Plasmon damping below the Landau regime: The role of defects in epitaxial graphene

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • Thomas Langer
  • J. Baringhaus
  • Herbert Pfnür
  • H. W. Schumacher
  • Christoph Tegenkamp

Organisationseinheiten

Externe Organisationen

  • Physikalisch-Technische Bundesanstalt (PTB)
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Details

OriginalspracheEnglisch
Aufsatznummer033017
FachzeitschriftNew Journal of Physics
Jahrgang12
PublikationsstatusVeröffentlicht - 11 März 2010

Abstract

The sheet plasmon in epitaxially grown graphene layers on SiC(0001) and the influence of surface roughness have been investigated in detail by means of low-energy electron diffraction (LEED) and electron energy loss spectroscopy (EELS). We show that the existence of steps or grain boundaries in this epitaxial system is a source of strong damping, while the dispersion is rather insensitive to defects. To the first order, the lifetime of the plasmons was found to be proportional to the average terrace length and to the plasmon wavelength. A possible reason for this surprisingly efficient plasmon damping may be the close coincidence of phase (and group) velocities of the plasmons (almost linear dispersion) with the Fermi velocity of the electrons. Therefore, uncorrelated defects like steps only have to act as a momentum source to effectively couple plasmons to the electron-hole continuum.

ASJC Scopus Sachgebiete

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Plasmon damping below the Landau regime: The role of defects in epitaxial graphene. / Langer, Thomas; Baringhaus, J.; Pfnür, Herbert et al.
in: New Journal of Physics, Jahrgang 12, 033017, 11.03.2010.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Langer T, Baringhaus J, Pfnür H, Schumacher HW, Tegenkamp C. Plasmon damping below the Landau regime: The role of defects in epitaxial graphene. New Journal of Physics. 2010 Mär 11;12:033017. doi: 10.1088/1367-2630/12/3/033017
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@article{b40655b25f954335b1b341e2fbe6a814,
title = "Plasmon damping below the Landau regime: The role of defects in epitaxial graphene",
abstract = "The sheet plasmon in epitaxially grown graphene layers on SiC(0001) and the influence of surface roughness have been investigated in detail by means of low-energy electron diffraction (LEED) and electron energy loss spectroscopy (EELS). We show that the existence of steps or grain boundaries in this epitaxial system is a source of strong damping, while the dispersion is rather insensitive to defects. To the first order, the lifetime of the plasmons was found to be proportional to the average terrace length and to the plasmon wavelength. A possible reason for this surprisingly efficient plasmon damping may be the close coincidence of phase (and group) velocities of the plasmons (almost linear dispersion) with the Fermi velocity of the electrons. Therefore, uncorrelated defects like steps only have to act as a momentum source to effectively couple plasmons to the electron-hole continuum.",
author = "Thomas Langer and J. Baringhaus and Herbert Pfn{\"u}r and Schumacher, {H. W.} and Christoph Tegenkamp",
year = "2010",
month = mar,
day = "11",
doi = "10.1088/1367-2630/12/3/033017",
language = "English",
volume = "12",
journal = "New Journal of Physics",
issn = "1367-2630",
publisher = "IOP Publishing Ltd.",

}

Download

TY - JOUR

T1 - Plasmon damping below the Landau regime

T2 - The role of defects in epitaxial graphene

AU - Langer, Thomas

AU - Baringhaus, J.

AU - Pfnür, Herbert

AU - Schumacher, H. W.

AU - Tegenkamp, Christoph

PY - 2010/3/11

Y1 - 2010/3/11

N2 - The sheet plasmon in epitaxially grown graphene layers on SiC(0001) and the influence of surface roughness have been investigated in detail by means of low-energy electron diffraction (LEED) and electron energy loss spectroscopy (EELS). We show that the existence of steps or grain boundaries in this epitaxial system is a source of strong damping, while the dispersion is rather insensitive to defects. To the first order, the lifetime of the plasmons was found to be proportional to the average terrace length and to the plasmon wavelength. A possible reason for this surprisingly efficient plasmon damping may be the close coincidence of phase (and group) velocities of the plasmons (almost linear dispersion) with the Fermi velocity of the electrons. Therefore, uncorrelated defects like steps only have to act as a momentum source to effectively couple plasmons to the electron-hole continuum.

AB - The sheet plasmon in epitaxially grown graphene layers on SiC(0001) and the influence of surface roughness have been investigated in detail by means of low-energy electron diffraction (LEED) and electron energy loss spectroscopy (EELS). We show that the existence of steps or grain boundaries in this epitaxial system is a source of strong damping, while the dispersion is rather insensitive to defects. To the first order, the lifetime of the plasmons was found to be proportional to the average terrace length and to the plasmon wavelength. A possible reason for this surprisingly efficient plasmon damping may be the close coincidence of phase (and group) velocities of the plasmons (almost linear dispersion) with the Fermi velocity of the electrons. Therefore, uncorrelated defects like steps only have to act as a momentum source to effectively couple plasmons to the electron-hole continuum.

UR - http://www.scopus.com/inward/record.url?scp=77951196887&partnerID=8YFLogxK

U2 - 10.1088/1367-2630/12/3/033017

DO - 10.1088/1367-2630/12/3/033017

M3 - Article

AN - SCOPUS:77951196887

VL - 12

JO - New Journal of Physics

JF - New Journal of Physics

SN - 1367-2630

M1 - 033017

ER -

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