Reduction of nanoparticles in optical thin films through ion etching

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Autoren

  • Joshua McCauley
  • Marco Jupé
  • Jinlong Zhang
  • Andreas Wienke
  • Detlev Ristau

Organisationseinheiten

Externe Organisationen

  • Laser Zentrum Hannover e.V. (LZH)
  • MOE Key Laboratory of Advanced Micro-Structured Materials
  • Tongji University
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)B117-B125
FachzeitschriftApplied optics
Jahrgang62
Ausgabenummer7
PublikationsstatusVeröffentlicht - 17 Jan. 2023

Abstract

Contaminating particles in optical thin films can lead to the formation of nodules and reduction of laser induced damage threshold (LIDT). This work investigates the suitability of ion etching of the substrates to reduce the impact of nanoparticles. Initial investigations suggest that ion etching can remove nanoparticles from the sample surface; however, doing so introduces texturing to the surface of the substrate. This texturing leads to an increase in optical scattering loss, though LIDT measurements show no significant reduction in the durability of the substrate.

ASJC Scopus Sachgebiete

Zitieren

Reduction of nanoparticles in optical thin films through ion etching. / McCauley, Joshua; Jupé, Marco; Zhang, Jinlong et al.
in: Applied optics, Jahrgang 62, Nr. 7, 17.01.2023, S. B117-B125.

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

McCauley, J, Jupé, M, Zhang, J, Wienke, A & Ristau, D 2023, 'Reduction of nanoparticles in optical thin films through ion etching', Applied optics, Jg. 62, Nr. 7, S. B117-B125. https://doi.org/10.1364/AO.478263
McCauley, J., Jupé, M., Zhang, J., Wienke, A., & Ristau, D. (2023). Reduction of nanoparticles in optical thin films through ion etching. Applied optics, 62(7), B117-B125. https://doi.org/10.1364/AO.478263
McCauley J, Jupé M, Zhang J, Wienke A, Ristau D. Reduction of nanoparticles in optical thin films through ion etching. Applied optics. 2023 Jan 17;62(7):B117-B125. doi: 10.1364/AO.478263
McCauley, Joshua ; Jupé, Marco ; Zhang, Jinlong et al. / Reduction of nanoparticles in optical thin films through ion etching. in: Applied optics. 2023 ; Jahrgang 62, Nr. 7. S. B117-B125.
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