Details
| Originalsprache | Englisch |
|---|---|
| Aufsatznummer | 115109 |
| Fachzeitschrift | Physical Review B - Condensed Matter and Materials Physics |
| Jahrgang | 71 |
| Ausgabenummer | 11 |
| Publikationsstatus | Veröffentlicht - 15 März 2005 |
| Extern publiziert | Ja |
Abstract
The scaling of the single-pulse laser threshold fluence for dielectric breakdown with respect to pulse duration and material band gap energy was investigated in the subpicosecond pulse regime using oxide films (TiO 2, Ta 2O 5, HfO 2, Al 2O 3, and SiO 2). A phenomenological model attributes the pulse duration dependence to the interplay of multiphoton ionization, impact ionization, and subpicosecond electron decay out of the conduction band. The observed linear scaling of the breakdown fluence with band gap energy can be explained within the framework of this model by invoking the band gap dependence of the multiphoton absorption coefficient from Keldysh photoionization theory. The power exponent κ of the observed dependence of the breakdown threshold fluence F th on pulse duration τ p, F thα τ p κ, is independent of the material and is attributed to photoionization seeded avalanche ionization.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
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in: Physical Review B - Condensed Matter and Materials Physics, Jahrgang 71, Nr. 11, 115109, 15.03.2005.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Scaling laws of femtosecond laser pulse induced breakdown in oxide films
AU - Mero, Mark
AU - Liu, Jing Jin
AU - Rudolph, Wolfgang
AU - Ristau, Detlev
AU - Starke, Kai
PY - 2005/3/15
Y1 - 2005/3/15
N2 - The scaling of the single-pulse laser threshold fluence for dielectric breakdown with respect to pulse duration and material band gap energy was investigated in the subpicosecond pulse regime using oxide films (TiO 2, Ta 2O 5, HfO 2, Al 2O 3, and SiO 2). A phenomenological model attributes the pulse duration dependence to the interplay of multiphoton ionization, impact ionization, and subpicosecond electron decay out of the conduction band. The observed linear scaling of the breakdown fluence with band gap energy can be explained within the framework of this model by invoking the band gap dependence of the multiphoton absorption coefficient from Keldysh photoionization theory. The power exponent κ of the observed dependence of the breakdown threshold fluence F th on pulse duration τ p, F thα τ p κ, is independent of the material and is attributed to photoionization seeded avalanche ionization.
AB - The scaling of the single-pulse laser threshold fluence for dielectric breakdown with respect to pulse duration and material band gap energy was investigated in the subpicosecond pulse regime using oxide films (TiO 2, Ta 2O 5, HfO 2, Al 2O 3, and SiO 2). A phenomenological model attributes the pulse duration dependence to the interplay of multiphoton ionization, impact ionization, and subpicosecond electron decay out of the conduction band. The observed linear scaling of the breakdown fluence with band gap energy can be explained within the framework of this model by invoking the band gap dependence of the multiphoton absorption coefficient from Keldysh photoionization theory. The power exponent κ of the observed dependence of the breakdown threshold fluence F th on pulse duration τ p, F thα τ p κ, is independent of the material and is attributed to photoionization seeded avalanche ionization.
UR - http://www.scopus.com/inward/record.url?scp=20044385139&partnerID=8YFLogxK
U2 - 10.1103/PhysRevB.71.115109
DO - 10.1103/PhysRevB.71.115109
M3 - Article
AN - SCOPUS:20044385139
VL - 71
JO - Physical Review B - Condensed Matter and Materials Physics
JF - Physical Review B - Condensed Matter and Materials Physics
SN - 1098-0121
IS - 11
M1 - 115109
ER -