Reliable production of steep edge interference filters

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autoren

  • Marc Lappschies
  • Peter Pfeifer
  • Uwe Schallenberg
  • Henrik Ehlers
  • Detlev Ristau

Externe Organisationen

  • Carl Zeiss SMT GmbH
  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksAdvances in Optical Thin Films III
PublikationsstatusVeröffentlicht - 25 Sept. 2008
Extern publiziertJa
VeranstaltungAdvances in Optical Thin Films III - Glasgow, Großbritannien / Vereinigtes Königreich
Dauer: 2 Sept. 20083 Sept. 2008

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Band7101
ISSN (Print)0277-786X

Abstract

Interference filters for spectroscopic purposes or sensor applications are characterized by strictly specified spectral blocking and transmitting regions with intermediate steep edges. These steep edges must be positioned within nanometer accuracy while the coating may consist of more than one hundred non-quarterwave layers. Though modern ion assisted deposition processes in conjunction with quartz crystal control are well suited for the production of complex filters, an optical monitoring device seems to be necessary to fulfill the demanding spectral requirements. Broad band optical monitoring (BBM) directly on the calotte has been employed to control the production of this type of band stop filters. For a large number of also different types of these coatings the BBM-technique demonstrated its capability to improve the reliability and flexibility in industrial production. Within a stable well-characterized deposition process error self-compensation effects allow for a fast realization of various designs within specified tolerances. Nevertheless, optical broad band monitoring could not be applied to all types of these steep edge filters because error propagation leads to unreachable solutions of the thickness tracing algorithm for specific cases. The given examples of complex steep filters and the corresponding post analysis of stored online spectra as well as the simulation of the monitoring process reveal the influence of the design itself to this occurrence. A suggestion for an identification of critical thickness values within the layer sequence is discussed and solutions to the problems are presented.

ASJC Scopus Sachgebiete

Zitieren

Reliable production of steep edge interference filters. / Lappschies, Marc; Pfeifer, Peter; Schallenberg, Uwe et al.
Advances in Optical Thin Films III. 2008. 71010P (Proceedings of SPIE - The International Society for Optical Engineering; Band 7101).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Lappschies, M, Pfeifer, P, Schallenberg, U, Ehlers, H & Ristau, D 2008, Reliable production of steep edge interference filters. in Advances in Optical Thin Films III., 71010P, Proceedings of SPIE - The International Society for Optical Engineering, Bd. 7101, Advances in Optical Thin Films III, Glasgow, Großbritannien / Vereinigtes Königreich, 2 Sept. 2008. https://doi.org/10.1117/12.797459
Lappschies, M., Pfeifer, P., Schallenberg, U., Ehlers, H., & Ristau, D. (2008). Reliable production of steep edge interference filters. In Advances in Optical Thin Films III Artikel 71010P (Proceedings of SPIE - The International Society for Optical Engineering; Band 7101). https://doi.org/10.1117/12.797459
Lappschies M, Pfeifer P, Schallenberg U, Ehlers H, Ristau D. Reliable production of steep edge interference filters. in Advances in Optical Thin Films III. 2008. 71010P. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.797459
Lappschies, Marc ; Pfeifer, Peter ; Schallenberg, Uwe et al. / Reliable production of steep edge interference filters. Advances in Optical Thin Films III. 2008. (Proceedings of SPIE - The International Society for Optical Engineering).
Download
@inproceedings{0395322408a3455392be7558c23e9ec7,
title = "Reliable production of steep edge interference filters",
abstract = "Interference filters for spectroscopic purposes or sensor applications are characterized by strictly specified spectral blocking and transmitting regions with intermediate steep edges. These steep edges must be positioned within nanometer accuracy while the coating may consist of more than one hundred non-quarterwave layers. Though modern ion assisted deposition processes in conjunction with quartz crystal control are well suited for the production of complex filters, an optical monitoring device seems to be necessary to fulfill the demanding spectral requirements. Broad band optical monitoring (BBM) directly on the calotte has been employed to control the production of this type of band stop filters. For a large number of also different types of these coatings the BBM-technique demonstrated its capability to improve the reliability and flexibility in industrial production. Within a stable well-characterized deposition process error self-compensation effects allow for a fast realization of various designs within specified tolerances. Nevertheless, optical broad band monitoring could not be applied to all types of these steep edge filters because error propagation leads to unreachable solutions of the thickness tracing algorithm for specific cases. The given examples of complex steep filters and the corresponding post analysis of stored online spectra as well as the simulation of the monitoring process reveal the influence of the design itself to this occurrence. A suggestion for an identification of critical thickness values within the layer sequence is discussed and solutions to the problems are presented.",
keywords = "Band stop filters, Broadband optical monitoring, Optical interference coatings, Precision optics",
author = "Marc Lappschies and Peter Pfeifer and Uwe Schallenberg and Henrik Ehlers and Detlev Ristau",
year = "2008",
month = sep,
day = "25",
doi = "10.1117/12.797459",
language = "English",
isbn = "9780819473318",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Advances in Optical Thin Films III",
note = "Advances in Optical Thin Films III ; Conference date: 02-09-2008 Through 03-09-2008",

}

Download

TY - GEN

T1 - Reliable production of steep edge interference filters

AU - Lappschies, Marc

AU - Pfeifer, Peter

AU - Schallenberg, Uwe

AU - Ehlers, Henrik

AU - Ristau, Detlev

PY - 2008/9/25

Y1 - 2008/9/25

N2 - Interference filters for spectroscopic purposes or sensor applications are characterized by strictly specified spectral blocking and transmitting regions with intermediate steep edges. These steep edges must be positioned within nanometer accuracy while the coating may consist of more than one hundred non-quarterwave layers. Though modern ion assisted deposition processes in conjunction with quartz crystal control are well suited for the production of complex filters, an optical monitoring device seems to be necessary to fulfill the demanding spectral requirements. Broad band optical monitoring (BBM) directly on the calotte has been employed to control the production of this type of band stop filters. For a large number of also different types of these coatings the BBM-technique demonstrated its capability to improve the reliability and flexibility in industrial production. Within a stable well-characterized deposition process error self-compensation effects allow for a fast realization of various designs within specified tolerances. Nevertheless, optical broad band monitoring could not be applied to all types of these steep edge filters because error propagation leads to unreachable solutions of the thickness tracing algorithm for specific cases. The given examples of complex steep filters and the corresponding post analysis of stored online spectra as well as the simulation of the monitoring process reveal the influence of the design itself to this occurrence. A suggestion for an identification of critical thickness values within the layer sequence is discussed and solutions to the problems are presented.

AB - Interference filters for spectroscopic purposes or sensor applications are characterized by strictly specified spectral blocking and transmitting regions with intermediate steep edges. These steep edges must be positioned within nanometer accuracy while the coating may consist of more than one hundred non-quarterwave layers. Though modern ion assisted deposition processes in conjunction with quartz crystal control are well suited for the production of complex filters, an optical monitoring device seems to be necessary to fulfill the demanding spectral requirements. Broad band optical monitoring (BBM) directly on the calotte has been employed to control the production of this type of band stop filters. For a large number of also different types of these coatings the BBM-technique demonstrated its capability to improve the reliability and flexibility in industrial production. Within a stable well-characterized deposition process error self-compensation effects allow for a fast realization of various designs within specified tolerances. Nevertheless, optical broad band monitoring could not be applied to all types of these steep edge filters because error propagation leads to unreachable solutions of the thickness tracing algorithm for specific cases. The given examples of complex steep filters and the corresponding post analysis of stored online spectra as well as the simulation of the monitoring process reveal the influence of the design itself to this occurrence. A suggestion for an identification of critical thickness values within the layer sequence is discussed and solutions to the problems are presented.

KW - Band stop filters

KW - Broadband optical monitoring

KW - Optical interference coatings

KW - Precision optics

UR - http://www.scopus.com/inward/record.url?scp=56249130100&partnerID=8YFLogxK

U2 - 10.1117/12.797459

DO - 10.1117/12.797459

M3 - Conference contribution

AN - SCOPUS:56249130100

SN - 9780819473318

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Advances in Optical Thin Films III

T2 - Advances in Optical Thin Films III

Y2 - 2 September 2008 through 3 September 2008

ER -