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Systematic errors on curved microstructures caused by aberrations in confocal surface metrology

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

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OriginalspracheEnglisch
Seiten (von - bis)9640-9648
Seitenumfang9
FachzeitschriftOptics Express
Jahrgang23
Ausgabenummer8
PublikationsstatusVeröffentlicht - 2015

Abstract

Optical aberrations of microscope lenses are known as a source of systematic errors in confocal surface metrology, which has become one of the most popular methods to measure the surface topography of microstructures. We demonstrate that these errors are not constant over the entire field of view but also depend on the local slope angle of the microstructure and lead to significant deviations between the measured and the actual surface. It is shown by means of a full vectorial high NA numerical model that a change in the slope angle alters the shape of the intensity depth response of the microscope and leads to a shift of the intensity peak of up to several hundred nanometers. Comparative experimental data are presented which support the theoretical results. Our studies allow for correction of optical aberrations and, thus, increase the accuracy in profilometric measurements.

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Systematic errors on curved microstructures caused by aberrations in confocal surface metrology. / Rahlves, Maik; Roth, Bernhard; Reithmeier, Eduard.
in: Optics Express, Jahrgang 23, Nr. 8, 2015, S. 9640-9648.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Rahlves, Maik ; Roth, Bernhard ; Reithmeier, Eduard. / Systematic errors on curved microstructures caused by aberrations in confocal surface metrology. in: Optics Express. 2015 ; Jahrgang 23, Nr. 8. S. 9640-9648.
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AU - Roth, Bernhard

AU - Reithmeier, Eduard

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N2 - Optical aberrations of microscope lenses are known as a source of systematic errors in confocal surface metrology, which has become one of the most popular methods to measure the surface topography of microstructures. We demonstrate that these errors are not constant over the entire field of view but also depend on the local slope angle of the microstructure and lead to significant deviations between the measured and the actual surface. It is shown by means of a full vectorial high NA numerical model that a change in the slope angle alters the shape of the intensity depth response of the microscope and leads to a shift of the intensity peak of up to several hundred nanometers. Comparative experimental data are presented which support the theoretical results. Our studies allow for correction of optical aberrations and, thus, increase the accuracy in profilometric measurements.

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