Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Advances in Optical Thin Films IV |
| Publikationsstatus | Veröffentlicht - 4 Okt. 2011 |
| Extern publiziert | Ja |
| Veranstaltung | Advances in Optical Thin Films IV - Marseille, Frankreich Dauer: 5 Sept. 2011 → 7 Sept. 2011 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 8168 |
| ISSN (Print) | 0277-786X |
Abstract
The PluTO project is aimed at combining thin-film and plasma technologies. Accordingly, the consortium comprises experts in optical coating (Laser Zentrum Hannover, Fraunhofer IOF) and such in plasma technology (INP Greifswald, Ruhr University of Bochum RUB). The process plasmas available, especially the sheath layers, will be thoroughly characterized by means of special probes, so that the types, numbers and energies of the particles participating in the coating formation processes can be determined comprehensively in every detail for the first time. The data thus obtained will provide a basis for a numerical modelling of layer growth at atomic scale (Bremen Center for Computational Materials Science BCCMS). The results are expected to deepen the understanding of the physical mechanisms responsible for the influence of plasma action on the layer properties. In parallel, suitable tools for process monitoring will be identified and made available. Some first results have already been achieved which prove the viability of the approach.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
Zitieren
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- BibTex
- RIS
Advances in Optical Thin Films IV. 2011. 1 (Proceedings of SPIE - The International Society for Optical Engineering; Band 8168).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Plasma and optical thin film technologies
AU - Stenzel, O.
AU - Wilbrandt, S.
AU - Kaiser, N.
AU - Schmitz, Carsten
AU - Turowski, Marcus
AU - Ristau, Detlev
AU - Awakowicz, P.
AU - Brinkmann, R. P.
AU - Musch, T.
AU - Rolfes, I.
AU - Steffen, H.
AU - Foest, R.
AU - Ohl, A.
AU - Köhler, T.
AU - Dolgonos, G.
AU - Frauenheim, Thomas
PY - 2011/10/4
Y1 - 2011/10/4
N2 - The PluTO project is aimed at combining thin-film and plasma technologies. Accordingly, the consortium comprises experts in optical coating (Laser Zentrum Hannover, Fraunhofer IOF) and such in plasma technology (INP Greifswald, Ruhr University of Bochum RUB). The process plasmas available, especially the sheath layers, will be thoroughly characterized by means of special probes, so that the types, numbers and energies of the particles participating in the coating formation processes can be determined comprehensively in every detail for the first time. The data thus obtained will provide a basis for a numerical modelling of layer growth at atomic scale (Bremen Center for Computational Materials Science BCCMS). The results are expected to deepen the understanding of the physical mechanisms responsible for the influence of plasma action on the layer properties. In parallel, suitable tools for process monitoring will be identified and made available. Some first results have already been achieved which prove the viability of the approach.
AB - The PluTO project is aimed at combining thin-film and plasma technologies. Accordingly, the consortium comprises experts in optical coating (Laser Zentrum Hannover, Fraunhofer IOF) and such in plasma technology (INP Greifswald, Ruhr University of Bochum RUB). The process plasmas available, especially the sheath layers, will be thoroughly characterized by means of special probes, so that the types, numbers and energies of the particles participating in the coating formation processes can be determined comprehensively in every detail for the first time. The data thus obtained will provide a basis for a numerical modelling of layer growth at atomic scale (Bremen Center for Computational Materials Science BCCMS). The results are expected to deepen the understanding of the physical mechanisms responsible for the influence of plasma action on the layer properties. In parallel, suitable tools for process monitoring will be identified and made available. Some first results have already been achieved which prove the viability of the approach.
KW - Density-functional tight-binding method
KW - Film growth simulation
KW - Ion beam sputtering
KW - Multipole plasma probe
KW - Optical properties
KW - Plasma characterization
KW - Plasma ion-assisted film deposition
UR - http://www.scopus.com/inward/record.url?scp=80455127057&partnerID=8YFLogxK
U2 - 10.1117/12.895323
DO - 10.1117/12.895323
M3 - Conference contribution
AN - SCOPUS:80455127057
SN - 9780819487940
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Optical Thin Films IV
T2 - Advances in Optical Thin Films IV
Y2 - 5 September 2011 through 7 September 2011
ER -