Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Optical metrology roadmap for the semiconductor, optical, and data storage industries |
| Untertitel | 30 - 31 July 2000, San Diego, USA |
| Erscheinungsort | Bellingham |
| Herausgeber (Verlag) | SPIE |
| Seiten | 299-310 |
| Seitenumfang | 12 |
| ISBN (Print) | 0-8194-3744-1 |
| Publikationsstatus | Veröffentlicht - 2 Nov. 2000 |
| Extern publiziert | Ja |
| Veranstaltung | Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries - San Diego, CA, USA Dauer: 30 Juli 2000 → 31 Juli 2000 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Herausgeber (Verlag) | SPIE |
| Band | 4099 |
| ISSN (Print) | 0277-786X |
Abstract
The intrinsic absorption of fluoride coating materials tends to higher values in the DUV/VUV spectral range. In respect to applications of this material class for DUV/VUV multilayer systems, like high reflecting mirrors and antireflective coatings, the control of absorption is essential for further improvement of the coating quality. However, the reliable determination of absorption losses by photometric techniques has to overcome various obstacles caused by light absorption in air, scattering effects of the coating, and absorption related to contamination of the employed fluoride material. In this contribution spectrophotometric measurements for the characterization of optical data of MgF2 and LaF3 single layers and multilayer systems are presented. An advanced VUV/DUV-spectrophotometer, which has been developed at the Laser Zentrum Hannover for the optimization of thin film production processes, is described. The subsequent optical data evaluation for fluoride single layer coatings is reported and the optical data, n and k, of MgF2 and LaF3 for the spectral range from 130 to 600 nm are presented. Transmittance and reflectance measurements of multilayer coating systems are compared to theoretical calculations for these systems on the basis of the evaluated optical data of the single layers. Observed deviations are discussed under respect of contaminations of the fluoride layer systems.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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Optical metrology roadmap for the semiconductor, optical, and data storage industries: 30 - 31 July 2000, San Diego, USA. Bellingham: SPIE, 2000. S. 299-310 (Proceedings of SPIE - The International Society for Optical Engineering; Band 4099).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Spectrophotometric determination of absorption in the DUV/VUV spectral range for MgF2 and LaF3 thin films
AU - Guenster, Stefan
AU - Ristau, Detlev
AU - Bosch-Puig, Salvador
PY - 2000/11/2
Y1 - 2000/11/2
N2 - The intrinsic absorption of fluoride coating materials tends to higher values in the DUV/VUV spectral range. In respect to applications of this material class for DUV/VUV multilayer systems, like high reflecting mirrors and antireflective coatings, the control of absorption is essential for further improvement of the coating quality. However, the reliable determination of absorption losses by photometric techniques has to overcome various obstacles caused by light absorption in air, scattering effects of the coating, and absorption related to contamination of the employed fluoride material. In this contribution spectrophotometric measurements for the characterization of optical data of MgF2 and LaF3 single layers and multilayer systems are presented. An advanced VUV/DUV-spectrophotometer, which has been developed at the Laser Zentrum Hannover for the optimization of thin film production processes, is described. The subsequent optical data evaluation for fluoride single layer coatings is reported and the optical data, n and k, of MgF2 and LaF3 for the spectral range from 130 to 600 nm are presented. Transmittance and reflectance measurements of multilayer coating systems are compared to theoretical calculations for these systems on the basis of the evaluated optical data of the single layers. Observed deviations are discussed under respect of contaminations of the fluoride layer systems.
AB - The intrinsic absorption of fluoride coating materials tends to higher values in the DUV/VUV spectral range. In respect to applications of this material class for DUV/VUV multilayer systems, like high reflecting mirrors and antireflective coatings, the control of absorption is essential for further improvement of the coating quality. However, the reliable determination of absorption losses by photometric techniques has to overcome various obstacles caused by light absorption in air, scattering effects of the coating, and absorption related to contamination of the employed fluoride material. In this contribution spectrophotometric measurements for the characterization of optical data of MgF2 and LaF3 single layers and multilayer systems are presented. An advanced VUV/DUV-spectrophotometer, which has been developed at the Laser Zentrum Hannover for the optimization of thin film production processes, is described. The subsequent optical data evaluation for fluoride single layer coatings is reported and the optical data, n and k, of MgF2 and LaF3 for the spectral range from 130 to 600 nm are presented. Transmittance and reflectance measurements of multilayer coating systems are compared to theoretical calculations for these systems on the basis of the evaluated optical data of the single layers. Observed deviations are discussed under respect of contaminations of the fluoride layer systems.
UR - http://www.scopus.com/inward/record.url?scp=0034538678&partnerID=8YFLogxK
U2 - 10.1117/12.405830
DO - 10.1117/12.405830
M3 - Conference contribution
AN - SCOPUS:0034538678
SN - 0-8194-3744-1
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 299
EP - 310
BT - Optical metrology roadmap for the semiconductor, optical, and data storage industries
PB - SPIE
CY - Bellingham
T2 - Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Y2 - 30 July 2000 through 31 July 2000
ER -