Strain-stabilized highly concentrated pseudomorphic Si1-xCx layers in Si

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • H. Rücker
  • M. Methfessel
  • E. Bugiel
  • H. J. Osten

Externe Organisationen

  • Leibniz-Institut für innovative Mikroelektronik (IHP)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)3578-3581
Seitenumfang4
FachzeitschriftPhysical review letters
Jahrgang72
Ausgabenummer22
PublikationsstatusVeröffentlicht - 1994
Extern publiziertJa

Abstract

We present evidence that Si1-xCx layers with x0.20 can be grown pseudomorphically on a Si (001) substrate despite the large difference of the C and Si lattice constants. Calculations based on density-functional theory and a Keating model predict that embedded layers of certain structures with stoichiometry Sin-1C where n=5,6,... are considerably more stable than isolated C impurities. The common feature of these structures is that the carbon atoms tend to arrange as third-nearest neighbors. Multilayer structures grown by molecular beam epitaxy strongly suggest that defect-free heterostructures with such high C concentrations can be fabricated.

ASJC Scopus Sachgebiete

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Strain-stabilized highly concentrated pseudomorphic Si1-xCx layers in Si. / Rücker, H.; Methfessel, M.; Bugiel, E. et al.
in: Physical review letters, Jahrgang 72, Nr. 22, 1994, S. 3578-3581.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Rücker H, Methfessel M, Bugiel E, Osten HJ. Strain-stabilized highly concentrated pseudomorphic Si1-xCx layers in Si. Physical review letters. 1994;72(22):3578-3581. doi: 10.1103/PhysRevLett.72.3578
Rücker, H. ; Methfessel, M. ; Bugiel, E. et al. / Strain-stabilized highly concentrated pseudomorphic Si1-xCx layers in Si. in: Physical review letters. 1994 ; Jahrgang 72, Nr. 22. S. 3578-3581.
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