Structural characterization of SinC δ layers embedded in a silicon matrix

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • S. Ruvimov
  • E. Bugiel
  • H. J. Osten

Externe Organisationen

  • Leibniz-Institut für innovative Mikroelektronik (IHP)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)2323-2327
Seitenumfang5
FachzeitschriftJournal of applied physics
Jahrgang78
Ausgabenummer4
PublikationsstatusVeröffentlicht - 15 Aug. 1995
Extern publiziertJa

Abstract

Besides a great variety of carbon-containing atomic complexes and precipitates in crystalline silicon, new ordered silicon-carbon structures have recently been predicted theoretically by ab initio calculations [Rücker, Methfessel, Bugiel, and Osten, Phys. Rev. Lett. 72, 3578 (1994)] to be possible in highly C-doped epitaxial layers. These layers are strain stabilized. Due to the high mismatch in lattice parameters, pseudomorphic growth is restricted to layer thicknesses of some monolayers only. Four-hundred kV high resolution electron microscopy (HREM) has been applied to study the microscopic structure of the SinC layers grown by molecular beam epitaxy on (001)-oriented silicon substrate. Local ordering of the carbon with a quasiperiodical variation of its distribution over the layer has been observed on HREM micrographs at certain imaging conditions.

ASJC Scopus Sachgebiete

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Structural characterization of SinC δ layers embedded in a silicon matrix. / Ruvimov, S.; Bugiel, E.; Osten, H. J.
in: Journal of applied physics, Jahrgang 78, Nr. 4, 15.08.1995, S. 2323-2327.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Ruvimov S, Bugiel E, Osten HJ. Structural characterization of SinC δ layers embedded in a silicon matrix. Journal of applied physics. 1995 Aug 15;78(4):2323-2327. doi: 10.1063/1.360149
Ruvimov, S. ; Bugiel, E. ; Osten, H. J. / Structural characterization of SinC δ layers embedded in a silicon matrix. in: Journal of applied physics. 1995 ; Jahrgang 78, Nr. 4. S. 2323-2327.
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@article{7f2522200a8245babb98495b585b4704,
title = "Structural characterization of SinC δ layers embedded in a silicon matrix",
abstract = "Besides a great variety of carbon-containing atomic complexes and precipitates in crystalline silicon, new ordered silicon-carbon structures have recently been predicted theoretically by ab initio calculations [R{\"u}cker, Methfessel, Bugiel, and Osten, Phys. Rev. Lett. 72, 3578 (1994)] to be possible in highly C-doped epitaxial layers. These layers are strain stabilized. Due to the high mismatch in lattice parameters, pseudomorphic growth is restricted to layer thicknesses of some monolayers only. Four-hundred kV high resolution electron microscopy (HREM) has been applied to study the microscopic structure of the SinC layers grown by molecular beam epitaxy on (001)-oriented silicon substrate. Local ordering of the carbon with a quasiperiodical variation of its distribution over the layer has been observed on HREM micrographs at certain imaging conditions.",
author = "S. Ruvimov and E. Bugiel and Osten, {H. J.}",
year = "1995",
month = aug,
day = "15",
doi = "10.1063/1.360149",
language = "English",
volume = "78",
pages = "2323--2327",
journal = "Journal of applied physics",
issn = "0021-8979",
publisher = "American Institute of Physics",
number = "4",

}

Download

TY - JOUR

T1 - Structural characterization of SinC δ layers embedded in a silicon matrix

AU - Ruvimov, S.

AU - Bugiel, E.

AU - Osten, H. J.

PY - 1995/8/15

Y1 - 1995/8/15

N2 - Besides a great variety of carbon-containing atomic complexes and precipitates in crystalline silicon, new ordered silicon-carbon structures have recently been predicted theoretically by ab initio calculations [Rücker, Methfessel, Bugiel, and Osten, Phys. Rev. Lett. 72, 3578 (1994)] to be possible in highly C-doped epitaxial layers. These layers are strain stabilized. Due to the high mismatch in lattice parameters, pseudomorphic growth is restricted to layer thicknesses of some monolayers only. Four-hundred kV high resolution electron microscopy (HREM) has been applied to study the microscopic structure of the SinC layers grown by molecular beam epitaxy on (001)-oriented silicon substrate. Local ordering of the carbon with a quasiperiodical variation of its distribution over the layer has been observed on HREM micrographs at certain imaging conditions.

AB - Besides a great variety of carbon-containing atomic complexes and precipitates in crystalline silicon, new ordered silicon-carbon structures have recently been predicted theoretically by ab initio calculations [Rücker, Methfessel, Bugiel, and Osten, Phys. Rev. Lett. 72, 3578 (1994)] to be possible in highly C-doped epitaxial layers. These layers are strain stabilized. Due to the high mismatch in lattice parameters, pseudomorphic growth is restricted to layer thicknesses of some monolayers only. Four-hundred kV high resolution electron microscopy (HREM) has been applied to study the microscopic structure of the SinC layers grown by molecular beam epitaxy on (001)-oriented silicon substrate. Local ordering of the carbon with a quasiperiodical variation of its distribution over the layer has been observed on HREM micrographs at certain imaging conditions.

UR - http://www.scopus.com/inward/record.url?scp=0000774109&partnerID=8YFLogxK

U2 - 10.1063/1.360149

DO - 10.1063/1.360149

M3 - Article

AN - SCOPUS:0000774109

VL - 78

SP - 2323

EP - 2327

JO - Journal of applied physics

JF - Journal of applied physics

SN - 0021-8979

IS - 4

ER -