Details
| Originalsprache | Englisch |
|---|---|
| Seiten | 327-338 |
| Seitenumfang | 12 |
| Publikationsstatus | Veröffentlicht - 1991 |
| Veranstaltung | 22nd Annual Boulder Damage Symposium on Laser-Induced Damage in Optical Materials: 1990 - Boulder, CO, USA Dauer: 24 Okt. 1990 → 26 Okt. 1990 |
Konferenz
| Konferenz | 22nd Annual Boulder Damage Symposium on Laser-Induced Damage in Optical Materials: 1990 |
|---|---|
| Ort | Boulder, CO, USA |
| Zeitraum | 24 Okt. 1990 → 26 Okt. 1990 |
Abstract
Fluoride coatings produced by thermal evaporation suffer from high scatter losses, ageing and cracking due to high tensile stress. These problems impose severe limitations to the production of low loss multilayer coatings for the VUV range. A key position for improved performance is the microstructure of the layers. The aim of our investigations is to improve the microstructure of AlF3- and LaF3- films by ion-beam-sputtering. Scatter measurements of single layers revealed lower values for IBS than for boat evaporation. Unfortunately, sputtered fluoride films have high absorption losses caused by decomposition of the coating material. By sputtering in reactive atmospheres and annealing we were able to reduce the absorption losses significantly. Antireflective as well as high reflective coatings were produced. Reflection and transmission values were obtained with a VUV-spectrophotometer. Damage tests at the 193 nm ArF laser wavelength were performed at the Laser-Laboratorium Goettingen.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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1991. 327-338 Beitrag in 22nd Annual Boulder Damage Symposium on Laser-Induced Damage in Optical Materials: 1990, Boulder, CO, USA.
Publikation: Konferenzbeitrag › Paper › Forschung › Peer-Review
}
TY - CONF
T1 - Reactive ion-beam-sputtering of fluoride coatings for the UV/VUV range
AU - Schink, Harald
AU - Kolbe, Jürgen
AU - Zimmermann, F.
AU - Ristau, Detlev
AU - Welling, Herbert
PY - 1991
Y1 - 1991
N2 - Fluoride coatings produced by thermal evaporation suffer from high scatter losses, ageing and cracking due to high tensile stress. These problems impose severe limitations to the production of low loss multilayer coatings for the VUV range. A key position for improved performance is the microstructure of the layers. The aim of our investigations is to improve the microstructure of AlF3- and LaF3- films by ion-beam-sputtering. Scatter measurements of single layers revealed lower values for IBS than for boat evaporation. Unfortunately, sputtered fluoride films have high absorption losses caused by decomposition of the coating material. By sputtering in reactive atmospheres and annealing we were able to reduce the absorption losses significantly. Antireflective as well as high reflective coatings were produced. Reflection and transmission values were obtained with a VUV-spectrophotometer. Damage tests at the 193 nm ArF laser wavelength were performed at the Laser-Laboratorium Goettingen.
AB - Fluoride coatings produced by thermal evaporation suffer from high scatter losses, ageing and cracking due to high tensile stress. These problems impose severe limitations to the production of low loss multilayer coatings for the VUV range. A key position for improved performance is the microstructure of the layers. The aim of our investigations is to improve the microstructure of AlF3- and LaF3- films by ion-beam-sputtering. Scatter measurements of single layers revealed lower values for IBS than for boat evaporation. Unfortunately, sputtered fluoride films have high absorption losses caused by decomposition of the coating material. By sputtering in reactive atmospheres and annealing we were able to reduce the absorption losses significantly. Antireflective as well as high reflective coatings were produced. Reflection and transmission values were obtained with a VUV-spectrophotometer. Damage tests at the 193 nm ArF laser wavelength were performed at the Laser-Laboratorium Goettingen.
UR - http://www.scopus.com/inward/record.url?scp=0025725376&partnerID=8YFLogxK
U2 - 10.1520/stp23640s
DO - 10.1520/stp23640s
M3 - Paper
AN - SCOPUS:0025725376
SP - 327
EP - 338
T2 - 22nd Annual Boulder Damage Symposium on Laser-Induced Damage in Optical Materials: 1990
Y2 - 24 October 1990 through 26 October 1990
ER -