Stress Reduction in Sputtered Thin NiFe 81/19 Layers for Magnetic Field Sensors

Publikation: Beitrag in FachzeitschriftKonferenzaufsatz in FachzeitschriftForschung

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OriginalspracheEnglisch
Seiten (von - bis)162-168
FachzeitschriftProcedia Technology
Jahrgang26
PublikationsstatusVeröffentlicht - 1 Okt. 2016

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Stress Reduction in Sputtered Thin NiFe 81/19 Layers for Magnetic Field Sensors. / Jogschies, Lisa; Rittinger, Johannes; Klaas, Daniel et al.
in: Procedia Technology, Jahrgang 26, 01.10.2016, S. 162-168.

Publikation: Beitrag in FachzeitschriftKonferenzaufsatz in FachzeitschriftForschung

Jogschies L, Rittinger J, Klaas D, Wurz M. Stress Reduction in Sputtered Thin NiFe 81/19 Layers for Magnetic Field Sensors. Procedia Technology. 2016 Okt 1;26:162-168. doi: 10.1016/j.protcy.2016.08.022
Jogschies, Lisa ; Rittinger, Johannes ; Klaas, Daniel et al. / Stress Reduction in Sputtered Thin NiFe 81/19 Layers for Magnetic Field Sensors. in: Procedia Technology. 2016 ; Jahrgang 26. S. 162-168.
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AU - Jogschies, Lisa

AU - Rittinger, Johannes

AU - Klaas, Daniel

AU - Wurz, Marc

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KW - Flexible Substrate

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