Details
Originalsprache | Englisch |
---|---|
Titel des Sammelwerks | Advances in Optical Thin Films III |
Publikationsstatus | Veröffentlicht - 25 Sept. 2008 |
Extern publiziert | Ja |
Veranstaltung | Advances in Optical Thin Films III - Glasgow, Großbritannien / Vereinigtes Königreich Dauer: 2 Sept. 2008 → 3 Sept. 2008 |
Publikationsreihe
Name | Proceedings of SPIE - The International Society for Optical Engineering |
---|---|
Band | 7101 |
ISSN (Print) | 0277-786X |
Abstract
The term photocatalysis is used to describe a photon-driven catalytic process. Titanium dioxide is a well-known photocatalyst in such fields as self-cleaning material and anti-microbial effects. Besides these photocatalytic applications, TiO2 is a widely-used high index material for optical thin films. In the present investigation, the photocatalytic activity of transparent TiO2 thin films was optimized to achieve multifunctional high precision optical coatings. The films have been deposited by ion assisted deposition (IAD), applying a Leybold APS plasma source as well as a Denton CC-105 ion source. The cause-and-effect chain between the use of different parameters in the IAD process and optical properties of the TiO2 layers as well as their photocatalytic activities are described. As test reaction for the determination of the photocatalytic properties, the degradation of methylene blue (MB) was chosen. The used setup based on a high precision two-path laser measurement system was developed by the LZH in order to determine the kinetic performance of TiO2 catalysts under well-defined UV illumination conditions. Photonic efficiencies of the TiO2 thin films were calculated from the obtained data. Additionally, crystal structure analysis has been investigated for the identification of anatase and rutile modifications. The comparison of the results shows that ion assisted deposition is an appropriate technology for the preparation of photocatalytic active thin films for optical applications.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
Zitieren
- Standard
- Harvard
- Apa
- Vancouver
- BibTex
- RIS
Advances in Optical Thin Films III. 2008. 71010K (Proceedings of SPIE - The International Society for Optical Engineering; Band 7101).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Optimization and characterization of transparent photocatalytic TiO 2 thin films prepared by ion-assisted deposition
AU - Boughaled, Redouan
AU - Schlichting, Sebastian
AU - Ehlers, Henrik
AU - Ristau, Detlev
AU - Bannat, Inga
AU - Wark, Michael
PY - 2008/9/25
Y1 - 2008/9/25
N2 - The term photocatalysis is used to describe a photon-driven catalytic process. Titanium dioxide is a well-known photocatalyst in such fields as self-cleaning material and anti-microbial effects. Besides these photocatalytic applications, TiO2 is a widely-used high index material for optical thin films. In the present investigation, the photocatalytic activity of transparent TiO2 thin films was optimized to achieve multifunctional high precision optical coatings. The films have been deposited by ion assisted deposition (IAD), applying a Leybold APS plasma source as well as a Denton CC-105 ion source. The cause-and-effect chain between the use of different parameters in the IAD process and optical properties of the TiO2 layers as well as their photocatalytic activities are described. As test reaction for the determination of the photocatalytic properties, the degradation of methylene blue (MB) was chosen. The used setup based on a high precision two-path laser measurement system was developed by the LZH in order to determine the kinetic performance of TiO2 catalysts under well-defined UV illumination conditions. Photonic efficiencies of the TiO2 thin films were calculated from the obtained data. Additionally, crystal structure analysis has been investigated for the identification of anatase and rutile modifications. The comparison of the results shows that ion assisted deposition is an appropriate technology for the preparation of photocatalytic active thin films for optical applications.
AB - The term photocatalysis is used to describe a photon-driven catalytic process. Titanium dioxide is a well-known photocatalyst in such fields as self-cleaning material and anti-microbial effects. Besides these photocatalytic applications, TiO2 is a widely-used high index material for optical thin films. In the present investigation, the photocatalytic activity of transparent TiO2 thin films was optimized to achieve multifunctional high precision optical coatings. The films have been deposited by ion assisted deposition (IAD), applying a Leybold APS plasma source as well as a Denton CC-105 ion source. The cause-and-effect chain between the use of different parameters in the IAD process and optical properties of the TiO2 layers as well as their photocatalytic activities are described. As test reaction for the determination of the photocatalytic properties, the degradation of methylene blue (MB) was chosen. The used setup based on a high precision two-path laser measurement system was developed by the LZH in order to determine the kinetic performance of TiO2 catalysts under well-defined UV illumination conditions. Photonic efficiencies of the TiO2 thin films were calculated from the obtained data. Additionally, crystal structure analysis has been investigated for the identification of anatase and rutile modifications. The comparison of the results shows that ion assisted deposition is an appropriate technology for the preparation of photocatalytic active thin films for optical applications.
KW - Ion assisted deposition
KW - Methlyene blue
KW - Optical coatings
KW - Photonic efficiencies
KW - Self-cleaning
KW - Titanium dioxide
UR - http://www.scopus.com/inward/record.url?scp=56349151916&partnerID=8YFLogxK
U2 - 10.1117/12.797719
DO - 10.1117/12.797719
M3 - Conference contribution
AN - SCOPUS:56349151916
SN - 9780819473318
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Optical Thin Films III
T2 - Advances in Optical Thin Films III
Y2 - 2 September 2008 through 3 September 2008
ER -