Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 2105-2110 |
| Seitenumfang | 6 |
| Fachzeitschrift | Journal of Optoelectronics and Advanced Materials |
| Jahrgang | 10 |
| Ausgabenummer | 8 |
| Publikationsstatus | Veröffentlicht - Aug. 2008 |
| Extern publiziert | Ja |
Abstract
This paper describes the formation and optical characterization of films prepared by conventional electron beam evaporation process. Materials such as Nd:Yttrium Aluminum Garnet (Nd:YAG), Ti: Sapphire and NdF3 were deposited on BK7, Suprasil, Sapphire and YAG substrates. The films were prepared by using pure single crystals of Nd:YAG and Ti: Sapphire with normal Nd and Ti concentration used in bulk crystals for production of lasers. Samples with higher Nd content were also studied in order to enhance the absorption in the film and to see the effect on optical constants, total integrated scattering and absorption. Energy Dispersive Analysis of X-rays (EDAX) confirmed the presence and quantified the elements Nd, Y, Al and O in Nd:YAG films and Ti, Al, O in Ti:Sapphire films. The X-Ray Diffraction measurements indicated the structure of these films. Refractive index n, in-homogeneities and thickness of these films were determined by taking their transmission spectra. Absorption was measured at 1064 nm by laser calorimetric method as per ISO standard ISO 11551. Total Integrated Scattering was also measured as per ISO standard /DIS 13696 at 633 nm.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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in: Journal of Optoelectronics and Advanced Materials, Jahrgang 10, Nr. 8, 08.2008, S. 2105-2110.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Optical properties of Nd
T2 - YAG, Ti:Sapphire and NdF3 films
AU - Akhtar, S. M.Javed
AU - Lappschies, Marc
AU - Ristau, Detlev
AU - Ashraf, Muhammad Waseem
PY - 2008/8
Y1 - 2008/8
N2 - This paper describes the formation and optical characterization of films prepared by conventional electron beam evaporation process. Materials such as Nd:Yttrium Aluminum Garnet (Nd:YAG), Ti: Sapphire and NdF3 were deposited on BK7, Suprasil, Sapphire and YAG substrates. The films were prepared by using pure single crystals of Nd:YAG and Ti: Sapphire with normal Nd and Ti concentration used in bulk crystals for production of lasers. Samples with higher Nd content were also studied in order to enhance the absorption in the film and to see the effect on optical constants, total integrated scattering and absorption. Energy Dispersive Analysis of X-rays (EDAX) confirmed the presence and quantified the elements Nd, Y, Al and O in Nd:YAG films and Ti, Al, O in Ti:Sapphire films. The X-Ray Diffraction measurements indicated the structure of these films. Refractive index n, in-homogeneities and thickness of these films were determined by taking their transmission spectra. Absorption was measured at 1064 nm by laser calorimetric method as per ISO standard ISO 11551. Total Integrated Scattering was also measured as per ISO standard /DIS 13696 at 633 nm.
AB - This paper describes the formation and optical characterization of films prepared by conventional electron beam evaporation process. Materials such as Nd:Yttrium Aluminum Garnet (Nd:YAG), Ti: Sapphire and NdF3 were deposited on BK7, Suprasil, Sapphire and YAG substrates. The films were prepared by using pure single crystals of Nd:YAG and Ti: Sapphire with normal Nd and Ti concentration used in bulk crystals for production of lasers. Samples with higher Nd content were also studied in order to enhance the absorption in the film and to see the effect on optical constants, total integrated scattering and absorption. Energy Dispersive Analysis of X-rays (EDAX) confirmed the presence and quantified the elements Nd, Y, Al and O in Nd:YAG films and Ti, Al, O in Ti:Sapphire films. The X-Ray Diffraction measurements indicated the structure of these films. Refractive index n, in-homogeneities and thickness of these films were determined by taking their transmission spectra. Absorption was measured at 1064 nm by laser calorimetric method as per ISO standard ISO 11551. Total Integrated Scattering was also measured as per ISO standard /DIS 13696 at 633 nm.
KW - Absorption and scattering
KW - Compositional analysis
KW - Nd:YAG
KW - NdF films
KW - Optical properties
KW - Ti:sapphire
UR - http://www.scopus.com/inward/record.url?scp=49149131292&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:49149131292
VL - 10
SP - 2105
EP - 2110
JO - Journal of Optoelectronics and Advanced Materials
JF - Journal of Optoelectronics and Advanced Materials
SN - 1454-4164
IS - 8
ER -