Pinhole density and contact resistivity of carrier selective junctions with polycrystalline silicon on oxide

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • T. F. Wietler
  • D. Tetzlaff
  • J. Krügener
  • M. Rienäcker
  • F. Haase
  • Y. Larionova
  • R. Brendel
  • R. Peibst

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
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Details

OriginalspracheEnglisch
Aufsatznummer253902
FachzeitschriftApplied physics letters
Jahrgang110
Ausgabenummer25
PublikationsstatusVeröffentlicht - 19 Juni 2017

Abstract

In the pursuit of ever higher conversion efficiencies for silicon photovoltaic cells, polycrystalline silicon (poly-Si) layers on thin silicon oxide films were shown to form excellent carrier-selective junctions on crystalline silicon substrates. Investigating the pinhole formation that is induced in the thermal processing of the poly-Si on oxide (POLO) junctions is essential for optimizing their electronic performance. We observe the pinholes in the oxide layer by selective etching of the underlying crystalline silicon. The originally nm-sized pinholes are thus readily detected using simple optical and scanning electron microscopy. The resulting pinhole densities are in the range of 6.6 × 106 cm-2 to 1.6 × 108 cm-2 for POLO junctions with selectivities close to S10 = 16, i.e., saturation current density J0c below 10 fA/cm2 and contact resistivity ρc below 10 mΩcm2. The measured pinhole densities agree with values deduced by a pinhole-mediated current transport model. Thus, we conclude pinhole-mediated current transport to be the dominating transport mechanism in the POLO junctions investigated here.

ASJC Scopus Sachgebiete

Ziele für nachhaltige Entwicklung

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Pinhole density and contact resistivity of carrier selective junctions with polycrystalline silicon on oxide. / Wietler, T. F.; Tetzlaff, D.; Krügener, J. et al.
in: Applied physics letters, Jahrgang 110, Nr. 25, 253902, 19.06.2017.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Wietler, TF, Tetzlaff, D, Krügener, J, Rienäcker, M, Haase, F, Larionova, Y, Brendel, R & Peibst, R 2017, 'Pinhole density and contact resistivity of carrier selective junctions with polycrystalline silicon on oxide', Applied physics letters, Jg. 110, Nr. 25, 253902. https://doi.org/10.1063/1.4986924
Wietler, T. F., Tetzlaff, D., Krügener, J., Rienäcker, M., Haase, F., Larionova, Y., Brendel, R., & Peibst, R. (2017). Pinhole density and contact resistivity of carrier selective junctions with polycrystalline silicon on oxide. Applied physics letters, 110(25), Artikel 253902. https://doi.org/10.1063/1.4986924
Wietler TF, Tetzlaff D, Krügener J, Rienäcker M, Haase F, Larionova Y et al. Pinhole density and contact resistivity of carrier selective junctions with polycrystalline silicon on oxide. Applied physics letters. 2017 Jun 19;110(25):253902. doi: 10.1063/1.4986924
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AU - Wietler, T. F.

AU - Tetzlaff, D.

AU - Krügener, J.

AU - Rienäcker, M.

AU - Haase, F.

AU - Larionova, Y.

AU - Brendel, R.

AU - Peibst, R.

PY - 2017/6/19

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N2 - In the pursuit of ever higher conversion efficiencies for silicon photovoltaic cells, polycrystalline silicon (poly-Si) layers on thin silicon oxide films were shown to form excellent carrier-selective junctions on crystalline silicon substrates. Investigating the pinhole formation that is induced in the thermal processing of the poly-Si on oxide (POLO) junctions is essential for optimizing their electronic performance. We observe the pinholes in the oxide layer by selective etching of the underlying crystalline silicon. The originally nm-sized pinholes are thus readily detected using simple optical and scanning electron microscopy. The resulting pinhole densities are in the range of 6.6 × 106 cm-2 to 1.6 × 108 cm-2 for POLO junctions with selectivities close to S10 = 16, i.e., saturation current density J0c below 10 fA/cm2 and contact resistivity ρc below 10 mΩcm2. The measured pinhole densities agree with values deduced by a pinhole-mediated current transport model. Thus, we conclude pinhole-mediated current transport to be the dominating transport mechanism in the POLO junctions investigated here.

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