Overshoot Prevention in Monolithic GaN by Ultra-Low ESL Gate Loop Design Using Chip-Scale Capacitors and Gate Driver Pull-Up Path Tuning Technique

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OriginalspracheEnglisch
Titel des Sammelwerks2024 IEEE Applied Power Electronics Conference and Exposition
UntertitelAPEC
Herausgeber (Verlag)Institute of Electrical and Electronics Engineers Inc.
Seiten2409-2414
Seitenumfang6
ISBN (elektronisch)9798350316643
ISBN (Print)979-8-3503-1665-0
PublikationsstatusVeröffentlicht - 2024
Veranstaltung39th Annual IEEE Applied Power Electronics Conference and Exposition, APEC 2024 - Long Beach, USA / Vereinigte Staaten
Dauer: 25 Feb. 202429 Feb. 2024

Abstract

Despite monolithic integration of GaN gate drivers with the power stage, some parasitic gate loop inductance remains, including connections to off-chip decoupling capacitors. On-chip capacitors, however, complicate the gate loop design by adding another pole to the system. An LC-RC resonant tank replaces the conventional RLC model, which is insufficient. Ultra-low ESL decoupling using chip-scale silicon capacitors bonded directly to the GaN-IC is identified as most effective by measurements for PCB and bonded MLCC and SiCap gate loop decoupling. A voltage-tuning technique-based gate driver, implemented on a GaN-IC, is applied to adapt to the remaining loop inductance and reduce critical overshoot while ensuring fast switching.

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Overshoot Prevention in Monolithic GaN by Ultra-Low ESL Gate Loop Design Using Chip-Scale Capacitors and Gate Driver Pull-Up Path Tuning Technique. / Deneke, Niklas; Wicht, Bernhard.
2024 IEEE Applied Power Electronics Conference and Exposition: APEC . Institute of Electrical and Electronics Engineers Inc., 2024. S. 2409-2414.

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Deneke, N & Wicht, B 2024, Overshoot Prevention in Monolithic GaN by Ultra-Low ESL Gate Loop Design Using Chip-Scale Capacitors and Gate Driver Pull-Up Path Tuning Technique. in 2024 IEEE Applied Power Electronics Conference and Exposition: APEC . Institute of Electrical and Electronics Engineers Inc., S. 2409-2414, 39th Annual IEEE Applied Power Electronics Conference and Exposition, APEC 2024, Long Beach, California, USA / Vereinigte Staaten, 25 Feb. 2024. https://doi.org/10.1109/APEC48139.2024.10509192
Deneke, N., & Wicht, B. (2024). Overshoot Prevention in Monolithic GaN by Ultra-Low ESL Gate Loop Design Using Chip-Scale Capacitors and Gate Driver Pull-Up Path Tuning Technique. In 2024 IEEE Applied Power Electronics Conference and Exposition: APEC (S. 2409-2414). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/APEC48139.2024.10509192
Deneke N, Wicht B. Overshoot Prevention in Monolithic GaN by Ultra-Low ESL Gate Loop Design Using Chip-Scale Capacitors and Gate Driver Pull-Up Path Tuning Technique. in 2024 IEEE Applied Power Electronics Conference and Exposition: APEC . Institute of Electrical and Electronics Engineers Inc. 2024. S. 2409-2414 doi: 10.1109/APEC48139.2024.10509192
Deneke, Niklas ; Wicht, Bernhard. / Overshoot Prevention in Monolithic GaN by Ultra-Low ESL Gate Loop Design Using Chip-Scale Capacitors and Gate Driver Pull-Up Path Tuning Technique. 2024 IEEE Applied Power Electronics Conference and Exposition: APEC . Institute of Electrical and Electronics Engineers Inc., 2024. S. 2409-2414
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abstract = "Despite monolithic integration of GaN gate drivers with the power stage, some parasitic gate loop inductance remains, including connections to off-chip decoupling capacitors. On-chip capacitors, however, complicate the gate loop design by adding another pole to the system. An LC-RC resonant tank replaces the conventional RLC model, which is insufficient. Ultra-low ESL decoupling using chip-scale silicon capacitors bonded directly to the GaN-IC is identified as most effective by measurements for PCB and bonded MLCC and SiCap gate loop decoupling. A voltage-tuning technique-based gate driver, implemented on a GaN-IC, is applied to adapt to the remaining loop inductance and reduce critical overshoot while ensuring fast switching.",
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AU - Deneke, Niklas

AU - Wicht, Bernhard

N1 - Publisher Copyright: © 2024 IEEE.

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N2 - Despite monolithic integration of GaN gate drivers with the power stage, some parasitic gate loop inductance remains, including connections to off-chip decoupling capacitors. On-chip capacitors, however, complicate the gate loop design by adding another pole to the system. An LC-RC resonant tank replaces the conventional RLC model, which is insufficient. Ultra-low ESL decoupling using chip-scale silicon capacitors bonded directly to the GaN-IC is identified as most effective by measurements for PCB and bonded MLCC and SiCap gate loop decoupling. A voltage-tuning technique-based gate driver, implemented on a GaN-IC, is applied to adapt to the remaining loop inductance and reduce critical overshoot while ensuring fast switching.

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