Physical mechanisms of femtosecond pulse induced damage in dielectric thin-films

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Autoren

  • Jayesh C. Jasapara
  • A. V. Vasudevan Nampoothiri
  • Wolfgang G. Rudolph
  • Detlev Ristau
  • Kai Starke

Externe Organisationen

  • University of New Mexico
  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksLaser-Induced Damage in Optical Materials: 2000
Untertitelproceedings
ErscheinungsortBellingham
Herausgeber (Verlag)SPIE
Seiten35-44
Seitenumfang10
ISBN (Print)0-8194-4036-1
PublikationsstatusVeröffentlicht - 12 Apr. 2001
Extern publiziertJa

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Herausgeber (Verlag)SPIE
Band4347
ISSN (Print)0277-786X

Abstract

Laser induced breakdown of a high-quality mirror consisting of alternating λ/4 layers of Ta2O5 and SiO2 and a single 500 nm thin film of Ta2O5 were studied with amplified and unamplified femtosecond pulses. The experimental data can be fitted with a model taking into account multiphoton absorption, impact ionization, and local intensity enhancements due to interference effects in the films. The results indicate that state of the art, high-quality thin films show a damage behavior that is similar to bulk materials. Defects and impurities play a negligible role. Incubation effects are found to reduce the damage threshold when the coatings are damaged with multiple pulses from a femtosecond oscillator. Time-resolved pump-probe reflection and transmission experiments indicate a decay of the excited electron plasma with characteristic time constants of 4 ps, 60 ps, and 700 ps.

ASJC Scopus Sachgebiete

Zitieren

Physical mechanisms of femtosecond pulse induced damage in dielectric thin-films. / Jasapara, Jayesh C.; Nampoothiri, A. V. Vasudevan; Rudolph, Wolfgang G. et al.
Laser-Induced Damage in Optical Materials: 2000: proceedings. Bellingham: SPIE, 2001. S. 35-44 (Proceedings of SPIE - The International Society for Optical Engineering; Band 4347).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Jasapara, JC, Nampoothiri, AVV, Rudolph, WG, Ristau, D & Starke, K 2001, Physical mechanisms of femtosecond pulse induced damage in dielectric thin-films. in Laser-Induced Damage in Optical Materials: 2000: proceedings. Proceedings of SPIE - The International Society for Optical Engineering, Bd. 4347, SPIE, Bellingham, S. 35-44. https://doi.org/10.1117/12.425032
Jasapara, J. C., Nampoothiri, A. V. V., Rudolph, W. G., Ristau, D., & Starke, K. (2001). Physical mechanisms of femtosecond pulse induced damage in dielectric thin-films. In Laser-Induced Damage in Optical Materials: 2000: proceedings (S. 35-44). (Proceedings of SPIE - The International Society for Optical Engineering; Band 4347). SPIE. https://doi.org/10.1117/12.425032
Jasapara JC, Nampoothiri AVV, Rudolph WG, Ristau D, Starke K. Physical mechanisms of femtosecond pulse induced damage in dielectric thin-films. in Laser-Induced Damage in Optical Materials: 2000: proceedings. Bellingham: SPIE. 2001. S. 35-44. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.425032
Jasapara, Jayesh C. ; Nampoothiri, A. V. Vasudevan ; Rudolph, Wolfgang G. et al. / Physical mechanisms of femtosecond pulse induced damage in dielectric thin-films. Laser-Induced Damage in Optical Materials: 2000: proceedings. Bellingham : SPIE, 2001. S. 35-44 (Proceedings of SPIE - The International Society for Optical Engineering).
Download
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AU - Nampoothiri, A. V. Vasudevan

AU - Rudolph, Wolfgang G.

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AU - Starke, Kai

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