Optical properties and damage thresholds of dielectric uv/vuv-coatings deposited by Conventional evaporation, IAD and IBS

Publikation: Konferenzbeitrag › Paper › Forschung › Peer-Review

Autoren

  • Jürgen Kolbe
  • H. Kessler
  • T. Hofmann
  • Franz Meyer
  • Harald Schink
  • Detlev Ristau

Organisationseinheiten

Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten221-235
Seitenumfang15
PublikationsstatusVeröffentlicht - 29 Juli 1992
VeranstaltungLaser-Induced Damage in Optical Materials: 1991 - Boulder, USA / Vereinigte Staaten
Dauer: 23 Okt. 1991 → 25 Okt. 1991

Konferenz

KonferenzLaser-Induced Damage in Optical Materials: 1991
Land/GebietUSA / Vereinigte Staaten
OrtBoulder
Zeitraum23 Okt. 1991 → 25 Okt. 1991

Abstract

Conventional evaporation as well as IAD and IBS processes were used to develop low-loss dielectric mirrors and antireflection coatings for the wavelength range 130 to 250 nm. Firstly, single layers of SiO2, A12O3, HfO2, A1F3, MgF2, LaF3, NdF3 and GdF3 were deposited. The refractive indices, extinction coefficients and packing densities of the layers were determined by spectrophotometric methods in order to investigate their dependence on deposition parameters. With optimized parameters, HP and AR coatings were deposited. Their transmission and reflection coefficients were measured and compared to values calculated from single layer data and interface roughness data. Integrated scatter mesurements were performed on single layers as well as AR and HR coatings for 248 nm. Results of damage threshold measurements at 193 and 248 nm are presented.

ASJC Scopus Sachgebiete

Zitieren

Optical properties and damage thresholds of dielectric uv/vuv-coatings deposited by Conventional evaporation, IAD and IBS. / Kolbe, Jürgen; Kessler, H.; Hofmann, T. et al.
1992. 221-235 Beitrag in Laser-Induced Damage in Optical Materials: 1991, Boulder, USA / Vereinigte Staaten.

Publikation: Konferenzbeitrag › Paper › Forschung › Peer-Review

Kolbe, J, Kessler, H, Hofmann, T, Meyer, F, Schink, H & Ristau, D 1992, 'Optical properties and damage thresholds of dielectric uv/vuv-coatings deposited by Conventional evaporation, IAD and IBS', Beitrag in Laser-Induced Damage in Optical Materials: 1991, Boulder, USA / Vereinigte Staaten, 23 Okt. 1991 - 25 Okt. 1991 S. 221-235. https://doi.org/10.1117/12.60120
Kolbe, J., Kessler, H., Hofmann, T., Meyer, F., Schink, H., & Ristau, D. (1992). Optical properties and damage thresholds of dielectric uv/vuv-coatings deposited by Conventional evaporation, IAD and IBS. 221-235. Beitrag in Laser-Induced Damage in Optical Materials: 1991, Boulder, USA / Vereinigte Staaten. https://doi.org/10.1117/12.60120
Kolbe J, Kessler H, Hofmann T, Meyer F, Schink H, Ristau D. Optical properties and damage thresholds of dielectric uv/vuv-coatings deposited by Conventional evaporation, IAD and IBS. 1992. Beitrag in Laser-Induced Damage in Optical Materials: 1991, Boulder, USA / Vereinigte Staaten. doi: 10.1117/12.60120
Kolbe, Jürgen ; Kessler, H. ; Hofmann, T. et al. / Optical properties and damage thresholds of dielectric uv/vuv-coatings deposited by Conventional evaporation, IAD and IBS. Beitrag in Laser-Induced Damage in Optical Materials: 1991, Boulder, USA / Vereinigte Staaten.15 S.
Download
@conference{ef354291bb3b443cb3c778342d45c7fd,
title = "Optical properties and damage thresholds of dielectric uv/vuv-coatings deposited by Conventional evaporation, IAD and IBS",
abstract = "Conventional evaporation as well as IAD and IBS processes were used to develop low-loss dielectric mirrors and antireflection coatings for the wavelength range 130 to 250 nm. Firstly, single layers of SiO2, A12O3, HfO2, A1F3, MgF2, LaF3, NdF3 and GdF3 were deposited. The refractive indices, extinction coefficients and packing densities of the layers were determined by spectrophotometric methods in order to investigate their dependence on deposition parameters. With optimized parameters, HP and AR coatings were deposited. Their transmission and reflection coefficients were measured and compared to values calculated from single layer data and interface roughness data. Integrated scatter mesurements were performed on single layers as well as AR and HR coatings for 248 nm. Results of damage threshold measurements at 193 and 248 nm are presented.",
author = "J{\"u}rgen Kolbe and H. Kessler and T. Hofmann and Franz Meyer and Harald Schink and Detlev Ristau",
note = "Funding information: The work was sponsored by the Bundesminister f{\"u}r Forschung und Technologie (BftFT) The work was sponsored by the Bundesminister flir Forschung und Technologie (BMFT) under the project number 13 N 5759, and by Laser-Optik GmbH, 3008 Garbsen 8, Germany. We gratefully acknowledge the collaboration of Dr. K. Mann, Laser-Laboratorium Gottingen e. V., Germany, in the damage threshold measurements. Finally, the technical assistance of A. Starke, H. Miiller, F. Zimmermann, E. Oertel and M. Schneider is acknowledged. under the project number 13 N 5759, and by Laser-Optik GmbH, 3008 Garbsen 8,; Laser-Induced Damage in Optical Materials: 1991 ; Conference date: 23-10-1991 Through 25-10-1991",
year = "1992",
month = jul,
day = "29",
doi = "10.1117/12.60120",
language = "English",
pages = "221--235",

}

Download

TY - CONF

T1 - Optical properties and damage thresholds of dielectric uv/vuv-coatings deposited by Conventional evaporation, IAD and IBS

AU - Kolbe, Jürgen

AU - Kessler, H.

AU - Hofmann, T.

AU - Meyer, Franz

AU - Schink, Harald

AU - Ristau, Detlev

N1 - Funding information: The work was sponsored by the Bundesminister für Forschung und Technologie (BftFT) The work was sponsored by the Bundesminister flir Forschung und Technologie (BMFT) under the project number 13 N 5759, and by Laser-Optik GmbH, 3008 Garbsen 8, Germany. We gratefully acknowledge the collaboration of Dr. K. Mann, Laser-Laboratorium Gottingen e. V., Germany, in the damage threshold measurements. Finally, the technical assistance of A. Starke, H. Miiller, F. Zimmermann, E. Oertel and M. Schneider is acknowledged. under the project number 13 N 5759, and by Laser-Optik GmbH, 3008 Garbsen 8,

PY - 1992/7/29

Y1 - 1992/7/29

N2 - Conventional evaporation as well as IAD and IBS processes were used to develop low-loss dielectric mirrors and antireflection coatings for the wavelength range 130 to 250 nm. Firstly, single layers of SiO2, A12O3, HfO2, A1F3, MgF2, LaF3, NdF3 and GdF3 were deposited. The refractive indices, extinction coefficients and packing densities of the layers were determined by spectrophotometric methods in order to investigate their dependence on deposition parameters. With optimized parameters, HP and AR coatings were deposited. Their transmission and reflection coefficients were measured and compared to values calculated from single layer data and interface roughness data. Integrated scatter mesurements were performed on single layers as well as AR and HR coatings for 248 nm. Results of damage threshold measurements at 193 and 248 nm are presented.

AB - Conventional evaporation as well as IAD and IBS processes were used to develop low-loss dielectric mirrors and antireflection coatings for the wavelength range 130 to 250 nm. Firstly, single layers of SiO2, A12O3, HfO2, A1F3, MgF2, LaF3, NdF3 and GdF3 were deposited. The refractive indices, extinction coefficients and packing densities of the layers were determined by spectrophotometric methods in order to investigate their dependence on deposition parameters. With optimized parameters, HP and AR coatings were deposited. Their transmission and reflection coefficients were measured and compared to values calculated from single layer data and interface roughness data. Integrated scatter mesurements were performed on single layers as well as AR and HR coatings for 248 nm. Results of damage threshold measurements at 193 and 248 nm are presented.

UR - http://www.scopus.com/inward/record.url?scp=85075638803&partnerID=8YFLogxK

U2 - 10.1117/12.60120

DO - 10.1117/12.60120

M3 - Paper

AN - SCOPUS:85075638803

SP - 221

EP - 235

T2 - Laser-Induced Damage in Optical Materials: 1991

Y2 - 23 October 1991 through 25 October 1991

ER -