Strain-stabilized structures on silicon grown with MBE

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • H. J. Osten
  • H. Rücker
  • M. Methfessel
  • E. Bugiel
  • S. Ruvimov
  • G. Lippert

Externe Organisationen

  • Leibniz-Institut für innovative Mikroelektronik (IHP)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)405-409
Seitenumfang5
FachzeitschriftJournal of crystal growth
Jahrgang157
Ausgabenummer1-4
PublikationsstatusVeröffentlicht - Dez. 1995
Extern publiziertJa

Abstract

Calculations predict that thin layers of certain ordered SinC (n ≥ 4) structures embedded in silicon are considerably more stable than isolated C impurities. These pseudomorphic layers (with carbon concentrations up to 20%) are thermodynamically forbidden. They can only exist due to strain-stabilization. Such layers were grown by molecular beam epitaxy and characterized with high resolution electron microscopy and X-ray photoelectron spectroscopy. The experimental results support the theoretical predictions. Carbon atoms deposited on silicon at moderate temperatures tend not to stay at the surface, but instead readily migrate into the crystal to form a narrow region with high carbon concentration. The energy barrier for this process is much smaller than that for diffusion in the bulk.

ASJC Scopus Sachgebiete

Zitieren

Strain-stabilized structures on silicon grown with MBE. / Osten, H. J.; Rücker, H.; Methfessel, M. et al.
in: Journal of crystal growth, Jahrgang 157, Nr. 1-4, 12.1995, S. 405-409.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Osten, HJ, Rücker, H, Methfessel, M, Bugiel, E, Ruvimov, S & Lippert, G 1995, 'Strain-stabilized structures on silicon grown with MBE', Journal of crystal growth, Jg. 157, Nr. 1-4, S. 405-409. https://doi.org/10.1016/0022-0248(95)00332-0
Osten, H. J., Rücker, H., Methfessel, M., Bugiel, E., Ruvimov, S., & Lippert, G. (1995). Strain-stabilized structures on silicon grown with MBE. Journal of crystal growth, 157(1-4), 405-409. https://doi.org/10.1016/0022-0248(95)00332-0
Osten HJ, Rücker H, Methfessel M, Bugiel E, Ruvimov S, Lippert G. Strain-stabilized structures on silicon grown with MBE. Journal of crystal growth. 1995 Dez;157(1-4):405-409. doi: 10.1016/0022-0248(95)00332-0
Osten, H. J. ; Rücker, H. ; Methfessel, M. et al. / Strain-stabilized structures on silicon grown with MBE. in: Journal of crystal growth. 1995 ; Jahrgang 157, Nr. 1-4. S. 405-409.
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TY - JOUR

T1 - Strain-stabilized structures on silicon grown with MBE

AU - Osten, H. J.

AU - Rücker, H.

AU - Methfessel, M.

AU - Bugiel, E.

AU - Ruvimov, S.

AU - Lippert, G.

PY - 1995/12

Y1 - 1995/12

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AB - Calculations predict that thin layers of certain ordered SinC (n ≥ 4) structures embedded in silicon are considerably more stable than isolated C impurities. These pseudomorphic layers (with carbon concentrations up to 20%) are thermodynamically forbidden. They can only exist due to strain-stabilization. Such layers were grown by molecular beam epitaxy and characterized with high resolution electron microscopy and X-ray photoelectron spectroscopy. The experimental results support the theoretical predictions. Carbon atoms deposited on silicon at moderate temperatures tend not to stay at the surface, but instead readily migrate into the crystal to form a narrow region with high carbon concentration. The energy barrier for this process is much smaller than that for diffusion in the bulk.

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JF - Journal of crystal growth

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