Details
| Titel in Übersetzung | Deep reactive ion etching of shadow masks for direct deposition of sensors with a new coating system |
|---|---|
| Originalsprache | Deutsch |
| Titel des Sammelwerks | MikroSystemTechnik Kongress 2017 |
| Untertitel | Proceedings |
| Erscheinungsort | Berlin |
| Herausgeber (Verlag) | VDE Verlag GmbH |
| Seiten | 680-683 |
| Seitenumfang | 4 |
| ISBN (elektronisch) | 9783800744916 |
| Publikationsstatus | Veröffentlicht - 2017 |
| Veranstaltung | MikroSystemTechnik Kongress 2017: MEMS, Mikroelektronik, Systeme - München, Deutschland Dauer: 23 Okt. 2017 → 25 Okt. 2017 |
Abstract
Nowadays, technical systems are equipped with a variety of sensors [1]. To cope with the resulting new manufacturing requirements, a new coating technology has been invented at the Institute of Micro Production Technology [2,3]. Such technology enables a deposition of sensors directly on components of nearly arbitrary size. So far, laser-structured metall shadow masks have been used for structuring the sensor systems [4]. Within this paper, a method for manufacturing silicon shadow masks by means of deep reactive ion etching is presented. Challenges during the manufacturing process and suitable solutions are mentioned. Moreover, the structural quality of the shadow masks and of directly deposited sensor systems, structured with the shadow masks, are evaluated.
ASJC Scopus Sachgebiete
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Werkstoffwissenschaften (insg.)
- Oberflächen, Beschichtungen und Folien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
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MikroSystemTechnik Kongress 2017: Proceedings. Berlin: VDE Verlag GmbH, 2017. S. 680-683.
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung
}
TY - GEN
T1 - Reaktives Ionentiefenätzen von Schattenmasken für die Sensordirektabscheidung mit einer neuartigen Beschichtungsanlage
AU - Klaas, Daniel
AU - Pehrs, Florian
AU - Wurz, Marc Christopher
PY - 2017
Y1 - 2017
N2 - Nowadays, technical systems are equipped with a variety of sensors [1]. To cope with the resulting new manufacturing requirements, a new coating technology has been invented at the Institute of Micro Production Technology [2,3]. Such technology enables a deposition of sensors directly on components of nearly arbitrary size. So far, laser-structured metall shadow masks have been used for structuring the sensor systems [4]. Within this paper, a method for manufacturing silicon shadow masks by means of deep reactive ion etching is presented. Challenges during the manufacturing process and suitable solutions are mentioned. Moreover, the structural quality of the shadow masks and of directly deposited sensor systems, structured with the shadow masks, are evaluated.
AB - Nowadays, technical systems are equipped with a variety of sensors [1]. To cope with the resulting new manufacturing requirements, a new coating technology has been invented at the Institute of Micro Production Technology [2,3]. Such technology enables a deposition of sensors directly on components of nearly arbitrary size. So far, laser-structured metall shadow masks have been used for structuring the sensor systems [4]. Within this paper, a method for manufacturing silicon shadow masks by means of deep reactive ion etching is presented. Challenges during the manufacturing process and suitable solutions are mentioned. Moreover, the structural quality of the shadow masks and of directly deposited sensor systems, structured with the shadow masks, are evaluated.
UR - http://www.scopus.com/inward/record.url?scp=85086411759&partnerID=8YFLogxK
M3 - Aufsatz in Konferenzband
SP - 680
EP - 683
BT - MikroSystemTechnik Kongress 2017
PB - VDE Verlag GmbH
CY - Berlin
T2 - MikroSystemTechnik Kongress 2017: MEMS, Mikroelektronik, Systeme
Y2 - 23 October 2017 through 25 October 2017
ER -