Photoinduced hydrophilic behavior of TiO2 thin film on Si substrate

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • Aida V. Rudakova
  • Alexei V. Emeline
  • Andrey I. Romanychev
  • Detlef W. Bahnemann

Organisationseinheiten

Externe Organisationen

  • Staatliche Universität Sankt Petersburg
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Aufsatznummer159746
FachzeitschriftJournal of Alloys and Compounds
Jahrgang872
Frühes Online-Datum2 Apr. 2021
PublikationsstatusVeröffentlicht - 15 Aug. 2021

Abstract

Photoinduced hydrophilic behavior of TiO2 thin film synthesized by atomic layer deposition method on p-Si wafer as well on SiO2-coated glass has been studied. In contrast to the TiO2 film on SiO2-coated glass, the TiO2 film on the Si wafer initially had a moderate hydrophobicity and became more hydrophobic upon visible light exposure. Such a significant difference was explained by the formation of a type-II TiO2–Si heterostructure that was confirmed by the alteration of the work function. The role of photoelectrons in the mechanism of light-induced hydrophilic conversion of the TiO2 surface was elucidated, which reduces to the deactivation of both active surface sites responsible for the superhydrophilic transition and already existing hydrophilic sites. Reversible hydrophilic-to-hydrophobic surface conversion upon switching UV exposure by visible light has been demonstrated for TiO2/Si coatings. Similar to the tensiometric data, a cyclic change in the work function value was found. The observed cycles in values of water contact angle and work function were gradually ceasing. This phenomenon was associated with the formation of the interfacial SiOx layer as a result of light-induced passivation of silicon at the TiO2–Si interface.

ASJC Scopus Sachgebiete

Zitieren

Photoinduced hydrophilic behavior of TiO2 thin film on Si substrate. / Rudakova, Aida V.; Emeline, Alexei V.; Romanychev, Andrey I. et al.
in: Journal of Alloys and Compounds, Jahrgang 872, 159746, 15.08.2021.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Rudakova, A. V., Emeline, A. V., Romanychev, A. I., & Bahnemann, D. W. (2021). Photoinduced hydrophilic behavior of TiO2 thin film on Si substrate. Journal of Alloys and Compounds, 872, Artikel 159746. https://doi.org/10.1016/j.jallcom.2021.159746
Rudakova AV, Emeline AV, Romanychev AI, Bahnemann DW. Photoinduced hydrophilic behavior of TiO2 thin film on Si substrate. Journal of Alloys and Compounds. 2021 Aug 15;872:159746. Epub 2021 Apr 2. doi: 10.1016/j.jallcom.2021.159746
Rudakova, Aida V. ; Emeline, Alexei V. ; Romanychev, Andrey I. et al. / Photoinduced hydrophilic behavior of TiO2 thin film on Si substrate. in: Journal of Alloys and Compounds. 2021 ; Jahrgang 872.
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title = "Photoinduced hydrophilic behavior of TiO2 thin film on Si substrate",
abstract = "Photoinduced hydrophilic behavior of TiO2 thin film synthesized by atomic layer deposition method on p-Si wafer as well on SiO2-coated glass has been studied. In contrast to the TiO2 film on SiO2-coated glass, the TiO2 film on the Si wafer initially had a moderate hydrophobicity and became more hydrophobic upon visible light exposure. Such a significant difference was explained by the formation of a type-II TiO2–Si heterostructure that was confirmed by the alteration of the work function. The role of photoelectrons in the mechanism of light-induced hydrophilic conversion of the TiO2 surface was elucidated, which reduces to the deactivation of both active surface sites responsible for the superhydrophilic transition and already existing hydrophilic sites. Reversible hydrophilic-to-hydrophobic surface conversion upon switching UV exposure by visible light has been demonstrated for TiO2/Si coatings. Similar to the tensiometric data, a cyclic change in the work function value was found. The observed cycles in values of water contact angle and work function were gradually ceasing. This phenomenon was associated with the formation of the interfacial SiOx layer as a result of light-induced passivation of silicon at the TiO2–Si interface.",
keywords = "Photoinduced superhydrophilicity, Silicon, Substrate, Thin film, TiO-Si, Titanium dioxide, Type-II heterostructure",
author = "Rudakova, {Aida V.} and Emeline, {Alexei V.} and Romanychev, {Andrey I.} and Bahnemann, {Detlef W.}",
note = "Funding Information: The present study was performed within the Project {\textquoteleft}{\textquoteleft}Establishment of the Laboratory {\textquoteleft}{\textquoteleft}Photoactive Nanocomposite Materials” supported by a Research Grant of the Saint-Petersburg State University (Pure ID 73032813 ). A.V. Rudakova thanks to the Russian Foundation for Basic Research grant (No. 18-03-00855 ) which supported the studies of photoinduced hydrophilicity of composite thin films. Authors are also grateful to the RC “Nanophotonics”, RC “Centre for Innovative Technologies of Composite Nanomaterials” (personally to Denis G. Fuks) RC “Nanotechnology”, RC “X-ray Diffraction Studies” (personally to Dr. Igor Kasatkin), RC “Centre for Physical Methods of Surface Investigation” (personally to Dr. Alexandra Koroleva), RC “Centre for Optical and Laser Materials Research” of the Research Park at Saint-Petersburg State University for helpful assistance in conducting synthesis and characterization of the samples.",
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Download

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T1 - Photoinduced hydrophilic behavior of TiO2 thin film on Si substrate

AU - Rudakova, Aida V.

AU - Emeline, Alexei V.

AU - Romanychev, Andrey I.

AU - Bahnemann, Detlef W.

N1 - Funding Information: The present study was performed within the Project ‘‘Establishment of the Laboratory ‘‘Photoactive Nanocomposite Materials” supported by a Research Grant of the Saint-Petersburg State University (Pure ID 73032813 ). A.V. Rudakova thanks to the Russian Foundation for Basic Research grant (No. 18-03-00855 ) which supported the studies of photoinduced hydrophilicity of composite thin films. Authors are also grateful to the RC “Nanophotonics”, RC “Centre for Innovative Technologies of Composite Nanomaterials” (personally to Denis G. Fuks) RC “Nanotechnology”, RC “X-ray Diffraction Studies” (personally to Dr. Igor Kasatkin), RC “Centre for Physical Methods of Surface Investigation” (personally to Dr. Alexandra Koroleva), RC “Centre for Optical and Laser Materials Research” of the Research Park at Saint-Petersburg State University for helpful assistance in conducting synthesis and characterization of the samples.

PY - 2021/8/15

Y1 - 2021/8/15

N2 - Photoinduced hydrophilic behavior of TiO2 thin film synthesized by atomic layer deposition method on p-Si wafer as well on SiO2-coated glass has been studied. In contrast to the TiO2 film on SiO2-coated glass, the TiO2 film on the Si wafer initially had a moderate hydrophobicity and became more hydrophobic upon visible light exposure. Such a significant difference was explained by the formation of a type-II TiO2–Si heterostructure that was confirmed by the alteration of the work function. The role of photoelectrons in the mechanism of light-induced hydrophilic conversion of the TiO2 surface was elucidated, which reduces to the deactivation of both active surface sites responsible for the superhydrophilic transition and already existing hydrophilic sites. Reversible hydrophilic-to-hydrophobic surface conversion upon switching UV exposure by visible light has been demonstrated for TiO2/Si coatings. Similar to the tensiometric data, a cyclic change in the work function value was found. The observed cycles in values of water contact angle and work function were gradually ceasing. This phenomenon was associated with the formation of the interfacial SiOx layer as a result of light-induced passivation of silicon at the TiO2–Si interface.

AB - Photoinduced hydrophilic behavior of TiO2 thin film synthesized by atomic layer deposition method on p-Si wafer as well on SiO2-coated glass has been studied. In contrast to the TiO2 film on SiO2-coated glass, the TiO2 film on the Si wafer initially had a moderate hydrophobicity and became more hydrophobic upon visible light exposure. Such a significant difference was explained by the formation of a type-II TiO2–Si heterostructure that was confirmed by the alteration of the work function. The role of photoelectrons in the mechanism of light-induced hydrophilic conversion of the TiO2 surface was elucidated, which reduces to the deactivation of both active surface sites responsible for the superhydrophilic transition and already existing hydrophilic sites. Reversible hydrophilic-to-hydrophobic surface conversion upon switching UV exposure by visible light has been demonstrated for TiO2/Si coatings. Similar to the tensiometric data, a cyclic change in the work function value was found. The observed cycles in values of water contact angle and work function were gradually ceasing. This phenomenon was associated with the formation of the interfacial SiOx layer as a result of light-induced passivation of silicon at the TiO2–Si interface.

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KW - Silicon

KW - Substrate

KW - Thin film

KW - TiO-Si

KW - Titanium dioxide

KW - Type-II heterostructure

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