On the equilibrium concentration of boron-oxygen defects in crystalline silicon

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • Dominic C. Walter
  • Robert Falster
  • Vladimir V. Voronkov
  • Jan Schmidt

Organisationseinheiten

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
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Details

OriginalspracheEnglisch
Seiten (von - bis)33-36
Seitenumfang4
FachzeitschriftSolar Energy Materials and Solar Cells
Jahrgang173
PublikationsstatusVeröffentlicht - Dez. 2017

Abstract

We determine the equilibrium concentration of the BO defect in boron-doped Czochralski-grown silicon after prolonged (up to 150 h) annealing at relatively low temperatures between 200 and 300 °C. We show that after sample processing, the BO concentration has not necessarily reached the equilibrium state. The actually reached state depends on the detailed temperature profile of the last temperature treatment before the light-induced degradation (LID) is performed. For the investigated Cz-Si materials with base resistivities ranging between 0.5 and 2.5 Ω cm, we observe that an annealing step at 200 °C for 50 h establishes the equilibrium, independent of the base resistivity. Experiments performed at different temperatures reveal that the equilibrium defect concentration decreases with increasing annealing temperature. This observation can be understood, assuming a mobile species which is distributed between at least two different sinks. A possible defect model is discussed.

ASJC Scopus Sachgebiete

Ziele für nachhaltige Entwicklung

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On the equilibrium concentration of boron-oxygen defects in crystalline silicon. / Walter, Dominic C.; Falster, Robert; Voronkov, Vladimir V. et al.
in: Solar Energy Materials and Solar Cells, Jahrgang 173, 12.2017, S. 33-36.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Walter DC, Falster R, Voronkov VV, Schmidt J. On the equilibrium concentration of boron-oxygen defects in crystalline silicon. Solar Energy Materials and Solar Cells. 2017 Dez;173:33-36. doi: 10.1016/j.solmat.2017.06.036
Walter, Dominic C. ; Falster, Robert ; Voronkov, Vladimir V. et al. / On the equilibrium concentration of boron-oxygen defects in crystalline silicon. in: Solar Energy Materials and Solar Cells. 2017 ; Jahrgang 173. S. 33-36.
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AU - Walter, Dominic C.

AU - Falster, Robert

AU - Voronkov, Vladimir V.

AU - Schmidt, Jan

N1 - Publisher Copyright: © 2017 Elsevier B.V.

PY - 2017/12

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N2 - We determine the equilibrium concentration of the BO defect in boron-doped Czochralski-grown silicon after prolonged (up to 150 h) annealing at relatively low temperatures between 200 and 300 °C. We show that after sample processing, the BO concentration has not necessarily reached the equilibrium state. The actually reached state depends on the detailed temperature profile of the last temperature treatment before the light-induced degradation (LID) is performed. For the investigated Cz-Si materials with base resistivities ranging between 0.5 and 2.5 Ω cm, we observe that an annealing step at 200 °C for 50 h establishes the equilibrium, independent of the base resistivity. Experiments performed at different temperatures reveal that the equilibrium defect concentration decreases with increasing annealing temperature. This observation can be understood, assuming a mobile species which is distributed between at least two different sinks. A possible defect model is discussed.

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