Details
Originalsprache | Englisch |
---|---|
Seiten (von - bis) | 855-862 |
Seitenumfang | 8 |
Fachzeitschrift | Energy Procedia |
Jahrgang | 77 |
Frühes Online-Datum | 28 Aug. 2015 |
Publikationsstatus | Veröffentlicht - Aug. 2015 |
Extern publiziert | Ja |
Veranstaltung | 5th International Conference on Silicon Photovoltaics, SiliconPV 2015 - Konstanz, Deutschland Dauer: 25 März 2015 → 27 März 2015 |
Abstract
In order to reduce the silicon consumption in the production of crystalline silicon solar cells, the improvement of sawing techniques or the use of a kerf-less process are possible solutions. This study focuses on a particular kerf-less technique based on thermally-induced spalling of thin silicon layers joined to aluminum. Via a controlled temperature variation we demonstrate that it is possible to drive an initially sharp crack, introduced by laser, into the silicon substrate and obtain the detachment of ultra-thin silicon layers. A numerical approach based on the finite element method (FEM) and Linear Elastic Fracture Mechanics (LEFM) is herein proposed to compute the Stress Intensity Factors (SIFs) that characterize the stress field at the crack tip and predict crack propagation of an initial notch, depending on the geometry of the specimen and on the boundary conditions. We propose a parametric study to evaluate the dependence of the crack path on the following parameters: (i) the distance between the notch and the aluminum-silicon interface, (ii) the thickness of the stressor (aluminum) layer, and (iii) the applied load. The results for the cooling process here analyzed show that ΔT >43 K and a ratio λ=0.65 between the thickness of the stressor layer and the distance of the initial notch from the interface are suitable values to achieve a steady-state propagation in case of a ratio λ0=0.115 between the in plane thickness of the silicon substrate and the aluminum thickness, a value typically used in applications.
ASJC Scopus Sachgebiete
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- Allgemeine Energie
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in: Energy Procedia, Jahrgang 77, 08.2015, S. 855-862.
Publikation: Beitrag in Fachzeitschrift › Konferenzaufsatz in Fachzeitschrift › Forschung › Peer-Review
}
TY - JOUR
T1 - Numerical modelling and validation of thermally-induced spalling
AU - Berardone, Irene
AU - Kajari-Schröder, Sarah
AU - Niepelt, Raphael
AU - Hensen, Jan
AU - Steckenreiter, Verena
AU - Paggi, Marco
N1 - Funding Information: Marco Paggi would like to acknowledge funding from the European Research Council under the European Union’s Seventh Framework Programme (FP/2007-2013) / ERC Grant Agreement n. 306622 (ERC Starting Grant “Multi-field and multi-scale Computational Approach to Design and Durability of PhotoVoltaic Modules”-CA2PVM). Irene Berardone acknowledges the support of the Italian Ministry of Education, University and Research to the Project FIRB 2010 Future in Research “Structural mechanics models for renewable energy applications” (RBFR107AKG). This work was also supported by the Federal Ministry for Environment, Nature Conservation, and Nuclear Safety under the contract FKZ 0325461 and by the state of Lower Saxony, Germany.
PY - 2015/8
Y1 - 2015/8
N2 - In order to reduce the silicon consumption in the production of crystalline silicon solar cells, the improvement of sawing techniques or the use of a kerf-less process are possible solutions. This study focuses on a particular kerf-less technique based on thermally-induced spalling of thin silicon layers joined to aluminum. Via a controlled temperature variation we demonstrate that it is possible to drive an initially sharp crack, introduced by laser, into the silicon substrate and obtain the detachment of ultra-thin silicon layers. A numerical approach based on the finite element method (FEM) and Linear Elastic Fracture Mechanics (LEFM) is herein proposed to compute the Stress Intensity Factors (SIFs) that characterize the stress field at the crack tip and predict crack propagation of an initial notch, depending on the geometry of the specimen and on the boundary conditions. We propose a parametric study to evaluate the dependence of the crack path on the following parameters: (i) the distance between the notch and the aluminum-silicon interface, (ii) the thickness of the stressor (aluminum) layer, and (iii) the applied load. The results for the cooling process here analyzed show that ΔT >43 K and a ratio λ=0.65 between the thickness of the stressor layer and the distance of the initial notch from the interface are suitable values to achieve a steady-state propagation in case of a ratio λ0=0.115 between the in plane thickness of the silicon substrate and the aluminum thickness, a value typically used in applications.
AB - In order to reduce the silicon consumption in the production of crystalline silicon solar cells, the improvement of sawing techniques or the use of a kerf-less process are possible solutions. This study focuses on a particular kerf-less technique based on thermally-induced spalling of thin silicon layers joined to aluminum. Via a controlled temperature variation we demonstrate that it is possible to drive an initially sharp crack, introduced by laser, into the silicon substrate and obtain the detachment of ultra-thin silicon layers. A numerical approach based on the finite element method (FEM) and Linear Elastic Fracture Mechanics (LEFM) is herein proposed to compute the Stress Intensity Factors (SIFs) that characterize the stress field at the crack tip and predict crack propagation of an initial notch, depending on the geometry of the specimen and on the boundary conditions. We propose a parametric study to evaluate the dependence of the crack path on the following parameters: (i) the distance between the notch and the aluminum-silicon interface, (ii) the thickness of the stressor (aluminum) layer, and (iii) the applied load. The results for the cooling process here analyzed show that ΔT >43 K and a ratio λ=0.65 between the thickness of the stressor layer and the distance of the initial notch from the interface are suitable values to achieve a steady-state propagation in case of a ratio λ0=0.115 between the in plane thickness of the silicon substrate and the aluminum thickness, a value typically used in applications.
KW - delamination
KW - Finite element method
KW - kerf-less technique
KW - Linear Elastic Fracture Mechanics
KW - silicon
KW - thin film solar cells
UR - http://www.scopus.com/inward/record.url?scp=84948417396&partnerID=8YFLogxK
U2 - 10.1016/j.egypro.2015.07.121
DO - 10.1016/j.egypro.2015.07.121
M3 - Conference article
AN - SCOPUS:84948417396
VL - 77
SP - 855
EP - 862
JO - Energy Procedia
JF - Energy Procedia
SN - 1876-6102
T2 - 5th International Conference on Silicon Photovoltaics, SiliconPV 2015
Y2 - 25 March 2015 through 27 March 2015
ER -