Polarization gradient light masks in atom lithography

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  • Universität Konstanz
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Details

OriginalspracheEnglisch
Seiten (von - bis)148-153
Seitenumfang6
FachzeitschriftEurophysics Letters
Jahrgang46
Ausgabenummer2
PublikationsstatusVeröffentlicht - 2 Apr. 1999
Extern publiziertJa

Abstract

In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.

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Polarization gradient light masks in atom lithography. / Brezger, B.; Schulze, Th; Schmidt, Piet Oliver et al.
in: Europhysics Letters, Jahrgang 46, Nr. 2, 02.04.1999, S. 148-153.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Brezger, B, Schulze, T, Schmidt, PO, Mertens, R, Pfau, T & Mlynek, J 1999, 'Polarization gradient light masks in atom lithography', Europhysics Letters, Jg. 46, Nr. 2, S. 148-153. https://doi.org/10.1209/epl/i1999-00237-5
Brezger, B., Schulze, T., Schmidt, P. O., Mertens, R., Pfau, T., & Mlynek, J. (1999). Polarization gradient light masks in atom lithography. Europhysics Letters, 46(2), 148-153. https://doi.org/10.1209/epl/i1999-00237-5
Brezger B, Schulze T, Schmidt PO, Mertens R, Pfau T, Mlynek J. Polarization gradient light masks in atom lithography. Europhysics Letters. 1999 Apr 2;46(2):148-153. doi: 10.1209/epl/i1999-00237-5
Brezger, B. ; Schulze, Th ; Schmidt, Piet Oliver et al. / Polarization gradient light masks in atom lithography. in: Europhysics Letters. 1999 ; Jahrgang 46, Nr. 2. S. 148-153.
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