TY - JOUR

T1 - Preferential sputtering of metal oxide mixture thin films

AU - Mende, Mathias

AU - Carstens, Florian

AU - Ehlers, Henrik

AU - Ristau, Detlev

N1 - Funding Information: The authors acknowledge the German Federal Ministry of Economics and Technology (BMWi) for financial support of the research project “TAILOR” under Contract No. 16IN0667 within the framework of the “InnoNet” program. Also, funding by the Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) under Germany’s Excellence Strategy within the Cluster of Excellence PhoenixD (EXC 2122, Project No. 390833453) is gratefully acknowledged. Furthermore, the authors are grateful to Wolfhard Möller and Bartosz Liedke from Helmholtz-Zentrum Dresden-Rossendorf e.V. for providing the TRIDYN software and to Bernd Bock from the Tascon GmbH for performing the XPS measurements according to the authors’ requirements.

PY - 2021/3/1

Y1 - 2021/3/1

N2 - Metal oxide mixture materials enable the production of dielectric multilayer coatings for highest power laser applications. During thin film deposition, when using sputtering techniques in combination with composite target materials, preferential sputtering occurs on the target surface. The quantitative analysis of the mixture thin film composition, usually performed by ion beam based depth profiling methods, is also affected by preferential sputtering. To gain a deeper understanding, the atomic composition variation of sputtered mixture material surfaces is calculated applying the Monte Carlo simulation program tridyn. The simulation results are compared to the atomic composition gradient measured via depth profiling x-ray photoelectron spectroscopy for mixture thin films composed of HfO2, Sc2O3, Al2O3, and SiO2. The deviations between the experimental and simulated data are discussed with respect to the different mixture material combinations.

AB - Metal oxide mixture materials enable the production of dielectric multilayer coatings for highest power laser applications. During thin film deposition, when using sputtering techniques in combination with composite target materials, preferential sputtering occurs on the target surface. The quantitative analysis of the mixture thin film composition, usually performed by ion beam based depth profiling methods, is also affected by preferential sputtering. To gain a deeper understanding, the atomic composition variation of sputtered mixture material surfaces is calculated applying the Monte Carlo simulation program tridyn. The simulation results are compared to the atomic composition gradient measured via depth profiling x-ray photoelectron spectroscopy for mixture thin films composed of HfO2, Sc2O3, Al2O3, and SiO2. The deviations between the experimental and simulated data are discussed with respect to the different mixture material combinations.

UR - http://www.scopus.com/inward/record.url?scp=85100148366&partnerID=8YFLogxK

U2 - 10.1116/6.0000799

DO - 10.1116/6.0000799

M3 - Article

AN - SCOPUS:85100148366

VL - 39

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

SN - 0734-2101

IS - 2

M1 - 023406

ER -