Reassessment of intrinsic lifetime limit in n-type crystalline silicon and implication on maximum solar cell efficiency

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • Boris A. Veith-Wolf
  • Sören Schäfer
  • Rolf Brendel
  • Jan Schmidt

Organisationseinheiten

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
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Details

OriginalspracheEnglisch
Seiten (von - bis)194-199
Seitenumfang6
FachzeitschriftSolar Energy Materials and Solar Cells
Jahrgang186
Frühes Online-Datum30 Juni 2018
PublikationsstatusVeröffentlicht - Nov. 2018

Abstract

Unusually high carrier lifetimes are measured by photoconductance decay on n-type Czochralski-grown silicon wafers of different doping concentrations, passivated using plasma-assisted atomic-layer-deposited aluminum oxide (Al2O3) on both wafer surfaces. The measured effective lifetimes significantly exceed the intrinsic lifetime limit previously reported in the literature. Several prerequisites have to be fulfilled to allow the measurement of such high lifetimes on Al2O3-passivated n-type silicon wafers: (i) large-area wafers are required to minimize the impact of edge recombination via the Al2O3-charge-induced inversion layer, (ii) an exceptionally homogeneous Al2O3 surface passivation is required, and (iii) very thick silicon wafers are needed. Based on our lifetime measurements on n-type silicon wafers of different doping concentrations, we introduce a new parameterization of the intrinsic lifetime for n-type crystalline silicon. This new parameterization has implications concerning the maximum reachable efficiency of n-type silicon solar cells, which is larger than assumed before.

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Reassessment of intrinsic lifetime limit in n-type crystalline silicon and implication on maximum solar cell efficiency. / Veith-Wolf, Boris A.; Schäfer, Sören; Brendel, Rolf et al.
in: Solar Energy Materials and Solar Cells, Jahrgang 186, 11.2018, S. 194-199.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Veith-Wolf BA, Schäfer S, Brendel R, Schmidt J. Reassessment of intrinsic lifetime limit in n-type crystalline silicon and implication on maximum solar cell efficiency. Solar Energy Materials and Solar Cells. 2018 Nov;186:194-199. Epub 2018 Jun 30. doi: 10.1016/j.solmat.2018.06.029
Veith-Wolf, Boris A. ; Schäfer, Sören ; Brendel, Rolf et al. / Reassessment of intrinsic lifetime limit in n-type crystalline silicon and implication on maximum solar cell efficiency. in: Solar Energy Materials and Solar Cells. 2018 ; Jahrgang 186. S. 194-199.
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AU - Veith-Wolf, Boris A.

AU - Schäfer, Sören

AU - Brendel, Rolf

AU - Schmidt, Jan

N1 - Publisher Copyright: © 2018 Elsevier B.V. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.

PY - 2018/11

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N2 - Unusually high carrier lifetimes are measured by photoconductance decay on n-type Czochralski-grown silicon wafers of different doping concentrations, passivated using plasma-assisted atomic-layer-deposited aluminum oxide (Al2O3) on both wafer surfaces. The measured effective lifetimes significantly exceed the intrinsic lifetime limit previously reported in the literature. Several prerequisites have to be fulfilled to allow the measurement of such high lifetimes on Al2O3-passivated n-type silicon wafers: (i) large-area wafers are required to minimize the impact of edge recombination via the Al2O3-charge-induced inversion layer, (ii) an exceptionally homogeneous Al2O3 surface passivation is required, and (iii) very thick silicon wafers are needed. Based on our lifetime measurements on n-type silicon wafers of different doping concentrations, we introduce a new parameterization of the intrinsic lifetime for n-type crystalline silicon. This new parameterization has implications concerning the maximum reachable efficiency of n-type silicon solar cells, which is larger than assumed before.

AB - Unusually high carrier lifetimes are measured by photoconductance decay on n-type Czochralski-grown silicon wafers of different doping concentrations, passivated using plasma-assisted atomic-layer-deposited aluminum oxide (Al2O3) on both wafer surfaces. The measured effective lifetimes significantly exceed the intrinsic lifetime limit previously reported in the literature. Several prerequisites have to be fulfilled to allow the measurement of such high lifetimes on Al2O3-passivated n-type silicon wafers: (i) large-area wafers are required to minimize the impact of edge recombination via the Al2O3-charge-induced inversion layer, (ii) an exceptionally homogeneous Al2O3 surface passivation is required, and (iii) very thick silicon wafers are needed. Based on our lifetime measurements on n-type silicon wafers of different doping concentrations, we introduce a new parameterization of the intrinsic lifetime for n-type crystalline silicon. This new parameterization has implications concerning the maximum reachable efficiency of n-type silicon solar cells, which is larger than assumed before.

KW - Aluminum oxide

KW - Auger recombination

KW - Charge carrier lifetime

KW - Intrinsic lifetime

KW - Silicon

KW - Surface passivation

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