Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autoren

  • Winfried Arens
  • Detlev Ristau
  • Jens Ullmann
  • Christoph Zaczek
  • Roland Thielsch
  • Norbert Kaiser
  • Angela Duparre
  • Oliver Apel
  • Klaus Mann
  • Hans Lauth
  • Helmut Bernitzki
  • Stefan Schippel
  • H. Heyer
  • Johanes Ebert

Externe Organisationen

  • Carl Zeiss SMT GmbH
  • Laser-Laboratorium Göttingen e.V. (LLG)
  • Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF
  • JENOPTIK Laser GmbH
  • Laseroptik GmbH
  • LAYERTEC GmbH
  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksLaser-Induced Damage in Optical Materials: 1999
Untertitel4 - 7 October 1999, Boulder, Colorado ; proceedings
ErscheinungsortBellingham
Herausgeber (Verlag)SPIE
Seiten250-258
Seitenumfang9
ISBN (Print)0-8194-3508-2
PublikationsstatusVeröffentlicht - 3 März 2000
Extern publiziertJa
Veranstaltung31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999' - Boulder, CO, USA
Dauer: 4 Okt. 19997 Okt. 1999

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Herausgeber (Verlag)SPIE
Band3902
ISSN (Print)0277-786X

Abstract

The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV-excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project `OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF3/MgF2 were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up to the mid infrared range, calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.

ASJC Scopus Sachgebiete

Zitieren

Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers. / Arens, Winfried; Ristau, Detlev; Ullmann, Jens et al.
Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham: SPIE, 2000. S. 250-258 (Proceedings of SPIE - The International Society for Optical Engineering; Band 3902).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Arens, W, Ristau, D, Ullmann, J, Zaczek, C, Thielsch, R, Kaiser, N, Duparre, A, Apel, O, Mann, K, Lauth, H, Bernitzki, H, Schippel, S, Heyer, H & Ebert, J 2000, Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers. in Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings. Proceedings of SPIE - The International Society for Optical Engineering, Bd. 3902, SPIE, Bellingham, S. 250-258, 31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999', Boulder, CO, USA, 4 Okt. 1999. https://doi.org/10.1117/12.379314
Arens, W., Ristau, D., Ullmann, J., Zaczek, C., Thielsch, R., Kaiser, N., Duparre, A., Apel, O., Mann, K., Lauth, H., Bernitzki, H., Schippel, S., Heyer, H., & Ebert, J. (2000). Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers. In Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings (S. 250-258). (Proceedings of SPIE - The International Society for Optical Engineering; Band 3902). SPIE. https://doi.org/10.1117/12.379314
Arens W, Ristau D, Ullmann J, Zaczek C, Thielsch R, Kaiser N et al. Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers. in Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham: SPIE. 2000. S. 250-258. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.379314
Arens, Winfried ; Ristau, Detlev ; Ullmann, Jens et al. / Properties of fluoride DUV-excimer laser optics : Influence of the number of dielectric layers. Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham : SPIE, 2000. S. 250-258 (Proceedings of SPIE - The International Society for Optical Engineering).
Download
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