Scaling of laser-induced contamination growth at 266nm and 355nm

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autorschaft

  • Matthias Ließmann
  • Lars Jensen
  • Istvan Balasa
  • M. Hunnekuhl
  • A. Buttner
  • Peter Weßels
  • Jörg Neumann
  • Detlev Ristau

Externe Organisationen

  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des Sammelwerks47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
Untertitel2015
Herausgeber (Verlag)SPIE
ISBN (elektronisch)9781628418323
PublikationsstatusVeröffentlicht - 23 Nov. 2015
Extern publiziertJa
Veranstaltung47th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2015 - Boulder, USA / Vereinigte Staaten
Dauer: 27 Sept. 201530 Sept. 2015

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Band9632
ISSN (Print)0277-786X
ISSN (elektronisch)1996-756X

Abstract

The growth of laser-induced contamination (LIC) on optical components in extraterrestrial missions is a known issue especially for the UV spectral region. The Laser Zentrum Hannover e.V. is responsible for the development of a pulsed laser-system operating at a wavelength of 266 nm for the ExoMars mission and for the qualification of used optics and materials regarding LIC. In this context, toluene was utilized which is an often used model contaminant in LIC studies. Test cycles based on the application of the two UV wavelengths 355 nm and 266 nm on fused silica substrates and ARcoated optics are conducted and the observed contamination effects are compared. This scaling allows for a rough estimate of the destructive influence of LIC on space optics degradation at 266 nm. Further tests will be performed with materials integrated into the ExoMars-laser-head under near-operation environmental conditions.

ASJC Scopus Sachgebiete

Zitieren

Scaling of laser-induced contamination growth at 266nm and 355nm. / Ließmann, Matthias; Jensen, Lars; Balasa, Istvan et al.
47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015. SPIE, 2015. 96321Z (Proceedings of SPIE - The International Society for Optical Engineering; Band 9632).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Ließmann, M, Jensen, L, Balasa, I, Hunnekuhl, M, Buttner, A, Weßels, P, Neumann, J & Ristau, D 2015, Scaling of laser-induced contamination growth at 266nm and 355nm. in 47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015., 96321Z, Proceedings of SPIE - The International Society for Optical Engineering, Bd. 9632, SPIE, 47th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2015, Boulder, USA / Vereinigte Staaten, 27 Sept. 2015. https://doi.org/10.1117/12.2194083
Ließmann, M., Jensen, L., Balasa, I., Hunnekuhl, M., Buttner, A., Weßels, P., Neumann, J., & Ristau, D. (2015). Scaling of laser-induced contamination growth at 266nm and 355nm. In 47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015 Artikel 96321Z (Proceedings of SPIE - The International Society for Optical Engineering; Band 9632). SPIE. https://doi.org/10.1117/12.2194083
Ließmann M, Jensen L, Balasa I, Hunnekuhl M, Buttner A, Weßels P et al. Scaling of laser-induced contamination growth at 266nm and 355nm. in 47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015. SPIE. 2015. 96321Z. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2194083
Ließmann, Matthias ; Jensen, Lars ; Balasa, Istvan et al. / Scaling of laser-induced contamination growth at 266nm and 355nm. 47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015. SPIE, 2015. (Proceedings of SPIE - The International Society for Optical Engineering).
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abstract = "The growth of laser-induced contamination (LIC) on optical components in extraterrestrial missions is a known issue especially for the UV spectral region. The Laser Zentrum Hannover e.V. is responsible for the development of a pulsed laser-system operating at a wavelength of 266 nm for the ExoMars mission and for the qualification of used optics and materials regarding LIC. In this context, toluene was utilized which is an often used model contaminant in LIC studies. Test cycles based on the application of the two UV wavelengths 355 nm and 266 nm on fused silica substrates and ARcoated optics are conducted and the observed contamination effects are compared. This scaling allows for a rough estimate of the destructive influence of LIC on space optics degradation at 266 nm. Further tests will be performed with materials integrated into the ExoMars-laser-head under near-operation environmental conditions.",
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AU - Ließmann, Matthias

AU - Jensen, Lars

AU - Balasa, Istvan

AU - Hunnekuhl, M.

AU - Buttner, A.

AU - Weßels, Peter

AU - Neumann, Jörg

AU - Ristau, Detlev

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