Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | 2023 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference |
| Untertitel | CLEO/Europe-EQEC |
| Herausgeber (Verlag) | Institute of Electrical and Electronics Engineers Inc. |
| Seitenumfang | 1 |
| ISBN (elektronisch) | 9798350345995 |
| ISBN (Print) | 979-8-3503-4600-8 |
| Publikationsstatus | Veröffentlicht - 2023 |
| Veranstaltung | 2023 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference, CLEO/Europe-EQEC 2023 - Munich, Deutschland Dauer: 26 Juni 2023 → 30 Juni 2023 |
Abstract
Manufacturing technologies enabling subwavelength structuring are required to meet the increasing demands on the compact integration and miniaturization of optoelectronic products. In the past few decades, a variety of technologies, i.e. electron beam lithography [1], focused ion beam lithography [2] and two-photon polymerization [3], has been developed for advanced manufacturing with resolution beyond the diffraction limit. While possessing this advantage, these techniques always require complex and expensive systems. In addition, the structuring processes are rather slow, which limits their throughput and applications in large-area production. Other techniques such as nanoimprint lithography also attracts great attention due to their high throughput capabilities [4]. However, the master stamp used for this process usually needs to be produced via electron or ion beam lithography, which makes the whole process costly.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Instrumentierung
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
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2023 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference: CLEO/Europe-EQEC . Institute of Electrical and Electronics Engineers Inc., 2023.
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Microscope Projection Photolithography-Enabled Structuring with Subwavelength Resolution
AU - Zheng, Lei
AU - Reinhardt, Carsten
AU - Roth, Bernhard
PY - 2023
Y1 - 2023
N2 - Manufacturing technologies enabling subwavelength structuring are required to meet the increasing demands on the compact integration and miniaturization of optoelectronic products. In the past few decades, a variety of technologies, i.e. electron beam lithography [1], focused ion beam lithography [2] and two-photon polymerization [3], has been developed for advanced manufacturing with resolution beyond the diffraction limit. While possessing this advantage, these techniques always require complex and expensive systems. In addition, the structuring processes are rather slow, which limits their throughput and applications in large-area production. Other techniques such as nanoimprint lithography also attracts great attention due to their high throughput capabilities [4]. However, the master stamp used for this process usually needs to be produced via electron or ion beam lithography, which makes the whole process costly.
AB - Manufacturing technologies enabling subwavelength structuring are required to meet the increasing demands on the compact integration and miniaturization of optoelectronic products. In the past few decades, a variety of technologies, i.e. electron beam lithography [1], focused ion beam lithography [2] and two-photon polymerization [3], has been developed for advanced manufacturing with resolution beyond the diffraction limit. While possessing this advantage, these techniques always require complex and expensive systems. In addition, the structuring processes are rather slow, which limits their throughput and applications in large-area production. Other techniques such as nanoimprint lithography also attracts great attention due to their high throughput capabilities [4]. However, the master stamp used for this process usually needs to be produced via electron or ion beam lithography, which makes the whole process costly.
UR - http://www.scopus.com/inward/record.url?scp=85175714874&partnerID=8YFLogxK
U2 - 10.1109/CLEO/EUROPE-EQEC57999.2023.10231498
DO - 10.1109/CLEO/EUROPE-EQEC57999.2023.10231498
M3 - Conference contribution
AN - SCOPUS:85175714874
SN - 979-8-3503-4600-8
BT - 2023 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2023 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference, CLEO/Europe-EQEC 2023
Y2 - 26 June 2023 through 30 June 2023
ER -