Microstructured reaction areas for the deposition of silica

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Autoren

  • Olaf Helmecke
  • Alexander Hirsch
  • Peter Behrens
  • Henning Menzel

Organisationseinheiten

Externe Organisationen

  • Technische Universität Braunschweig
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)225-231
Seitenumfang7
FachzeitschriftColloid and polymer science
Jahrgang286
Ausgabenummer2
PublikationsstatusVeröffentlicht - 9 Okt. 2007

Abstract

Patterned films with hexagonal structures were prepared by photochemical grafting of hydrophobic poly(acrylic acid 2-ethyl-hexylester) (PEHAA) as barrier and poly(ethylene imine) (PEI) as reaction area. The films have been characterized by ellipsometry, contact angle measurements, and scanning electron microscopy (SEM). These patterned films have been used in silica mineralization experiments by dipping them into a silica precursor solution. Silica deposition occurs only in PEI-coated areas, resulting in regular arrays of lens-shaped silica particles. The deposited silica was investigated by SEM and atomic force microscopy (AFM).

ASJC Scopus Sachgebiete

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Microstructured reaction areas for the deposition of silica. / Helmecke, Olaf; Hirsch, Alexander; Behrens, Peter et al.
in: Colloid and polymer science, Jahrgang 286, Nr. 2, 09.10.2007, S. 225-231.

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Helmecke, O, Hirsch, A, Behrens, P & Menzel, H 2007, 'Microstructured reaction areas for the deposition of silica', Colloid and polymer science, Jg. 286, Nr. 2, S. 225-231. https://doi.org/10.1007/s00396-007-1773-y
Helmecke O, Hirsch A, Behrens P, Menzel H. Microstructured reaction areas for the deposition of silica. Colloid and polymer science. 2007 Okt 9;286(2):225-231. doi: 10.1007/s00396-007-1773-y
Helmecke, Olaf ; Hirsch, Alexander ; Behrens, Peter et al. / Microstructured reaction areas for the deposition of silica. in: Colloid and polymer science. 2007 ; Jahrgang 286, Nr. 2. S. 225-231.
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AU - Helmecke, Olaf

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N1 - Funding information: The authors would like to thank Prof. A. Waag and M. Karsten (Institute of Semiconductor Technology, Braunschweig University of Technology) for the preparation of the mask and A. Scherbarth for SEM measurements. This work was supported in the scope of the Priority Research Program 1117 “Principles of Biomineralization” by the Deutsche Forschungsgemeinschaft (DFG).

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