Performance enhancement of ion beam sputtered oxide coatings for 193 nm

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autoren

  • H. Blaschke
  • Marc Lappschies
  • Detlev Ristau

Externe Organisationen

  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des Sammelwerks39th Annual Boulder Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
Untertitel2007
PublikationsstatusVeröffentlicht - 20 Dez. 2007
Extern publiziertJa
Veranstaltung39th Annual Symposium on Optical Materials for High-Power Lasers - Boulder, CO, USA / Vereinigte Staaten
Dauer: 24 Sept. 200726 Sept. 2007

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Band6720
ISSN (Print)0277-786X

Abstract

The utilization of oxide mixtures as layer material for coating design has been transferred to the ion beam sputtering technology and was applied to high-reflecting as well as anti-reflecting components at the wavelength of 193 nm. Exclusively, the oxides SiO2 and Al2O3 are candidates for appropriate thin film designs below 200 nm. Experimental data received from laser-calorimetric measurements, spectroscopic investigations and laser-induced damage tests are presented for several specimens. With respect to state-of-the-art thin film deposition in the DUV spectral range, conventional quarterwave designs have also been characterized and will be compared to the sputtered mixed oxide coatings.

ASJC Scopus Sachgebiete

Zitieren

Performance enhancement of ion beam sputtered oxide coatings for 193 nm. / Blaschke, H.; Lappschies, Marc; Ristau, Detlev.
39th Annual Boulder Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2007. 2007. 67200T (Proceedings of SPIE - The International Society for Optical Engineering; Band 6720).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Blaschke, H, Lappschies, M & Ristau, D 2007, Performance enhancement of ion beam sputtered oxide coatings for 193 nm. in 39th Annual Boulder Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2007., 67200T, Proceedings of SPIE - The International Society for Optical Engineering, Bd. 6720, 39th Annual Symposium on Optical Materials for High-Power Lasers, Boulder, CO, USA / Vereinigte Staaten, 24 Sept. 2007. https://doi.org/10.1117/12.752908
Blaschke, H., Lappschies, M., & Ristau, D. (2007). Performance enhancement of ion beam sputtered oxide coatings for 193 nm. In 39th Annual Boulder Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2007 Artikel 67200T (Proceedings of SPIE - The International Society for Optical Engineering; Band 6720). https://doi.org/10.1117/12.752908
Blaschke H, Lappschies M, Ristau D. Performance enhancement of ion beam sputtered oxide coatings for 193 nm. in 39th Annual Boulder Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2007. 2007. 67200T. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.752908
Blaschke, H. ; Lappschies, Marc ; Ristau, Detlev. / Performance enhancement of ion beam sputtered oxide coatings for 193 nm. 39th Annual Boulder Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2007. 2007. (Proceedings of SPIE - The International Society for Optical Engineering).
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title = "Performance enhancement of ion beam sputtered oxide coatings for 193 nm",
abstract = "The utilization of oxide mixtures as layer material for coating design has been transferred to the ion beam sputtering technology and was applied to high-reflecting as well as anti-reflecting components at the wavelength of 193 nm. Exclusively, the oxides SiO2 and Al2O3 are candidates for appropriate thin film designs below 200 nm. Experimental data received from laser-calorimetric measurements, spectroscopic investigations and laser-induced damage tests are presented for several specimens. With respect to state-of-the-art thin film deposition in the DUV spectral range, conventional quarterwave designs have also been characterized and will be compared to the sputtered mixed oxide coatings.",
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AU - Ristau, Detlev

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N2 - The utilization of oxide mixtures as layer material for coating design has been transferred to the ion beam sputtering technology and was applied to high-reflecting as well as anti-reflecting components at the wavelength of 193 nm. Exclusively, the oxides SiO2 and Al2O3 are candidates for appropriate thin film designs below 200 nm. Experimental data received from laser-calorimetric measurements, spectroscopic investigations and laser-induced damage tests are presented for several specimens. With respect to state-of-the-art thin film deposition in the DUV spectral range, conventional quarterwave designs have also been characterized and will be compared to the sputtered mixed oxide coatings.

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