Stress compensated anti-reflection coating for high power laser deposited with IBS SiO 2 and ALD Al 2 O 3

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Autoren

  • Hao Liu
  • Lars Jensen
  • Ping Ma
  • Detlev Ristau

Organisationseinheiten

Externe Organisationen

  • Chengdu Fine Optical Engineering Research Center
  • Laser Zentrum Hannover e.V. (LZH)
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Details

OriginalspracheEnglisch
Seiten (von - bis)521-527
Seitenumfang7
FachzeitschriftApplied Surface Science
Jahrgang476
Frühes Online-Datum16 Jan. 2019
PublikationsstatusVeröffentlicht - 15 Mai 2019

Abstract

Both low stress and high laser induced damage threshold are required in the development of high power large laser facilities. IBS and ALD films have potential in such applications in aspects of film thickness control and high LIDT, but their severe stresses cause an obstacle towards the widely application. The origin of compressive stress of IBS coating and tensile stress of ALD coating is analyzed with a model based on intermolecular potential. An anti-reflection coating having compensated stress is designed and fabricated with ALD Al 2 O 3 and IBS SiO 2 . The LIDT of the anti-reflection coating as well as the single layers are tested at wavelength 532 nm. A transmittance of 96.5% at single surface and a stress as low as 38 MPa are achieved. The LIDT of the anti-reflection coating is limited by the additional defects introduced at the film interfaces. This design takes advantage of the power resistance of IBS/ALD coatings and their contrary stresses, providing a concept towards the application in high power laser systems.

ASJC Scopus Sachgebiete

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Stress compensated anti-reflection coating for high power laser deposited with IBS SiO 2 and ALD Al 2 O 3. / Liu, Hao; Jensen, Lars; Ma, Ping et al.
in: Applied Surface Science, Jahrgang 476, 15.05.2019, S. 521-527.

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Liu H, Jensen L, Ma P, Ristau D. Stress compensated anti-reflection coating for high power laser deposited with IBS SiO 2 and ALD Al 2 O 3. Applied Surface Science. 2019 Mai 15;476:521-527. Epub 2019 Jan 16. doi: 10.1016/j.apsusc.2019.01.125
Liu, Hao ; Jensen, Lars ; Ma, Ping et al. / Stress compensated anti-reflection coating for high power laser deposited with IBS SiO 2 and ALD Al 2 O 3. in: Applied Surface Science. 2019 ; Jahrgang 476. S. 521-527.
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AU - Liu, Hao

AU - Jensen, Lars

AU - Ma, Ping

AU - Ristau, Detlev

N1 - Funding Information: This study is funded by the China Scholarship Committee. Acknowledgement: The experiment is assisted by Mr. Jürgen Becker in Produktionstechnisches Zentrum Hannover.

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N2 - Both low stress and high laser induced damage threshold are required in the development of high power large laser facilities. IBS and ALD films have potential in such applications in aspects of film thickness control and high LIDT, but their severe stresses cause an obstacle towards the widely application. The origin of compressive stress of IBS coating and tensile stress of ALD coating is analyzed with a model based on intermolecular potential. An anti-reflection coating having compensated stress is designed and fabricated with ALD Al 2 O 3 and IBS SiO 2 . The LIDT of the anti-reflection coating as well as the single layers are tested at wavelength 532 nm. A transmittance of 96.5% at single surface and a stress as low as 38 MPa are achieved. The LIDT of the anti-reflection coating is limited by the additional defects introduced at the film interfaces. This design takes advantage of the power resistance of IBS/ALD coatings and their contrary stresses, providing a concept towards the application in high power laser systems.

AB - Both low stress and high laser induced damage threshold are required in the development of high power large laser facilities. IBS and ALD films have potential in such applications in aspects of film thickness control and high LIDT, but their severe stresses cause an obstacle towards the widely application. The origin of compressive stress of IBS coating and tensile stress of ALD coating is analyzed with a model based on intermolecular potential. An anti-reflection coating having compensated stress is designed and fabricated with ALD Al 2 O 3 and IBS SiO 2 . The LIDT of the anti-reflection coating as well as the single layers are tested at wavelength 532 nm. A transmittance of 96.5% at single surface and a stress as low as 38 MPa are achieved. The LIDT of the anti-reflection coating is limited by the additional defects introduced at the film interfaces. This design takes advantage of the power resistance of IBS/ALD coatings and their contrary stresses, providing a concept towards the application in high power laser systems.

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