Details
Originalsprache | Englisch |
---|---|
Titel des Sammelwerks | Optical and Infrared Thin Films |
Untertitel | 1 August 2000, San Diego, USA |
Erscheinungsort | Bellingham |
Herausgeber (Verlag) | SPIE |
Seiten | 15-22 |
Seitenumfang | 8 |
Auflage | 1 |
ISBN (Print) | 0-8194-3739-5 |
Publikationsstatus | Veröffentlicht - 19 Okt. 2000 |
Extern publiziert | Ja |
Publikationsreihe
Name | Proceedings of SPIE - The International Society for Optical Engineering |
---|---|
Herausgeber (Verlag) | SPIE |
Band | 4094 |
ISSN (Print) | 0277-786X |
Abstract
The optical characterization of materials in thin film phase is a standard task in the field of coating technology. There are experimental circumstances where the accurate comparison between several deposition processes (for the same material) is important. In these cases, several sets of substrates are coated at the different deposition plants. The samples will be subsequently analyzed using, if the plants are at different locations, different spectrophotometers and finally the results of all the optical characterizations will be compared. The aim of this work is to present the results of a global procedure for the optical characterization of LaF3 in the UV-visible region, deposited at three different plants. We have used R and T spectrophotometric data and we have assumed the following model for the optical characterization: n(λ) = n0+n1/λ2, k(λ) = k0 exp(k1/λ). Our method characterizes all the samples from the same deposition process by a single set of parameters (instead of a set for each sample), using all the available measurements to determine them in a single numerical fitting, without a significant loss in the quality of the fittings. This procedure reduces the number of parameters and makes the comparison between different deposition processes more clear. By using similar results obtained for MgF2, the optical characterization of stacks (manufactured using MgF2 and LaF3) is also presented.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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Optical and Infrared Thin Films: 1 August 2000, San Diego, USA. 1. Aufl. Bellingham: SPIE, 2000. S. 15-22 (Proceedings of SPIE - The International Society for Optical Engineering; Band 4094).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Optical characterization of materials deposited by different processes
T2 - The LaF3 in the UV-visible region
AU - Bosch, Salvador
AU - Leinfellner, Norbert
AU - Quesnel, Etienne
AU - Duparre, Angela
AU - Ferre-Borrull, Josep
AU - Guenster, Stefan
AU - Ristau, Detlev
PY - 2000/10/19
Y1 - 2000/10/19
N2 - The optical characterization of materials in thin film phase is a standard task in the field of coating technology. There are experimental circumstances where the accurate comparison between several deposition processes (for the same material) is important. In these cases, several sets of substrates are coated at the different deposition plants. The samples will be subsequently analyzed using, if the plants are at different locations, different spectrophotometers and finally the results of all the optical characterizations will be compared. The aim of this work is to present the results of a global procedure for the optical characterization of LaF3 in the UV-visible region, deposited at three different plants. We have used R and T spectrophotometric data and we have assumed the following model for the optical characterization: n(λ) = n0+n1/λ2, k(λ) = k0 exp(k1/λ). Our method characterizes all the samples from the same deposition process by a single set of parameters (instead of a set for each sample), using all the available measurements to determine them in a single numerical fitting, without a significant loss in the quality of the fittings. This procedure reduces the number of parameters and makes the comparison between different deposition processes more clear. By using similar results obtained for MgF2, the optical characterization of stacks (manufactured using MgF2 and LaF3) is also presented.
AB - The optical characterization of materials in thin film phase is a standard task in the field of coating technology. There are experimental circumstances where the accurate comparison between several deposition processes (for the same material) is important. In these cases, several sets of substrates are coated at the different deposition plants. The samples will be subsequently analyzed using, if the plants are at different locations, different spectrophotometers and finally the results of all the optical characterizations will be compared. The aim of this work is to present the results of a global procedure for the optical characterization of LaF3 in the UV-visible region, deposited at three different plants. We have used R and T spectrophotometric data and we have assumed the following model for the optical characterization: n(λ) = n0+n1/λ2, k(λ) = k0 exp(k1/λ). Our method characterizes all the samples from the same deposition process by a single set of parameters (instead of a set for each sample), using all the available measurements to determine them in a single numerical fitting, without a significant loss in the quality of the fittings. This procedure reduces the number of parameters and makes the comparison between different deposition processes more clear. By using similar results obtained for MgF2, the optical characterization of stacks (manufactured using MgF2 and LaF3) is also presented.
UR - http://www.scopus.com/inward/record.url?scp=0034543780&partnerID=8YFLogxK
U2 - 10.1117/12.404761
DO - 10.1117/12.404761
M3 - Conference contribution
AN - SCOPUS:0034543780
SN - 0-8194-3739-5
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 15
EP - 22
BT - Optical and Infrared Thin Films
PB - SPIE
CY - Bellingham
ER -