Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 403-412 |
| Seitenumfang | 10 |
| Fachzeitschrift | Guangxue Jingmi Gongcheng/Optics and Precision Engineering |
| Jahrgang | 13 |
| Ausgabenummer | 4 |
| Publikationsstatus | Veröffentlicht - Aug. 2005 |
| Extern publiziert | Ja |
Abstract
This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context, the present study gives a review on selected combinations of conventional and ion deposition techniques with different broadband online spectrophotometric systems. Besides two systems operating in the VIS- and NIR-spectral range in combination with ion processes, also a monochromator system developed for conventional deposition processes in the DUV/VUV-spectral range will be discussed. The considerations will be concluded by a comparison of the major advantages of the specific combinations of processes with online monitoring concepts and by a brief outlook concerning future challenges.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
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in: Guangxue Jingmi Gongcheng/Optics and Precision Engineering, Jahrgang 13, Nr. 4, 08.2005, S. 403-412.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Optical broadband monitoring of thin film growth
AU - Ehlers, Henrik
AU - Gro, T.
AU - Lappschies, Marc
AU - Ristau, Detlev
PY - 2005/8
Y1 - 2005/8
N2 - This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context, the present study gives a review on selected combinations of conventional and ion deposition techniques with different broadband online spectrophotometric systems. Besides two systems operating in the VIS- and NIR-spectral range in combination with ion processes, also a monochromator system developed for conventional deposition processes in the DUV/VUV-spectral range will be discussed. The considerations will be concluded by a comparison of the major advantages of the specific combinations of processes with online monitoring concepts and by a brief outlook concerning future challenges.
AB - This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context, the present study gives a review on selected combinations of conventional and ion deposition techniques with different broadband online spectrophotometric systems. Besides two systems operating in the VIS- and NIR-spectral range in combination with ion processes, also a monochromator system developed for conventional deposition processes in the DUV/VUV-spectral range will be discussed. The considerations will be concluded by a comparison of the major advantages of the specific combinations of processes with online monitoring concepts and by a brief outlook concerning future challenges.
KW - DUV
KW - Ion assisted deposition
KW - Ion beam sputtering
KW - Optical broadband monitoring
KW - Optical coating
KW - VUV
UR - http://www.scopus.com/inward/record.url?scp=25144476246&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:25144476246
VL - 13
SP - 403
EP - 412
JO - Guangxue Jingmi Gongcheng/Optics and Precision Engineering
JF - Guangxue Jingmi Gongcheng/Optics and Precision Engineering
SN - 1004-924X
IS - 4
ER -