Patterning microfluidic device wettability using flow confinement

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

Externe Organisationen

  • Harvard University
  • Universität Hamburg
  • Freie Universität Berlin (FU Berlin)
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Details

OriginalspracheEnglisch
Seiten (von - bis)1774-1776
Seitenumfang3
FachzeitschriftLab on a Chip
Jahrgang10
Ausgabenummer14
PublikationsstatusVeröffentlicht - 21 Mai 2010
Extern publiziertJa

Abstract

We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.

ASJC Scopus Sachgebiete

Zitieren

Patterning microfluidic device wettability using flow confinement. / Abate, Adam R.; Thiele, Julian; Weinhart, Marie et al.
in: Lab on a Chip, Jahrgang 10, Nr. 14, 21.05.2010, S. 1774-1776.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Abate AR, Thiele J, Weinhart M, Weitz DA. Patterning microfluidic device wettability using flow confinement. Lab on a Chip. 2010 Mai 21;10(14):1774-1776. doi: 10.1039/c004124f
Abate, Adam R. ; Thiele, Julian ; Weinhart, Marie et al. / Patterning microfluidic device wettability using flow confinement. in: Lab on a Chip. 2010 ; Jahrgang 10, Nr. 14. S. 1774-1776.
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