Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 4-6 |
| Seitenumfang | 3 |
| Fachzeitschrift | Physica Status Solidi - Rapid Research Letters |
| Jahrgang | 6 |
| Ausgabenummer | 1 |
| Publikationsstatus | Veröffentlicht - 13 Dez. 2011 |
| Extern publiziert | Ja |
Abstract
In recent years Al 2O 3 has received tremendous interest in the photovoltaic community for the application as surface passivation layer for crystalline silicon. Especially p-type c-Si surfaces are very effectively passivated by Al 2O 3, including p-type emitters, due to the high fixed negative charge in the Al 2O 3 film. In this Letter we show that Al 2O 3 prepared by plasma-assisted atomic layer deposition (ALD) can actually provide a good level of surface passivation for highly doped n-type emitters in the range of 10-100 Ω/sq with implied-V oc values up to 680 mV. For n-type emitters in the range of 100-200 Ω/sq the implied-V oc drops to a value of 600 mV for a 200 Ω/sq emitter, indicating a decreased level of surface passivation. For even lighter doped n-type surfaces the passivation quality increases again to implied-V oc values well above 700 mV. Hence, the results presented here indicate that within a certain doping range, highly doped n- and p-type surfaces can be passivated simultaneously by Al 2O 3.
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- Werkstoffwissenschaften (insg.)
- Allgemeine Materialwissenschaften
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
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in: Physica Status Solidi - Rapid Research Letters, Jahrgang 6, Nr. 1, 13.12.2011, S. 4-6.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Surface passivation of phosphorus-diffused n +-type emitters by plasma-assisted atomic-layer deposited Al 2O 3
AU - Hoex, B.
AU - van de Sanden, M. C.M.
AU - Schmidt, J.
AU - Brendel, R.
AU - Kessels, W. M.M.
PY - 2011/12/13
Y1 - 2011/12/13
N2 - In recent years Al 2O 3 has received tremendous interest in the photovoltaic community for the application as surface passivation layer for crystalline silicon. Especially p-type c-Si surfaces are very effectively passivated by Al 2O 3, including p-type emitters, due to the high fixed negative charge in the Al 2O 3 film. In this Letter we show that Al 2O 3 prepared by plasma-assisted atomic layer deposition (ALD) can actually provide a good level of surface passivation for highly doped n-type emitters in the range of 10-100 Ω/sq with implied-V oc values up to 680 mV. For n-type emitters in the range of 100-200 Ω/sq the implied-V oc drops to a value of 600 mV for a 200 Ω/sq emitter, indicating a decreased level of surface passivation. For even lighter doped n-type surfaces the passivation quality increases again to implied-V oc values well above 700 mV. Hence, the results presented here indicate that within a certain doping range, highly doped n- and p-type surfaces can be passivated simultaneously by Al 2O 3.
AB - In recent years Al 2O 3 has received tremendous interest in the photovoltaic community for the application as surface passivation layer for crystalline silicon. Especially p-type c-Si surfaces are very effectively passivated by Al 2O 3, including p-type emitters, due to the high fixed negative charge in the Al 2O 3 film. In this Letter we show that Al 2O 3 prepared by plasma-assisted atomic layer deposition (ALD) can actually provide a good level of surface passivation for highly doped n-type emitters in the range of 10-100 Ω/sq with implied-V oc values up to 680 mV. For n-type emitters in the range of 100-200 Ω/sq the implied-V oc drops to a value of 600 mV for a 200 Ω/sq emitter, indicating a decreased level of surface passivation. For even lighter doped n-type surfaces the passivation quality increases again to implied-V oc values well above 700 mV. Hence, the results presented here indicate that within a certain doping range, highly doped n- and p-type surfaces can be passivated simultaneously by Al 2O 3.
KW - Aluminium oxide
KW - N-type emitters
KW - Solar cells
KW - Surface passivation
UR - http://www.scopus.com/inward/record.url?scp=83455236144&partnerID=8YFLogxK
U2 - 10.1002/pssr.201105445
DO - 10.1002/pssr.201105445
M3 - Article
AN - SCOPUS:83455236144
VL - 6
SP - 4
EP - 6
JO - Physica Status Solidi - Rapid Research Letters
JF - Physica Status Solidi - Rapid Research Letters
SN - 1862-6254
IS - 1
ER -