Details
Originalsprache | Englisch |
---|---|
Seiten (von - bis) | 148-153 |
Seitenumfang | 6 |
Fachzeitschrift | Europhysics Letters (EPL) |
Jahrgang | 46 |
Ausgabenummer | 2 |
Publikationsstatus | Veröffentlicht - 2 Apr. 1999 |
Extern publiziert | Ja |
Abstract
In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Allgemeine Physik und Astronomie
Zitieren
- Standard
- Harvard
- Apa
- Vancouver
- BibTex
- RIS
in: Europhysics Letters (EPL), Jahrgang 46, Nr. 2, 02.04.1999, S. 148-153.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Polarization gradient light masks in atom lithography
AU - Brezger, B.
AU - Schulze, Th
AU - Schmidt, Piet Oliver
AU - Mertens, R.
AU - Pfau, T.
AU - Mlynek, J.
PY - 1999/4/2
Y1 - 1999/4/2
N2 - In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.
AB - In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.
UR - http://www.scopus.com/inward/record.url?scp=0033560183&partnerID=8YFLogxK
U2 - 10.1209/epl/i1999-00237-5
DO - 10.1209/epl/i1999-00237-5
M3 - Article
AN - SCOPUS:0033560183
VL - 46
SP - 148
EP - 153
JO - Europhysics Letters (EPL)
JF - Europhysics Letters (EPL)
SN - 0295-5075
IS - 2
ER -