Details
Originalsprache | Englisch |
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Titel des Sammelwerks | Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies |
Untertitel | 3 - 5 August 2003, San Diego, California, USA |
Erscheinungsort | Bellingham |
Herausgeber (Verlag) | SPIE |
Seiten | 331-342 |
Seitenumfang | 12 |
ISBN (Print) | 0-8194-5061-8 |
Publikationsstatus | Veröffentlicht - 4 Nov. 2003 |
Veranstaltung | Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies - San Diego, CA, USA / Vereinigte Staaten Dauer: 3 Aug. 2003 → 5 Aug. 2003 |
Publikationsreihe
Name | Proceedings of SPIE - The International Society for Optical Engineering |
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Herausgeber (Verlag) | SPIE |
Band | 5188 |
ISSN (Print) | 0277-786X |
Abstract
Depending on the choice of thin film models and measurement data used for the characterization analysis one can obtain essentially different characterization results. It is especially difficult to reliably determine refractive index wavelength dependencies in the case of low accuracy measurement data. We consider possible approaches aimed to improve a stability of refractive index determination. The ways of the verification of characterization results are also discussed. Practical examples used to illustrate the proposed approaches are connected with the most difficult case of the determination of the refractive indices of fluoride films in the VUV spectral region.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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- BibTex
- RIS
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies: 3 - 5 August 2003, San Diego, California, USA. Bellingham: SPIE, 2003. S. 331-342 (Proceedings of SPIE - The International Society for Optical Engineering; Band 5188).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Reliable determination of wavelength dependence of thin film refractive index
AU - Tikhonravov, Alexander
AU - Trubetskov, Michael
AU - Amotchkina, Tatiana
AU - Tikhonravov, Andrei
AU - Ristau, Detlev
AU - Günster, Stefan
PY - 2003/11/4
Y1 - 2003/11/4
N2 - Depending on the choice of thin film models and measurement data used for the characterization analysis one can obtain essentially different characterization results. It is especially difficult to reliably determine refractive index wavelength dependencies in the case of low accuracy measurement data. We consider possible approaches aimed to improve a stability of refractive index determination. The ways of the verification of characterization results are also discussed. Practical examples used to illustrate the proposed approaches are connected with the most difficult case of the determination of the refractive indices of fluoride films in the VUV spectral region.
AB - Depending on the choice of thin film models and measurement data used for the characterization analysis one can obtain essentially different characterization results. It is especially difficult to reliably determine refractive index wavelength dependencies in the case of low accuracy measurement data. We consider possible approaches aimed to improve a stability of refractive index determination. The ways of the verification of characterization results are also discussed. Practical examples used to illustrate the proposed approaches are connected with the most difficult case of the determination of the refractive indices of fluoride films in the VUV spectral region.
KW - Optical characterization
KW - Refractive index
KW - Thin films
UR - http://www.scopus.com/inward/record.url?scp=2342558634&partnerID=8YFLogxK
U2 - 10.1117/12.505554
DO - 10.1117/12.505554
M3 - Conference contribution
AN - SCOPUS:2342558634
SN - 0-8194-5061-8
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 331
EP - 342
BT - Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
PB - SPIE
CY - Bellingham
T2 - Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
Y2 - 3 August 2003 through 5 August 2003
ER -