Steps on current-voltage characteristics of a silicon quantum dot covered by natural oxide

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OriginalspracheEnglisch
Seiten (von - bis)568-571
Seitenumfang4
FachzeitschriftJETP letters
Jahrgang76
Ausgabenummer9
PublikationsstatusVeröffentlicht - 10 Nov. 2002

Abstract

Considering a double-barrier structure formed by a silicon quantum dot covered by natural oxide with two metallic terminals, we derive simple conditions for a steplike voltage-current curve. Due to standard chemical properties, doping phosphorus atoms located in a certain domain of the dot form geometrically parallel current channels. The height of the current step typically equals (1.2 pA)N, where N = 0, 1, 2, 3... is the number of doping atoms inside the domain, and only negligibly depends on the actual position of the dopants. The found conditions are feasible in experimentally available structures.

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Steps on current-voltage characteristics of a silicon quantum dot covered by natural oxide. / Vyshenski, S. V.; Zeitler, U.; Haug, R. J.
in: JETP letters, Jahrgang 76, Nr. 9, 10.11.2002, S. 568-571.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Vyshenski SV, Zeitler U, Haug RJ. Steps on current-voltage characteristics of a silicon quantum dot covered by natural oxide. JETP letters. 2002 Nov 10;76(9):568-571. doi: 10.1134/1.1538291
Vyshenski, S. V. ; Zeitler, U. ; Haug, R. J. / Steps on current-voltage characteristics of a silicon quantum dot covered by natural oxide. in: JETP letters. 2002 ; Jahrgang 76, Nr. 9. S. 568-571.
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