Nonlinear femtosecond laser processing of alkylsiloxane monolayers on surface-oxidized silicon substrates

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • Steffen Franzka
  • Jürgen Koch
  • Boris N. Chichkov
  • Nils Hartmann

Externe Organisationen

  • Universität Duisburg-Essen
  • CeNIDE-Center for Nanointegration Duisburg-Essen
  • Laser Zentrum Hannover e.V. (LZH)
  • NETZ-NanoEnergieTechnikZentrum
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)814-817
Seitenumfang4
FachzeitschriftJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Jahrgang28
Ausgabenummer4
PublikationsstatusVeröffentlicht - 29 Juni 2010
Extern publiziertJa

Abstract

Femtosecond laser patterning of octadecylsiloxane monolayers on surface-oxidized silicon substrates via single-pulse processing at λ=800 nm, τ<30 fs, and ambient conditions has been investigated. Depending on the laser pulse fluence, local irradiation results in circular spots of distinct size and morphology. At high fluences, a particular rich complexity of distinct surface morphologies is observed including hole, rim, and ripple formation, and a faint boundary area where monolayer decomposition sets in. At low fluences, subwavelength patterning of the organic monolayer is feasible. In particular, at a 1/e laser spot diameter of 1.3 μm, surface spots with a width down to 300 nm are fabricated. Selective processing of the organic monolayer, though, is restricted to a very narrow range of fluences between 1.1 and 1.2 J/ cm 2. A significantly larger parameter range for selective processing is anticipated in the case of functional monolayers that incorporate aromatic groups. Promising perspectives in femtosecond laser processing of organic monolayers are discussed.

ASJC Scopus Sachgebiete

Zitieren

Nonlinear femtosecond laser processing of alkylsiloxane monolayers on surface-oxidized silicon substrates. / Franzka, Steffen; Koch, Jürgen; Chichkov, Boris N. et al.
in: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Jahrgang 28, Nr. 4, 29.06.2010, S. 814-817.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Download
@article{4b4f626280754173a7c9c105118e4d4b,
title = "Nonlinear femtosecond laser processing of alkylsiloxane monolayers on surface-oxidized silicon substrates",
abstract = "Femtosecond laser patterning of octadecylsiloxane monolayers on surface-oxidized silicon substrates via single-pulse processing at λ=800 nm, τ<30 fs, and ambient conditions has been investigated. Depending on the laser pulse fluence, local irradiation results in circular spots of distinct size and morphology. At high fluences, a particular rich complexity of distinct surface morphologies is observed including hole, rim, and ripple formation, and a faint boundary area where monolayer decomposition sets in. At low fluences, subwavelength patterning of the organic monolayer is feasible. In particular, at a 1/e laser spot diameter of 1.3 μm, surface spots with a width down to 300 nm are fabricated. Selective processing of the organic monolayer, though, is restricted to a very narrow range of fluences between 1.1 and 1.2 J/ cm 2. A significantly larger parameter range for selective processing is anticipated in the case of functional monolayers that incorporate aromatic groups. Promising perspectives in femtosecond laser processing of organic monolayers are discussed.",
author = "Steffen Franzka and J{\"u}rgen Koch and Chichkov, {Boris N.} and Nils Hartmann",
note = "Funding information: Financial support by the German Science Foundation (DFG, Grant No. HA-2769/3-1), the BASF Coatings AG, the European Union, and the Ministry of Economic Affairs and Energy of the State North Rhine-Westphalia in Germany (Objective 2 Programme: European Regional Development Fund, ERDF) is gratefully acknowledged. N.H. also gratefully thanks Eckart Hasselbrink for his continuing support.",
year = "2010",
month = jun,
day = "29",
doi = "10.1116/1.3281296",
language = "English",
volume = "28",
pages = "814--817",
journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "4",

}

Download

TY - JOUR

T1 - Nonlinear femtosecond laser processing of alkylsiloxane monolayers on surface-oxidized silicon substrates

AU - Franzka, Steffen

AU - Koch, Jürgen

AU - Chichkov, Boris N.

AU - Hartmann, Nils

N1 - Funding information: Financial support by the German Science Foundation (DFG, Grant No. HA-2769/3-1), the BASF Coatings AG, the European Union, and the Ministry of Economic Affairs and Energy of the State North Rhine-Westphalia in Germany (Objective 2 Programme: European Regional Development Fund, ERDF) is gratefully acknowledged. N.H. also gratefully thanks Eckart Hasselbrink for his continuing support.

PY - 2010/6/29

Y1 - 2010/6/29

N2 - Femtosecond laser patterning of octadecylsiloxane monolayers on surface-oxidized silicon substrates via single-pulse processing at λ=800 nm, τ<30 fs, and ambient conditions has been investigated. Depending on the laser pulse fluence, local irradiation results in circular spots of distinct size and morphology. At high fluences, a particular rich complexity of distinct surface morphologies is observed including hole, rim, and ripple formation, and a faint boundary area where monolayer decomposition sets in. At low fluences, subwavelength patterning of the organic monolayer is feasible. In particular, at a 1/e laser spot diameter of 1.3 μm, surface spots with a width down to 300 nm are fabricated. Selective processing of the organic monolayer, though, is restricted to a very narrow range of fluences between 1.1 and 1.2 J/ cm 2. A significantly larger parameter range for selective processing is anticipated in the case of functional monolayers that incorporate aromatic groups. Promising perspectives in femtosecond laser processing of organic monolayers are discussed.

AB - Femtosecond laser patterning of octadecylsiloxane monolayers on surface-oxidized silicon substrates via single-pulse processing at λ=800 nm, τ<30 fs, and ambient conditions has been investigated. Depending on the laser pulse fluence, local irradiation results in circular spots of distinct size and morphology. At high fluences, a particular rich complexity of distinct surface morphologies is observed including hole, rim, and ripple formation, and a faint boundary area where monolayer decomposition sets in. At low fluences, subwavelength patterning of the organic monolayer is feasible. In particular, at a 1/e laser spot diameter of 1.3 μm, surface spots with a width down to 300 nm are fabricated. Selective processing of the organic monolayer, though, is restricted to a very narrow range of fluences between 1.1 and 1.2 J/ cm 2. A significantly larger parameter range for selective processing is anticipated in the case of functional monolayers that incorporate aromatic groups. Promising perspectives in femtosecond laser processing of organic monolayers are discussed.

UR - http://www.scopus.com/inward/record.url?scp=77954206297&partnerID=8YFLogxK

U2 - 10.1116/1.3281296

DO - 10.1116/1.3281296

M3 - Article

AN - SCOPUS:77954206297

VL - 28

SP - 814

EP - 817

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

SN - 0734-2101

IS - 4

ER -