THG) from dielectric layers is investigated. By forming a thin gradient of HfO2 with continuously increasing thickness, we are able to study this process in detail. This technique allows us to elucidate the influence of the substrate and to quantify the layered materials third χ(3)(3ω: ω, ω, ω) and even fifth order χ(5)(3ω: ω, ω, ω, ω, − ω) nonlinear susceptibility at the fundamental wavelength of 1030 nm. This is to the best of our knowledge the first measurement of the fifth order nonlinear susceptibility in thin dielectric layers.
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
Zitieren
- Standard
- Harvard
- Apa
- Vancouver
- BibTex
- RIS
in: Optics express, Jahrgang 31, Nr. 12, 05.06.2023, S. 19309-19318.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Third and fifth order nonlinear susceptibilities in thin HfO2 layers
AU - Zuber, David
AU - Kleinert, Sven
AU - Tajalli, Ayhan
AU - Steinecke, Morten
AU - Jupé, Marco
AU - Babushkin, Ihar
AU - Ristau, Detlev
AU - Morgner, Uwe
N1 - Funding Information: Deutsche Forschungsgemeinschaft (EXC 2122. ID: 390833453, Mo 850/16-2, RI 645/2-2); Bundesministerium für Bildung und Forschung (13N14064).
PY - 2023/6/5
Y1 - 2023/6/5
N2 - Third harmonic generation (THG) from dielectric layers is investigated. By forming a thin gradient of HfO2 with continuously increasing thickness, we are able to study this process in detail. This technique allows us to elucidate the influence of the substrate and to quantify the layered materials third χ(3)(3ω: ω, ω, ω) and even fifth order χ(5)(3ω: ω, ω, ω, ω, − ω) nonlinear susceptibility at the fundamental wavelength of 1030 nm. This is to the best of our knowledge the first measurement of the fifth order nonlinear susceptibility in thin dielectric layers.
AB - Third harmonic generation (THG) from dielectric layers is investigated. By forming a thin gradient of HfO2 with continuously increasing thickness, we are able to study this process in detail. This technique allows us to elucidate the influence of the substrate and to quantify the layered materials third χ(3)(3ω: ω, ω, ω) and even fifth order χ(5)(3ω: ω, ω, ω, ω, − ω) nonlinear susceptibility at the fundamental wavelength of 1030 nm. This is to the best of our knowledge the first measurement of the fifth order nonlinear susceptibility in thin dielectric layers.
UR - http://www.scopus.com/inward/record.url?scp=85163182165&partnerID=8YFLogxK
U2 - 10.1364/OE.486072
DO - 10.1364/OE.486072
M3 - Article
AN - SCOPUS:85163182165
VL - 31
SP - 19309
EP - 19318
JO - Optics express
JF - Optics express
SN - 1094-4087
IS - 12
ER -