Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Autoren

  • Holger Blaschke
  • Winfried Arens
  • Detlev Ristau
  • Sven Martin
  • Bincheng Li
  • Eberhard Welsch

Externe Organisationen

  • Friedrich-Schiller-Universität Jena
  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksLaser-induced damage in optical materials
Untertitel1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings
ErscheinungsortBellingham
Herausgeber (Verlag)SPIE
Seiten242-249
Seitenumfang8
ISBN (Print)0-8194-3508-2
PublikationsstatusVeröffentlicht - 3 März 2000
Extern publiziertJa
Veranstaltung31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999' - Boulder, CO, USA
Dauer: 4 Okt. 1999 → 7 Okt. 1999

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Herausgeber (Verlag)SPIE
Band3902
ISSN (Print)0277-786X

Abstract

HR layer stacks with increasing number of HL pairs of fluoride materials deposited on different substrates have been successfully investigated with respect to the laser radiation damage threshold at 248 nm and 193 nm. In this paper the investigation has been extended on resonant as well as non-resonant oxide coatings deposited by ion beam sputtering (IBS). Compared to conventional evaporation and plasma ion assisted evaporation technique, IBS coatings exhibit a higher packing density, thus preventing water to enter the film which would degrade the quality of the coatings. In contrast, the thermal stress is increased in IBS layer stacks. The measurements were carried out by use of the pulsed thermal lens technique enabling us to measure the advent of optical breakdown induced by laser fluences in the subdamage range.

ASJC Scopus Sachgebiete

Zitieren

Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. / Blaschke, Holger; Arens, Winfried; Ristau, Detlev et al.
Laser-induced damage in optical materials: 1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham: SPIE, 2000. S. 242-249 (Proceedings of SPIE - The International Society for Optical Engineering; Band 3902).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Blaschke, H, Arens, W, Ristau, D, Martin, S, Li, B & Welsch, E 2000, Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. in Laser-induced damage in optical materials: 1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings. Proceedings of SPIE - The International Society for Optical Engineering, Bd. 3902, SPIE, Bellingham, S. 242-249, 31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999', Boulder, CO, USA, 4 Okt. 1999. https://doi.org/10.1117/12.379306
Blaschke, H., Arens, W., Ristau, D., Martin, S., Li, B., & Welsch, E. (2000). Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. In Laser-induced damage in optical materials: 1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings (S. 242-249). (Proceedings of SPIE - The International Society for Optical Engineering; Band 3902). SPIE. https://doi.org/10.1117/12.379306
Blaschke H, Arens W, Ristau D, Martin S, Li B, Welsch E. Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. in Laser-induced damage in optical materials: 1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham: SPIE. 2000. S. 242-249. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.379306
Blaschke, Holger ; Arens, Winfried ; Ristau, Detlev et al. / Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. Laser-induced damage in optical materials: 1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham : SPIE, 2000. S. 242-249 (Proceedings of SPIE - The International Society for Optical Engineering).
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