Polarization gradient light masks in atom lithography

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

Externe Organisationen

  • Universität Konstanz
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)148-153
Seitenumfang6
FachzeitschriftEurophysics Letters (EPL)
Jahrgang46
Ausgabenummer2
PublikationsstatusVeröffentlicht - 2 Apr. 1999
Extern publiziertJa

Abstract

In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.

ASJC Scopus Sachgebiete

Zitieren

Polarization gradient light masks in atom lithography. / Brezger, B.; Schulze, Th; Schmidt, Piet Oliver et al.
in: Europhysics Letters (EPL), Jahrgang 46, Nr. 2, 02.04.1999, S. 148-153.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Brezger, B, Schulze, T, Schmidt, PO, Mertens, R, Pfau, T & Mlynek, J 1999, 'Polarization gradient light masks in atom lithography', Europhysics Letters (EPL), Jg. 46, Nr. 2, S. 148-153. https://doi.org/10.1209/epl/i1999-00237-5
Brezger, B., Schulze, T., Schmidt, P. O., Mertens, R., Pfau, T., & Mlynek, J. (1999). Polarization gradient light masks in atom lithography. Europhysics Letters (EPL), 46(2), 148-153. https://doi.org/10.1209/epl/i1999-00237-5
Brezger B, Schulze T, Schmidt PO, Mertens R, Pfau T, Mlynek J. Polarization gradient light masks in atom lithography. Europhysics Letters (EPL). 1999 Apr 2;46(2):148-153. doi: 10.1209/epl/i1999-00237-5
Brezger, B. ; Schulze, Th ; Schmidt, Piet Oliver et al. / Polarization gradient light masks in atom lithography. in: Europhysics Letters (EPL). 1999 ; Jahrgang 46, Nr. 2. S. 148-153.
Download
@article{50180d24ee4248889b87c4cd569c4534,
title = "Polarization gradient light masks in atom lithography",
abstract = "In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.",
author = "B. Brezger and Th Schulze and Schmidt, {Piet Oliver} and R. Mertens and T. Pfau and J. Mlynek",
year = "1999",
month = apr,
day = "2",
doi = "10.1209/epl/i1999-00237-5",
language = "English",
volume = "46",
pages = "148--153",
journal = "Europhysics Letters (EPL)",
issn = "0295-5075",
publisher = "IOP Publishing Ltd.",
number = "2",

}

Download

TY - JOUR

T1 - Polarization gradient light masks in atom lithography

AU - Brezger, B.

AU - Schulze, Th

AU - Schmidt, Piet Oliver

AU - Mertens, R.

AU - Pfau, T.

AU - Mlynek, J.

PY - 1999/4/2

Y1 - 1999/4/2

N2 - In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.

AB - In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.

UR - http://www.scopus.com/inward/record.url?scp=0033560183&partnerID=8YFLogxK

U2 - 10.1209/epl/i1999-00237-5

DO - 10.1209/epl/i1999-00237-5

M3 - Article

AN - SCOPUS:0033560183

VL - 46

SP - 148

EP - 153

JO - Europhysics Letters (EPL)

JF - Europhysics Letters (EPL)

SN - 0295-5075

IS - 2

ER -

Von denselben Autoren