Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries |
| Erscheinungsort | Bellingham |
| Herausgeber (Verlag) | SPIE |
| Seiten | 91-109 |
| Seitenumfang | 19 |
| ISBN (Print) | 0-8194-3744-1 |
| Publikationsstatus | Veröffentlicht - 2 Nov. 2000 |
| Extern publiziert | Ja |
| Veranstaltung | Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries - San Diego, CA, USA Dauer: 30 Juli 2000 → 31 Juli 2000 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Herausgeber (Verlag) | SPIE |
| Band | 4099 |
| ISSN (Print) | 0277-786X |
Abstract
In many advanced fields of optical technology, progresses are extremely dependent on reliable characterization procedures employed for quality assessment in volume manufacturing as well as for the optimization of high performance optical components. With the rapid development of laser technology and modern optics, especially optical metrology gained of importance for the quality management in the industrial production environment and also for research in optical components. Besides absorption and scatter losses, the spectral characteristics and laser induced damage thresholds are considered nowadays as common quality factors, which are often indicated in optics catalogues and are considered by the customers for the design of optical systems. As a consequence of this trend, standardization of measurement procedures for the characterization of optical components became a crucial point for the optics industry and for critical applications of optical components in laser systems as well as conventional optical devices. During the last decade, adapted standard measurement techniques have been elaborated and discussed in the Technical Committee ISO/TC 172 of the International Organization for Standardization (ISO) resulting in practical International Standards or Draft Standards for the measurement of optical absorption, scattering, reflectance and laser induced damage thresholds. In this paper, the current state of standardized characterization techniques for optical components is summarized. Selected standards for the measurement of absorption (ISO 11551), scattering (ISO/DIS 13696) and laser induced damage thresholds (ISO/DIS 11254, Parts 1 and 2) will be described and discussed in view of recent trends in laser technology and its applications in semiconductor lithography.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
Zitieren
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- BibTex
- RIS
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries. Bellingham: SPIE, 2000. S. 91-109 (Proceedings of SPIE - The International Society for Optical Engineering; Band 4099).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Standardization in optics characterization
AU - Ristau, Detlev
PY - 2000/11/2
Y1 - 2000/11/2
N2 - In many advanced fields of optical technology, progresses are extremely dependent on reliable characterization procedures employed for quality assessment in volume manufacturing as well as for the optimization of high performance optical components. With the rapid development of laser technology and modern optics, especially optical metrology gained of importance for the quality management in the industrial production environment and also for research in optical components. Besides absorption and scatter losses, the spectral characteristics and laser induced damage thresholds are considered nowadays as common quality factors, which are often indicated in optics catalogues and are considered by the customers for the design of optical systems. As a consequence of this trend, standardization of measurement procedures for the characterization of optical components became a crucial point for the optics industry and for critical applications of optical components in laser systems as well as conventional optical devices. During the last decade, adapted standard measurement techniques have been elaborated and discussed in the Technical Committee ISO/TC 172 of the International Organization for Standardization (ISO) resulting in practical International Standards or Draft Standards for the measurement of optical absorption, scattering, reflectance and laser induced damage thresholds. In this paper, the current state of standardized characterization techniques for optical components is summarized. Selected standards for the measurement of absorption (ISO 11551), scattering (ISO/DIS 13696) and laser induced damage thresholds (ISO/DIS 11254, Parts 1 and 2) will be described and discussed in view of recent trends in laser technology and its applications in semiconductor lithography.
AB - In many advanced fields of optical technology, progresses are extremely dependent on reliable characterization procedures employed for quality assessment in volume manufacturing as well as for the optimization of high performance optical components. With the rapid development of laser technology and modern optics, especially optical metrology gained of importance for the quality management in the industrial production environment and also for research in optical components. Besides absorption and scatter losses, the spectral characteristics and laser induced damage thresholds are considered nowadays as common quality factors, which are often indicated in optics catalogues and are considered by the customers for the design of optical systems. As a consequence of this trend, standardization of measurement procedures for the characterization of optical components became a crucial point for the optics industry and for critical applications of optical components in laser systems as well as conventional optical devices. During the last decade, adapted standard measurement techniques have been elaborated and discussed in the Technical Committee ISO/TC 172 of the International Organization for Standardization (ISO) resulting in practical International Standards or Draft Standards for the measurement of optical absorption, scattering, reflectance and laser induced damage thresholds. In this paper, the current state of standardized characterization techniques for optical components is summarized. Selected standards for the measurement of absorption (ISO 11551), scattering (ISO/DIS 13696) and laser induced damage thresholds (ISO/DIS 11254, Parts 1 and 2) will be described and discussed in view of recent trends in laser technology and its applications in semiconductor lithography.
UR - http://www.scopus.com/inward/record.url?scp=0034544840&partnerID=8YFLogxK
U2 - 10.1117/12.405811
DO - 10.1117/12.405811
M3 - Conference contribution
AN - SCOPUS:0034544840
SN - 0-8194-3744-1
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 91
EP - 109
BT - Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
PB - SPIE
CY - Bellingham
T2 - Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Y2 - 30 July 2000 through 31 July 2000
ER -