Selectivity of TiOx ‐Based Electron‐Selective Contacts on n‐Type Crystalline Silicon and Solar Cell Efficiency Potential

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autorschaft

Organisationseinheiten

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Aufsatznummer2100246
Fachzeitschriftphysica status solidi (RRL) – Rapid Research Letters
Jahrgang15
Ausgabenummer9
Frühes Online-Datum23 Juni 2021
PublikationsstatusVeröffentlicht - 16 Sept. 2021

Abstract

The selectivity parameter S 10 of titanium oxide (TiO x)-based selective contacts on n-type silicon is experimentally extracted through measurements of the specific contact resistivity ρ c and the recombination current density prefactor J 0, both parameters measured on fully Al-metallized samples. The contact resistivity ρ c is determined applying the Cox and Strack method and the J 0 values are extracted using dynamic infrared lifetime mapping, allowing for contactless lifetime measurements on fully metallized silicon samples in contrast to conventionally applied lifetime measurement techniques. The highest selectivity after annealing of an n-Si/SiO y/TiO x/Al contact is determined to be S 10 = 11.6, which corresponds to a maximum achievable efficiency of 24.1% for this type of electron-selective contact. The maximum selectivity is achieved after low-temperature annealing at 500 °C or through a contact-firing step at a set-peak temperature of 820 °C in an industrial conveyor-belt furnace, as used in today's commercial solar cell production.

ASJC Scopus Sachgebiete

Zitieren

Selectivity of TiOx ‐Based Electron‐Selective Contacts on n‐Type Crystalline Silicon and Solar Cell Efficiency Potential. / Titova, Valeriya; Schmidt, Jan.
in: physica status solidi (RRL) – Rapid Research Letters, Jahrgang 15, Nr. 9, 2100246, 16.09.2021.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Download
@article{5b153f66cbd34bb195004728975d7423,
title = "Selectivity of TiOx ‐Based Electron‐Selective Contacts on n‐Type Crystalline Silicon and Solar Cell Efficiency Potential",
abstract = "The selectivity parameter S 10 of titanium oxide (TiO x)-based selective contacts on n-type silicon is experimentally extracted through measurements of the specific contact resistivity ρ c and the recombination current density prefactor J 0, both parameters measured on fully Al-metallized samples. The contact resistivity ρ c is determined applying the Cox and Strack method and the J 0 values are extracted using dynamic infrared lifetime mapping, allowing for contactless lifetime measurements on fully metallized silicon samples in contrast to conventionally applied lifetime measurement techniques. The highest selectivity after annealing of an n-Si/SiO y/TiO x/Al contact is determined to be S 10 = 11.6, which corresponds to a maximum achievable efficiency of 24.1% for this type of electron-selective contact. The maximum selectivity is achieved after low-temperature annealing at 500 °C or through a contact-firing step at a set-peak temperature of 820 °C in an industrial conveyor-belt furnace, as used in today's commercial solar cell production. ",
keywords = "atomic layer deposition, contact resistivities, electron-selective contacts, selectivities, SiO /TiO /Al stacks, titanium oxide",
author = "Valeriya Titova and Jan Schmidt",
note = "Funding Information: Funding was proved by the German State of Lower Saxony and the German Federal Environmental Foundation (DBU). Open access funding enabled and organized by Projekt DEAL.",
year = "2021",
month = sep,
day = "16",
doi = "10.1002/pssr.202100246",
language = "English",
volume = "15",
journal = "physica status solidi (RRL) – Rapid Research Letters",
issn = "1862-6270",
publisher = "Wiley-VCH Verlag",
number = "9",

}

Download

TY - JOUR

T1 - Selectivity of TiOx ‐Based Electron‐Selective Contacts on n‐Type Crystalline Silicon and Solar Cell Efficiency Potential

AU - Titova, Valeriya

AU - Schmidt, Jan

N1 - Funding Information: Funding was proved by the German State of Lower Saxony and the German Federal Environmental Foundation (DBU). Open access funding enabled and organized by Projekt DEAL.

PY - 2021/9/16

Y1 - 2021/9/16

N2 - The selectivity parameter S 10 of titanium oxide (TiO x)-based selective contacts on n-type silicon is experimentally extracted through measurements of the specific contact resistivity ρ c and the recombination current density prefactor J 0, both parameters measured on fully Al-metallized samples. The contact resistivity ρ c is determined applying the Cox and Strack method and the J 0 values are extracted using dynamic infrared lifetime mapping, allowing for contactless lifetime measurements on fully metallized silicon samples in contrast to conventionally applied lifetime measurement techniques. The highest selectivity after annealing of an n-Si/SiO y/TiO x/Al contact is determined to be S 10 = 11.6, which corresponds to a maximum achievable efficiency of 24.1% for this type of electron-selective contact. The maximum selectivity is achieved after low-temperature annealing at 500 °C or through a contact-firing step at a set-peak temperature of 820 °C in an industrial conveyor-belt furnace, as used in today's commercial solar cell production.

AB - The selectivity parameter S 10 of titanium oxide (TiO x)-based selective contacts on n-type silicon is experimentally extracted through measurements of the specific contact resistivity ρ c and the recombination current density prefactor J 0, both parameters measured on fully Al-metallized samples. The contact resistivity ρ c is determined applying the Cox and Strack method and the J 0 values are extracted using dynamic infrared lifetime mapping, allowing for contactless lifetime measurements on fully metallized silicon samples in contrast to conventionally applied lifetime measurement techniques. The highest selectivity after annealing of an n-Si/SiO y/TiO x/Al contact is determined to be S 10 = 11.6, which corresponds to a maximum achievable efficiency of 24.1% for this type of electron-selective contact. The maximum selectivity is achieved after low-temperature annealing at 500 °C or through a contact-firing step at a set-peak temperature of 820 °C in an industrial conveyor-belt furnace, as used in today's commercial solar cell production.

KW - atomic layer deposition

KW - contact resistivities

KW - electron-selective contacts

KW - selectivities

KW - SiO /TiO /Al stacks

KW - titanium oxide

UR - http://www.scopus.com/inward/record.url?scp=85109380127&partnerID=8YFLogxK

U2 - 10.1002/pssr.202100246

DO - 10.1002/pssr.202100246

M3 - Article

VL - 15

JO - physica status solidi (RRL) – Rapid Research Letters

JF - physica status solidi (RRL) – Rapid Research Letters

SN - 1862-6270

IS - 9

M1 - 2100246

ER -

Von denselben Autoren